Patents by Inventor Reisaku Matsuzaki

Reisaku Matsuzaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge
    Patent number: 3984301
    Abstract: On sputter-etching a substrate, fluorochloro- or fluorobromohydrocarbon gas is used as an etching gas in a chamber evacuated to a pressure of at least as low as 10.sup..sup.-5 Torr. The etching gas is introduced at a pressure between 5 .times. 10.sup..sup.-3 and 5 .times. 10.sup..sup.-2 Torr. Use is also made of a planar electrode for supporting the substrate and responsive to an r.f. power supplied thereto for producing a glow discharge.
    Type: Grant
    Filed: August 8, 1974
    Date of Patent: October 5, 1976
    Assignee: Nippon Electric Varian, Ltd.
    Inventors: Reisaku Matsuzaki, Naokichi Hosokawa