Abstract: A dimmer logic for fluorescent lamps is described which operates after the principal of a two-point circuit with two stable operating points, where in dimmer operation periodic changes between the two operating points takes place. By periodically switching on and off the fluorescent lamp the average brightness of the fluorescent lamp is reduced. The dimmer logic can be extended by sensor inputs for current and voltage to control the voltage, current and power. By appropriate design of the dimmer logic a control and protection circuit for overcurrent, overvoltage and overpower can be realized.

Abstract: Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy,--OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl,--C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.

Abstract: A dimmer circuit for gas discharge lamps, having an electronic ballast equipped with a first converter circuit which first transforms an applied voltage by means of switching transistors into a first high-frequency alternating voltage. This first high-frequency alternating voltage is fed indirectly or directly to the gas discharge lamp. The dimmer circuit also includes a second converter circuit connected upstream. The second converter circuit is arranged so as to transform an input voltage into a second high-frequency alternating voltage and is also arranged so as to rectify the second high-frequency alternating voltage to produce a rectified output voltage. After rectification, the rectified output voltage is fed to the first converter circuit as the above-mentioned applied voltage. The second converter circuit contains switching means which, operated manually or by remote control, influence the magnitude of the rectified output voltage from the second converter circuit.

Abstract: The invention relates to a polishing stack with at least one fixed and one moveable polishing roll for polishing a plastic sheet leaving a wide extrusion die. A device is provided that preloads the frames and the bearings and acts on a roll gap adjusting device which includes a pinion gear arrangement and drive for finely adjusting the roll gap between the fixed and moveable rolls. The polishing stack in preferred form includes a center fixed roll and top and bottom adjustable rolls.

Abstract: Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, --OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl, --C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers, are eminently suitable for making relief structures.

Abstract: The tool for a tool holder of hand tools used for chiseling and/or percussion drilling has a chucking shank (9). This chucking shank (9) is provided with two rotary driving grooves (10) which are located diametrically opposite one another and open axially toward the free end of the chucking shank (9). Also, the chucking shank (9) has two diametrically opposite, axially closed locking grooves (11). In order to increase the total working surface decisive for the transmission of torque, two longitudinal grooves (12) are provided which are likewise arranged diametrically opposite one another and open axially toward the free end of the chucking shank (9). The length of these longitudinal grooves (12) exceeds the length of the locking grooves (11). The axes of symmetry (L) of the longitudinal grooves (12) are arranged at an acute angle (a) to the axes of symmetry (V) of the locking grooves (11).

Abstract: The clamping shank (1) of a chisel-cutting and/or percussion boring tool bits has stop faces effective in the axial direction and in the circumferential direction. Entrainment faces (2), open towards a free end of the clamping shank (1) are located upstream of these stop faces in the direction of the cutting area of the tool bits. The radial dimension (r) of the essentially radially extending entrainment faces (2) is greater than their axial dimension (a). In cooperation with an appropriately designed tool bit receptacle, the entrainment faces (2) can carry such a large share of the torque, that the stop faces are effectively relieved or unloaded.

Abstract: A tool bit has an axially extending shank section (1) to be inserted into a chuck in a manually-operated tool. The tool bit has an axially extending working section extending from the shank section. In the end region of the shank section remote from the working section there are first faces (2) acting in the axial direction and second faces (3) acting in the circumferential direction. In addition, the shank section (1) has entrainment faces (4a) spaced axially from the first and second faces toward the working section. The entrainment faces (4a) are located radially outwardly from the first and second faces (2, 3). The entrainment faces (4a) are part of grooves formed by a profiled section of the shank section and the grooves are open in the axial direction toward the first and second faces. The entrainment faces (4a) are radially spaced outwardly from the outer surface of the part of the shank section containing the first and second faces, so that they are able to transmit larger torques.

Abstract: Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, --OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl, --C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.

Abstract: Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least(a) an alkali-soluble resin(b) a 1,2-naphthoquinone-diazide-5-sulfonyl ester of a trihydroxybenzene isomer(c) an aromatic hydroxy compoundand also, if appropriate, further customary additives, and in which the result of component (b) is to give an absorption coefficient of at least 0.5 .mu.m.sup.-1 for the photobleachable absorption, and component (c) is present in a concentration of 15-30% by weight, relative to the total solids content.

Abstract: Positive-working photoresist compositions containing 23-27%, based on said composition, of at least one compound of formula (I) ##STR1## wherein one of the substituents X is hydrogen or a group of formula II ##STR2## and the other substituents X are a group of formula II; and 6-11%, based on said composition, of at least one polyhydroxy compound of formula III ##STR3## wherein X is a direct bond, --O--, --S--, --SO.sub.2 --, --CO-- or C(R.sub.6 (R.sub.7)--, and R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or hydroxy, and R.sub.6 and R.sub.7 are each independently of the other hydrogen, --CH.sub.3 or --CF.sub.3.These compositions have particularly good profile contrast and exhibit insignificant fluctuations in line width.

Abstract: An axially extending cutter bit has a shank extending between a trailing end (2, 7) arranged to be inserted into a tool chuck and a leading or working end (5, 8) with the shank between the trailing end and leading end being divided into a first section proceeding from the trailing end and a second section proceeding from the first section to the leading end. The second section is stepped inwardly from the first section. As a result, the energy throughput in passing shock waves is improved and higher material removal rates by the leading or working end are achieved.

Abstract: The invention relates to positive photoresists based on alkali-soluble phenolic resin and photosensitive quinonediazide compounds which, by means of particular additives, give relief structures produced therewith an increased stability towards changes due to thermal effects.

Abstract: The invention relates to positive working photoresists for producing relief structures of high-temperature resistant polyimide prepolymers, which photoresists can be developed in aqueous-alkaline medium and which contain, in an organic solvent, essentially at leasta) one prepolymer which is convertible into a polyimide,b) one radiation-sensitive quinonediazide compound, and further optional components, said prepolymer being a completely esterified polyamic acid polymer.

Abstract: Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least(a) an alkali-soluble resin(b) a 1,2-naphthoquinone-diazide-5-sulfonyl ester of a trihydroxybenzene isomer(c) an aromatic hydroxy compoundand also, if appropriate, further customary additives, and in which the result of component (b) is to give an absorption coefficient of at least 0.5 .mu.m.sup.-1 for the photobleachable absorption, and component (c) is present in a concentration of 15-30% by weight, relative to the total solids content.

Abstract: The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least(a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer,(b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula IR.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 Iin which R.sup.1 and R.sup.2 are as defined.

Abstract: Described is a process in which the liquid ash is removed from a combustion gas which is produced by a combustion of coal with air under a pressure between 2 to 30 bars, wherein the combustion gas at a temperature between 1200.degree. and 1700.degree. C. is passed through at least one porous gas-permeable filter element which is disposed in the combustion chamber. The combustion is effected with a C:O.sub.2 mole ratio of 1:0.6 to 1:0.99 and the filter element consists of carbon; carbides of boron, silicon, titanium, zirconium or hafnium; nitrides of boron, silicon, titanium, zirconium or hafnium; borides of titanium, zirconium or hafnium; and/or oxides of aluminum, silicon, magnesium or zirconium.