Patents by Inventor Remco Dirks
Remco Dirks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240060906Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.Type: ApplicationFiled: December 20, 2021Publication date: February 22, 2024Applicant: ASML Netherlands B.V.Inventors: Bart Jacobus Martinus TIEMERSMA, Alexandru ONOSE, Nick VERHEUL, Remco DIRKS
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Publication number: 20240061347Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.Type: ApplicationFiled: December 20, 2021Publication date: February 22, 2024Applicant: ASML Netherlands B.V.Inventors: Alexandru ONOSE, Bart Jacobus Martinus TIEMERSMA, Nick VERHEUL, Remco DIRKS
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Publication number: 20230288815Abstract: Methods and systems for determining a mapped intensity metric are described. Determining the mapped intensity metric includes determining an intensity metric for a manufacturing system. The intensity metric is determined based on a reflectivity of a location on a substrate and a manufacturing system characteristic. Determining the mapped intensity metric also includes determining a mapped intensity metric for a reference system. The reference system has a reference system characteristic. The mapped intensity metric is determined based on the intensity metric, the manufacturing system characteristic, and the reference system characteristic, to mimic determination of the intensity metric for the manufacturing system using the reference system. In some embodiments, the reference system is virtual, and the manufacturing system is physical.Type: ApplicationFiled: July 26, 2021Publication date: September 14, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Siebe Tjerk DE ZWART, Remco DIRKS, Gaurav NANDA, Bastiaan Onne FAGGINGER AUER
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Patent number: 11556060Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.Type: GrantFiled: August 30, 2019Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Seyed Iman Mossavat, Bastiaan Onne Fagginger Auer, Remco Dirks, Alexandru Onose, Hugo Augustinus Joseph Cramer
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Patent number: 11429763Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904?, 906?) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.Type: GrantFiled: March 2, 2020Date of Patent: August 30, 2022Assignee: ASML Netherlands B.V.Inventors: Remco Dirks, Markus Gerardus Martinus Maria Van Kraaij, Maxim Pisarenco
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Patent number: 11392043Abstract: A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence R(?,?,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths ?; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.Type: GrantFiled: August 13, 2019Date of Patent: July 19, 2022Assignee: ASML Netherlands B.V.Inventors: Seyed Iman Mossavat, Remco Dirks, Hendrik Jan Hidde Smilde
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Publication number: 20220171290Abstract: A method, computer program and associated apparatuses for metrology. The method includes determining a reconstruction recipe describing at least nominal values for use in a reconstruction of a parameterization describing a target. The method includes obtaining first measurement data relating to measurements of a plurality of targets on at least one substrate, the measurement data relating to one or more acquisition settings and performing an optimization by minimizing a cost function which minimizes differences between the first measurement data and simulated measurement data based on a reconstructed parameterization for each of the plurality of targets. A constraint on the cost function is imposed based on a hierarchical prior. Also disclosed is a hybrid model method comprising obtaining a coarse model operable to provide simulated coarse data; and training a data driven model to correct the simulated coarse data so as to determine simulated data for use in reconstruction.Type: ApplicationFiled: February 26, 2020Publication date: June 2, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Alexandru ONOSE, Remco DIRKS, Roger Hubertus Elisabeth Clementin BOSCH, Sander Silvester Adelgondus Marie JACOBS, Frank Jaco BUIJNSTERS, Siebe Tjerk DE ZWART, Artur PALHA DA SILVA CLERIGO, Nick VERHEUL
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Publication number: 20200202054Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904?, 906?) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.Type: ApplicationFiled: March 2, 2020Publication date: June 25, 2020Applicant: ASML Netherlands B.V.Inventors: Remco DIRKS, Markus Gerardus Martinus Maria VAN KRAAIJ, Maxim PISARENCO
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Patent number: 10627213Abstract: A method including obtaining measurement results of a device manufacturing process or a product thereof, obtaining sets of one or more values of one or more parameters of a distribution by fitting the distribution against the measurement results, respectively, and obtaining, using a computer, a set of one or more values of one or more hyperparameters of a hyperdistribution by fitting the hyperdistribution against the sets of values of the parameters.Type: GrantFiled: November 30, 2016Date of Patent: April 21, 2020Assignee: ASML Netherlands B. V.Inventors: Seyed Iman Mossavat, Remco Dirks, Hugo Augustinus Joseph Cramer
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Publication number: 20200110341Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.Type: ApplicationFiled: August 30, 2019Publication date: April 9, 2020Applicant: ASML Netherlands B.V.Inventors: Seyed Iman MOSSAVAT, Bastiaan Onne Fagginger Auer, Remco Dirks, Alexandru Onose, Hugo Augustinus Joseph Cramer
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Patent number: 10592618Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904?, 906?) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.Type: GrantFiled: July 13, 2016Date of Patent: March 17, 2020Assignee: ASML Netherlands B.V.Inventors: Remco Dirks, Markus Gerardus Martinus Maria Van Kraaij, Maxim Pisarenco
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Publication number: 20200057386Abstract: A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength-dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence R(?,?,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths ?; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.Type: ApplicationFiled: August 13, 2019Publication date: February 20, 2020Applicant: ASML Netherlands B.V.Inventors: Seyed Iman MOSSAVAT, Remco DIRKS, Hendrik Jan Hidde SMILDE
