Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Abstract: A device for optically imaging at least part of an object onto an area of a digital image sensor includes an optical channel, which includes a first imaging lens arranged on a first substrate, a second imaging lens arranged on a second substrate, and a field lens arranged on a third substrate. The first and second imaging lenses are identical and arranged such that a first surface of the first imaging lens is a light entry surface of the optical channel and that a first surface of the second imaging lens is a light exit surface of the optical channel. The field lens is arranged between the first imaging lens and the second imaging lens such that an axis running perpendicularly to the lateral extension of the optical channel and through a lateral center of the field lens forms a symmetry axis of the optical channel.

Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Abstract: An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in the pupil plane.

Abstract: The invention relates to a microlens array with integrated illumination, an imaging system with such a microlens array, an image detection device and also a method for producing the microlens array.

Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Abstract: A device for optically imaging at least part of an object onto an area of a digital image sensor includes an optical channel, which includes a first imaging lens arranged on a first substrate, a second imaging lens arranged on a second substrate, and a field lens arranged on a third substrate. The first and second imaging lenses are identical and arranged such that a first surface of the first imaging lens is a light entry surface of the optical channel and that a first surface of the second imaging lens is a light exit surface of the optical channel. The field lens is arranged between the first imaging lens and the second imaging lens such that an axis running perpendicularly to the lateral extension of the optical channel and through a lateral center of the field lens forms a symmetry axis of the optical channel.

Abstract: An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in the pupil plane.

Abstract: The invention relates to a microlens array with integrated illumination, an imaging system with such a microlens array, an image detection device and also a method for producing the microlens array.

Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Abstract: An optical sensing unit is provided which comprises at least one sample measurement cell, at least one excitation light source acting upon the or each measurement cell to provide one or more sensor fields defining an array of measurement fields, a photoelectric detector array for detecting the intensity of light emitted from the or each measurement cell in response to excitation light, and means for directing light emitted from each measurement field to a respective portion of the photoelectric detector array. The sensing unit may be used in combination with multiplexed waveguide arrays or multiplexed planar cappillary chromatography or electrophoresis chips.