Patents by Inventor Remegio Manacio

Remegio Manacio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Detection and suppression of electrical arcing
    Patent number: 7514936
    Abstract: Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.
    Type: Grant
    Filed: October 27, 2007
    Date of Patent: April 7, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Suhail Anwar, Remegio Manacio, Chung-Hee Park, Dong-Kil Yim, Soo Young Choi
  • Detection and Suppression of Electrical Arcing
    Publication number: 20080061793
    Abstract: Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.
    Type: Application
    Filed: October 27, 2007
    Publication date: March 13, 2008
    Inventors: Suhail Anwar, Remegio Manacio, Chung-Hee Park, Dong-Kil Yim, Soo Choi
  • Detection and suppression of electrical arcing
    Patent number: 7292045
    Abstract: Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: November 6, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Suhail Anwar, Remegio Manacio, Chung-Hee Park, Dong-Kil Yim, Soo Young Choi
  • Detection and suppression of electrical arcing
    Publication number: 20060049831
    Abstract: Method and apparatus for detecting or suppressing electrical arcing or other abnormal change in the electrical impedance of a load connected to a power source. Preferably the load is a plasma chamber used for manufacturing electronic components such as semiconductors and flat panel displays. Arcing is detected by monitoring one or more sensors. Each sensor either responds to a characteristic of the electrical power being supplied by an electrical power source to the plasma or is coupled to the plasma chamber so as to respond to an electromagnetic condition within the chamber. Arcing is suppressed by reducing the power output for a brief period. Then the power source increases its power output, preferably to its original value. If the arcing resumes, the power source repeats the steps of reducing and then restoring the power output.
    Type: Application
    Filed: June 10, 2005
    Publication date: March 9, 2006
    Inventors: Suhail Anwar, Remegio Manacio, Chung-Hee Park, Dong-Kil Yim, Soo Choi