Patents by Inventor Remi Thollot

Remi Thollot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for treating a transport support for the conveyance and atmospheric storage of semiconductor substrates, and treatment station for the implementation of such a method
    Patent number: 8898930
    Abstract: The aim of the invention is to provide a method for the treatment of a transport support (1) for the conveyance and storage of semiconductor substrates, with said support (1) possibly having first undergone a cleaning operation using a liquid. The method includes a treatment stage in which the transport support (1) is placed in a sealed chamber (4) connected to a vacuum pump (5) and said transport support (1) is subjected to the combined action of a subatmospheric pressure and infrared radiation to favor the removal of foreign bodies on the walls of the transport support (1). The invention also concerns a treatment station for a transport support (1) for implementation of the method.
    Type: Grant
    Filed: August 11, 2008
    Date of Patent: December 2, 2014
    Assignee: Alcatel Lucent
    Inventors: Erwan Godot, Remi Thollot, Amaud Favre
  • METHOD FOR TREATING A TRANSPORT SUPPORT FOR THE CONVEYANCE AND ATMOSPHERIC STORAGE OF SEMICONDUCTOR SUBSTRATES, AND TREATMENT STATION FOR THE IMP LEMENTATION OF SUCH A METHOD
    Publication number: 20100282272
    Abstract: The aim of the invention is to provide a method for the treatment of a transport support (1) for the conveyance and storage of semiconductor substrates, with said support (1) possibly having first undergone a cleaning operation using a liquid. The method includes a treatment stage in which the transport support (1) is placed in a sealed chamber (4) connected to a vacuum pump (5) and said transport support (1) is subjected to the combined action of a subatmospheric pressure and infrared radiation to favor the removal of foreign bodies on the walls of the transport support (1). The invention also concerns a treatment station for a transport support (1) for implementation of the method.
    Type: Application
    Filed: August 11, 2008
    Publication date: November 11, 2010
    Inventors: Erwan Godot, Remi Thollot, Amaud Favre
  • Method and device for monitoring the contamination of substrate wafers
    Patent number: 7790479
    Abstract: A device is used to measure contamination directly in transport enclosures of FOUP or SMIF type, for example. The transport enclosure is placed on an adapter that sets up direct communication between it and an external gas analyzer. The gas analyzer ionizes the sampled gases and performs the analysis by measuring a parameter of the ions resulting from this ionization. This measures very low levels of gaseous contamination in real time.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: September 7, 2010
    Assignee: Alcatel
    Inventors: Arnaud Favre, Remi Thollot, Xavier Metais, Jean-Pierre Desbiolles, Francoise Desbiolles, legal representative
  • Method and device for monitoring the contamination of substrate wafers
    Publication number: 20060292037
    Abstract: A device is used to measure contamination directly in transport enclosures of FOUP or SMIF type, for example. The transport enclosure is placed on an adapter that sets up direct communication between it and an external gas analyzer. The gas analyzer ionizes the sampled gases and performs the analysis by measuring a parameter of the ions resulting from this ionization. This measures very low levels of gaseous contamination in real time.
    Type: Application
    Filed: March 17, 2006
    Publication date: December 28, 2006
    Inventors: Arnaud Favre, Remi Thollot, Xavier Metais, Jean-Pierre Desbiolles