Abstract: A pattern structure of at least two different layer system elements disposed adjacent one beside the other upon a carrier substrate, at least one of said layer system elements comprises a layer of dielectric material, the layer of dielectric material residing upon a layer of a material that is resistant to activated oxygen or activated water and having a second surface facing toward the substrate. The dielectric layer of the one layer system element forms a disturbed region between the adjacent layer system elements, the dielectric layer having a thickness of d5 and wherein the disturbed region has a width of at most 10*d5.

Abstract: A light beam preparation arrangement includes a light tunnel, a rotatable unit, and a drive unit. In one aspect, a fixation rigidly attaches the light tunnel directly to the drive unit. In another aspect, temperature of the light tunnel in controlled. In another aspect, the rotatable unit is spaced a distance from the light tunnel, and the distance is controlled. In another aspect, alignment between the light tunnel and the rotatable unit is controlled. In another apsect, the light tunnel is hollow and a gas flows though the tunnel.

Abstract: A pattern structure of at least two different layer system elements disposed adjacent one beside the other upon a carrier substrate, at least one of said layer system elements comprises a layer of dielectric material, the layer of dielectric material residing upon a layer of a material that is resistant to activated oxygen or activated water and having a second surface facing toward the substrate. The dielectric layer of the one layer system element forms a disturbed region between the adjacent layer system elements, the dielectric layer having a thickness of ds and wherein the disturbed region has a width of at least 10*ds.

Abstract: A pattern structure has at least two different color filter elements disposed one beside the other on a carrier substrate. Each element includes a layer of dielectric material, the layer of dielectric material residing at at least one of the filter elements on a layer of a material that is resistant to activated oxygen or activated water. The layer of resistant material has a second surface pointing toward the substrate and is made of silicon or silicon dioxide.

Abstract: A light beam preparation arrangement includes a light tunnel, a rotatable unit, and a drive unit. In one aspect, a fixation rigidly attaches the light tunnel directly to the drive unit. In another aspect, temperature of the light tunnel in controlled. In another aspect, the rotatable unit is spaced a distance from the light tunnel, and the distance is controlled. In another aspect, alignment between the light tunnel and the rotatable unit is controlled. In another apsect, the light tunnel is hollow and a gas flows though the tunnel.

Abstract: A pattern structure has at least two different color filter elements disposed one beside the other on a carrier substrate. Each element includes a layer of dielectric material, the layer of dielectric material residing at at least one of the filter elements on a layer of a material that is resistant to activated oxygen or activated water. The layer of resistant material has a second surface pointing toward the substrate and is made of silicon or silicon dioxide.

Abstract: A process for the production of a color filter layer system structure on a substrate uses a structure lacquer layer which is deposited in a lift-off technique on the substrate. Lacquer layer surface regions and regions free of lacquer layer are present. Subsequently through a vacuum coating process a color filter layer system is deposited and subsequently with the lacquer layer surface regions the regions of the color filter layer system deposited thereon are removed. The deposition of the color filter layer system takes place through a plasma-enhanced coating at a temperature of maximally 150° C. The deposition takes place, for example, by sputtering or plasma-enhanced vapor deposition.

Abstract: A dielectric interference filter system with at least filter elements of different spectral characteristics on the same carrier substrate is provided. The filter elements have the same height and/or adjoin each other without gaps. The system is used for, inter alia, interference color filter systems in the form of an LCD-display or CCD-arrangement. A process for manufacturing the system includes preparing at least one filter element by coating and subsequent etching, and preparing at least one subsequent filter element by coating and subsequent structuring utilizing lift-off in which the etching mask is used as the lift-off mask.

Abstract: A first coating layer structure 3a is produced by coating, alignment, exposure and development. On this coating layer structure 3a is deposited the first colour filter layer system 5a0,5a1. Over the entire colour filter layer system 5 is deposited a sacrificial layer 7. Outside the vacuum container the coating layer structure is dissolved and with it the colour filter layer system regions 5a0 are removed. A further process of coating, alignment, exposure and development is carried out to create a coating layer structure 3b. Next the second colour filter layer system 5b and the second sacrificial layer 7b are deposited. Thereby the sacrificial layer 7 withstands the step of dissolving the coating and can be removed finally without damaging the colour filter layer system regions. Accordingly, any flakes 9 remaining from the lift-off are removed with the sacrificial layer 7.

Abstract: A compound glass arrangement comprises between two glass layers (5a, 5b) and embedded between two foils (3) a layer carrier foil (1). On the carrier foil (1) there is provided a coating (2) which is exclusively dielectric. It has a maximum of reflection for light in the near infrared spectral range and a transmission maximum for light in the visible spectral range.

Abstract: In order to drastically decrease, the differences of reflection as well as the differences of color in the region with a conductive electrode structure (5) facing the viewing environment (U) on a liquid crystal display, and a region without the structure corresponding to regions (B.sub.I) and (B.sub.o), the invention provides a compensation layer configuration (7) on at least one side of the electrode arrangement (5) facing the viewing environment (U). The configuration is laid out so that reflection differences of the regions become minimal as do the color differences of the regions caused by their spectral reflection profile.

Abstract: A coated wear resistant and transparent glass substrate has a multi-layer system with at least one layer of an oxynitride of one of hafnium, zirconium, tantalum and titanium, and with no metal layer. The substrate with multi-layer system has a reduced sun energy transmittance and anti-reflective effect in the visual spectral range.

Abstract: A coated transparent substrate is composed of a multi-layer layer-system on at least one of its sides with at least one layer of the oxynitride of hafnium, the layer-system comprising a sequence of hafnium-oxynitride layer and silicon-oxide layer.