Patents by Inventor Remco Jager
Remco Jager has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8921758Abstract: The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.Type: GrantFiled: October 26, 2011Date of Patent: December 30, 2014Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Teunis Van De Peut, Alexander Hendrik Vincent Van Veen, Remco Jager, Stijn Willem Herman Karel Steenbrink, Ralph Van Melle, Henk Derks
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Patent number: 8841636Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.Type: GrantFiled: October 26, 2010Date of Patent: September 23, 2014Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink
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Patent number: 8759787Abstract: The invention relates to a charged particle lithography system for patterning a target. The lithography system has a beam generator for generating a plurality of charged particle beamlets, a beam stop array with a beam-blocking surface provided with an array of apertures; and a modulation device for modulating the beamlets by deflection. The modulation device has a substrate provided with a plurality of modulators arranged in arrays, each modulator being provided with electrodes extending on opposing sides of a corresponding aperture. The modulators are arranged in groups for directing a group of beamlets towards a single aperture in the beam stop array. Individual modulators within each group have an orientation such that a passing beamlet, if blocking is desired, is directed to a blocking position onto the beam stop array. Beamlet blocking positions for different beamlets are substantially homogeneously spread around the corresponding single aperture in the beam stop array.Type: GrantFiled: July 9, 2013Date of Patent: June 24, 2014Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink
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Publication number: 20140014850Abstract: The invention relates to a charged particle lithography system for patterning a target. The lithography system has a beam generator for generating a plurality of charged particle beamlets, a beam stop array with a beam-blocking surface provided with an array of apertures; and a modulation device for modulating the beamlets by deflection. The modulation device has a substrate provided with a plurality of modulators arranged in arrays, each modulator being provided with electrodes extending on opposing sides of a corresponding aperture. The modulators are arranged in groups for directing a group of beamlets towards a single aperture in the beam stop array. Individual modulators within each group have an orientation such that a passing beamlet, if blocking is desired, is directed to a blocking position onto the beam stop array. Beamlet blocking positions for different beamlets are substantially homogeneously spread around the corresponding single aperture in the beam stop array.Type: ApplicationFiled: July 9, 2013Publication date: January 16, 2014Inventors: Marco Jan-Jaco WIELAND, Remco JAGER, Alexander Hendrik Vincent VAN VEEN, Stijn Willem Herman Karel STEENBRINK
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Patent number: 8604411Abstract: The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.Type: GrantFiled: November 14, 2011Date of Patent: December 10, 2013Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink, Teunis van de Peut, Henk Derks
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Patent number: 8525134Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: GrantFiled: November 3, 2009Date of Patent: September 3, 2013Assignee: Mapper Lithography IP B.V.Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Patent number: 8492731Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array.Type: GrantFiled: October 26, 2010Date of Patent: July 23, 2013Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink
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Publication number: 20120292491Abstract: The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.Type: ApplicationFiled: November 14, 2011Publication date: November 22, 2012Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink, Teunis Van De Peut, Henk Derks
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Publication number: 20120273658Abstract: The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.Type: ApplicationFiled: October 26, 2011Publication date: November 1, 2012Applicant: MAPPER LITHOGRAPHY IP B.V.Inventors: Marco Jan-Jaco Wieland, Teunis Van De Peut, Alexander Hendrik Vincent Van Veen, Remco Jager, Stijn Willem Herman Karel Steenbrink, Ralph Van Melle, Henk Derks
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Patent number: 8242467Abstract: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.Type: GrantFiled: March 22, 2010Date of Patent: August 14, 2012Assignee: Mapper Lithography IP B.V.Inventors: Remco Jager, Aukje Arianne Annette Kastelijn, Guido de Boer, Marco Jan Jaco Wieland, Stijn Willem Karel Herman Steenbrink
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Patent number: 8242470Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: GrantFiled: January 11, 2007Date of Patent: August 14, 2012Assignee: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Publication number: 20120043457Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: ApplicationFiled: October 28, 2011Publication date: February 23, 2012Inventors: Jan-Jaco Marco Wieland, Johannes Christian van ' t Spijker, Remco Jager, Pieter Kruit
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Publication number: 20110260040Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array.Type: ApplicationFiled: October 26, 2010Publication date: October 27, 2011Applicant: MAPPER LITHOGRAPHY IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink
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Publication number: 20110261340Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the plurality of beamlets in accordance with a pattern. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements, a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data.Type: ApplicationFiled: October 26, 2010Publication date: October 27, 2011Applicant: Mapper Lithography IP B.V.Inventors: Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink
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Publication number: 20110042579Abstract: The invention relates to a charged particle lithography apparatus with a charged particle source for creating one or more charged particle beams, a charged particle projector for projecting the beams onto a wafer; and a moveable wafer stage for carrying the wafer. The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.Type: ApplicationFiled: February 19, 2010Publication date: February 24, 2011Applicant: MAPPER LITHOGRAPHY IP B.V.Inventors: Guido DE BOER, Sander BALTUSSEN, Remco JAGER, Jerry Johannes Martinus PEIJSTER, Tijs Frans TEEPEN, Joris Anne Henri VAN NIEUWSTADT, Willem Maurits WEEDA, Alexander Hendrik Vincent VAN VEEN
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Patent number: 7842936Abstract: The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.Type: GrantFiled: March 9, 2007Date of Patent: November 30, 2010Assignee: Mapper Lithography IP B.V.Inventors: Pieter Kruit, Remco Jager, Stijn Willem Karel Herman Steenbrink, Marco Jan-Jaco Wieland
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Publication number: 20100171046Abstract: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.Type: ApplicationFiled: March 22, 2010Publication date: July 8, 2010Inventors: Remco Jager, Aukje Arianne Annette Kastelijn, Guido de Boer, Marco Jan Jaco Wieland, Stijn Willem Karel Herman Steenbrink
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Patent number: 7709815Abstract: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.Type: GrantFiled: September 15, 2006Date of Patent: May 4, 2010Assignee: Mapper Lithography IP B.V.Inventors: Remco Jager, Aukje Arianne Annette Kastelijn, Guido de Boer, Marco Jan Jaco Wieland, Stijn Willem Karel Herman Steenbrink
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Publication number: 20100045958Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.Type: ApplicationFiled: November 3, 2009Publication date: February 25, 2010Inventors: Jan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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Patent number: RE45552Abstract: The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.Type: GrantFiled: November 29, 2012Date of Patent: June 9, 2015Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Pieter Kruit, Remco Jager, Stijn Willem Herman Karel Steenbrink, Marco Jan-Jaco Wieland