Patents by Inventor Remko Wakker
Remko Wakker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9019476Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.Type: GrantFiled: May 24, 2011Date of Patent: April 28, 2015Assignee: ASML Netherlands B.V.Inventors: Rene Theodorus Petrus Compen, Oleg Voznyi, Martijn Houben, Majid El Bouchaibi, Franciscus Johannes Maria Boekholt, Remko Wakker
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Publication number: 20110222045Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.Type: ApplicationFiled: May 24, 2011Publication date: September 15, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Rene Theodorus Petrus COMPEN, Oleg VOZNYI, Martijn HOUBEN, Majid EL BOUCHAIBI, Franciscus Johannes Maria BOEKHOLT, Remko WAKKER
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Patent number: 7978308Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.Type: GrantFiled: May 15, 2006Date of Patent: July 12, 2011Assignee: ASML Netherlands B.V.Inventors: Rene Theodorus Petrus Compen, Oleg Voznyi, Martijn Houben, Majid El Bouchaibi, Franciscus Johannes Maria Boekholt, Remko Wakker
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Patent number: 7830495Abstract: A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.Type: GrantFiled: July 10, 2007Date of Patent: November 9, 2010Assignee: ASML Netherlands B.V.Inventors: Olaf Hubertus Wilhelmus Van Bruggen, Marcel Koenraad Marie Baggen, Johannes Roland Dassel, Remko Wakker, Stoyan Nihtianov, Frank Auer, Frits Van Der Meulen, Patrick David Vogelsang, Martinus Cornelis Reijnen, Tom Van Zutphen
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Patent number: 7808612Abstract: A method of removing a substrate from a substrate table of a lithographic apparatus. The substrate table is provided with a mask arranged to form a peripheral exposure exclusion region on a substrate. The method includes moving the mask from an in use position to a storage position. The storage position is adjacent to a projection system of the lithographic apparatus. The method also includes removing the substrate from the lithographic apparatus.Type: GrantFiled: April 5, 2007Date of Patent: October 5, 2010Assignee: ASML Netherlands B.V.Inventors: Remko Wakker, Erik Marie Jose Smeets
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Patent number: 7777863Abstract: A substrate table for a lithographic apparatus includes a mask constructed and arranged to prevent exposure of a peripheral exposure region of a substrate on the substrate table. The mask is attached to a moveable carrier. The moveable carrier has a range of movement which at least partially circumnavigates the substrate table.Type: GrantFiled: May 30, 2007Date of Patent: August 17, 2010Assignee: ASML Netherlands B.V.Inventors: Erik Marie José Smeets, Remko Wakker
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Publication number: 20090015246Abstract: A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.Type: ApplicationFiled: July 10, 2007Publication date: January 15, 2009Applicant: ASML Netherlands B.V.Inventors: Olaf Hubertus Wilhelmus Van Bruggen, Frank Auer, Marcel Koenraad Marie Baggen, Frits Van Der Meulen, Patrick David Vogelsang, Martinus Cornelis Reijnen, Johannes Roland Dassel, Stoyan Nihtianov, Remko Wakker, Tom Van Zutphen
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Publication number: 20080297748Abstract: A substrate table for a lithographic apparatus includes a mask constructed and arranged to prevent exposure of a peripheral exposure region of a substrate on the substrate table. The mask is attached to a moveable carrier. The moveable carrier has a range of movement which at least partially circumnavigates the substrate table.Type: ApplicationFiled: May 30, 2007Publication date: December 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Erik Marie Jose Smeets, Remko Wakker
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Publication number: 20080246935Abstract: A method of removing a substrate from a substrate table of a lithographic apparatus. The substrate table is provided with a mask arranged to form a peripheral exposure exclusion region on a substrate. The method includes moving the mask from an in use position to a storage position. The storage position is adjacent to a projection system of the lithographic apparatus. The method also includes removing the substrate from the lithographic apparatus.Type: ApplicationFiled: April 5, 2007Publication date: October 9, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Remko Wakker, Erik Marie Jose Smeets
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Publication number: 20070263200Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate table support structure, and a second clamping system configured to clamp a substrate to the substrate table after the substrate table has been clamped to the substrate table support structure.Type: ApplicationFiled: May 15, 2006Publication date: November 15, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Rene Petrus Compen, Oleg Voznyi, Martijn Houben, Majid Bouchaibi, Franciscus Boekholt, Remko Wakker