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Patent number: 10151985Abstract: A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.Type: GrantFiled: December 13, 2016Date of Patent: December 11, 2018Assignee: ASML Netherlands B.V.Inventors: Remco Dirks, Seyed Iman Mossavat, Hugo Augustinus Joseph Cramer
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Publication number: 20170176869Abstract: A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.Type: ApplicationFiled: December 13, 2016Publication date: June 22, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Remco Dirks, Seyed Iman Mossavat, Hugo Augustinus Joseph Cramer
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Publication number: 20170160074Abstract: A method including obtaining measurement results of a device manufacturing process or a product thereof, obtaining sets of one or more values of one or more parameters of a distribution by fitting the distribution against the measurement results, respectively, and obtaining, using a computer, a set of one or more values of one or more hyperparameters of a hyperdistribution by fitting the hyperdistribution against the sets of values of the parameters.Type: ApplicationFiled: November 30, 2016Publication date: June 8, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Seyed Iman MOSSAVAT, Remco DIRKS, Hugo Augustinus Joseph CRAMER
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Publication number: 20170017738Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904?, 906?) along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.Type: ApplicationFiled: July 13, 2016Publication date: January 19, 2017Applicant: ASML Netherlands B.V.Inventors: Remco DIRKS, Markus Gerardus Martinus Maria Van Kraaij, Maxim Pisarenco
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Patent number: 8706455Abstract: A projection operator framework is described to analyze the concept of localized normal-vector fields within field-material interactions in a spectral basis, in isotropic and anisotropic media. Generate a localized normal-vector field n in a region of the structure defined by the material boundary, decomposed into sub-regions with a predefined normal-vector field and possibly corresponding closed-form integrals. Construct a continuous vector field F using the normal-vector field to select continuous components ET and Dn. Localized integration of normal-vector field n over the sub-regions to determine coefficients of, C. Determine components Ex, Ey, Ez of the electromagnetic field by using field-material interaction operator C to operate on vector field F. Calculate electromagnetic scattering properties of the structure using the determined components of the electromagnetic field.Type: GrantFiled: October 15, 2010Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Martijn Constant Van Beurden, Irwan Dani Setija, Remco Dirks
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Patent number: 8645109Abstract: Numerical calculation of electromagnetic scattering properties and structural parameters of periodic structures is disclosed. A reflection coefficient has a representation as a bilinear or sesquilinear form. Computations of reflection coefficients and their derivatives for a single outgoing direction can benefit from an adjoint-state variable. Because the linear operator is identical for all angles of incidence that contribute to the same outgoing wave direction, there exists a single adjoint-state variable that generates all reflection coefficients from all incident waves that contribute to the outgoing wave. This adjoint-state variable can be obtained by numerically solving a single linear system, whereas one otherwise would need to solve a number of linear systems equal to the number of angles of incidence.Type: GrantFiled: November 29, 2010Date of Patent: February 4, 2014Assignee: ASML Netherlands B.V.Inventors: Remco Dirks, Irwan Dani Setija, Markus Gerardus Martinus Maria Van Kraaij, Martijn Constant Van Beurden
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Publication number: 20110137625Abstract: Numerical calculation of electromagnetic scattering properties and structural parameters of periodic structures is disclosed. A reflection coefficient has a representation as a bilinear or sesquilinear form. Computations of reflection coefficients and their derivatives for a single outgoing direction can benefit from an adjoint-state variable. Because the linear operator is identical for all angles of incidence that contribute to the same outgoing wave direction, there exists a single adjoint-state variable that generates all reflection coefficients from all incident waves that contribute to the outgoing wave. This adjoint-state variable can be obtained by numerically solving a single linear system, whereas one otherwise would need to solve a number of linear systems equal to the number of angles of incidence.Type: ApplicationFiled: November 29, 2010Publication date: June 9, 2011Applicant: ASML Netherlands B.V.Inventors: Remco Dirks, Irwan Dani Setija, Markus Gerardus Martinus Maria Van Kraaij, Martijn Constant Van Beurden
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Publication number: 20110098992Abstract: A projection operator framework is described to analyze the concept of localized normal-vector fields within field-material interactions in a spectral basis, in isotropic and anisotropic media. Generate a localized normal-vector field n in a region of the structure defined by the material boundary, decomposed into sub-regions with a predefined normal-vector field and possibly corresponding closed-form integrals. Construct a continuous vector field F using the normal-vector field to select continuous components ET and Dn. Localized integration of normal-vector field n over the sub-regions to determine coefficients of, C. Determine components Ex, Ey, Ez of the electromagnetic field by using field-material interaction operator C to operate on vector field F. Calculate electromagnetic scattering properties of the structure using the determined components of the electromagnetic field.Type: ApplicationFiled: October 15, 2010Publication date: April 28, 2011Applicant: ASML Netherlands B.V.Inventors: Martijn Constant VAN BEURDEN, Irwan Dani Setija, Remco Dirks