Patents by Inventor Remco Yuri Van De Moesdijk

Remco Yuri Van De Moesdijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11320751
    Abstract: An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: May 3, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Güneş Nakibo{hacek over (g)}lu, Dries Vaast Paul Hemschoote, Remco Yuri Van de Moesdijk
  • Patent number: 11009800
    Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: May 18, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Güneş Nakiboğlu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van De Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
  • Publication number: 20210041794
    Abstract: An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.
    Type: Application
    Filed: January 18, 2019
    Publication date: February 11, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Güne NAKIBOGLU, Dries Vaast Paul HEMSCHOOTE, Remco Yuri VAN DE MOESDIJK
  • Publication number: 20200379360
    Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
    Type: Application
    Filed: January 26, 2017
    Publication date: December 3, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Han-Kwang Nienhuys, Gunes Nakiboglu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van de Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
  • Patent number: 9249965
    Abstract: There is provided a lighting device 100 comprising a light source, a driver arranged for powering the light source, which is separated in space from the light source. The lighting device has two separate heat sinks, a light source heat sink 112 to which the light source is thermally coupled, and a driver heat sink 115 to which the driver is thermally coupled. The light source heat sink and the driver heat sink are separated by an air gap 114 to provide thermal decoupling of the light source heat sink and the driver heat sink.
    Type: Grant
    Filed: January 11, 2012
    Date of Patent: February 2, 2016
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Berend Jan Willem Ter Weeme, Remco Yuri Van De Moesdijk, Marcus Joannes Van Den Bosch, Yan Xiong, Xiaoqing Duan
  • Patent number: 9097416
    Abstract: This invention relates to a lighting device having a light source (102, 103), a light output unit, a drive unit (106a) arranged to drive the light source, an electrical connection unit connected with the drive unit and arranged to receive input power, and a heat sink (112), which has been provided with multiple reception portions (115, 116). At least the light source and the drive unit are mounted at a first respectively a second reception portion of the heat sink. The heat sink is a formed sheet structure, which has been formed into a predetermined shape from a sheet shaped heat sink blank.
    Type: Grant
    Filed: January 6, 2012
    Date of Patent: August 4, 2015
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Remco Yuri Van De Moesdijk, Marcus Joannes Van Den Bosch
  • Publication number: 20140001956
    Abstract: There is provided a lighting device 100 comprising a light source, a driver arranged for powering the light source, which is separated in space from the light source. The lighting device has two separate heat sinks, a light source heat sink 112 to which the light source is thermally coupled, and a driver heat sink 115 to which the driver is thermally coupled. The light source heat sink and the driver heat sink are separated by an air gap 114 to provide thermal decoupling of the light source heat sink and the driver heat sink.
    Type: Application
    Filed: January 11, 2012
    Publication date: January 2, 2014
    Applicant: KONINKLIJKE PHILIPS N.V.
    Inventors: Berend Jan Willem Ter Weeme, Remco Yuri Van De Moesdijk, Marcus Joannes Van Den Bosch, Yan Xiong, Xiaoqing Duan
  • Publication number: 20130301277
    Abstract: This invention relates to a lighting device having a light source (102, 103), a light output unit, a drive unit (106a) arranged to drive the light source, an electrical connection unit connected with the drive unit and arranged to receive input power, and a heat sink (112), which has been provided with multiple reception portions (115, 116). At least the light source and the drive unit are mounted at a first respectively a second reception portion of the heat sink. The heat sink is a formed sheet structure, which has been formed into a predetermined shape from a sheet shaped heat sink blank.
    Type: Application
    Filed: January 6, 2012
    Publication date: November 14, 2013
    Applicant: KONINKLIJKE PHILIPS N.V.
    Inventors: Remco Yuri Van De Moesdijk, Marcus Joannes Van Den Bosch