Abstract: For controlling movement of a cantilever of an offshore platform, displacements required for displacing an item to a target position including longitudinal skidding displacement and transverse skidding displacement of the cantilever of the cantilever are determined from current position data and target position data. From position dependent support load data support loads during the longitudinal skidding displacement are determined. If and until a sum of support loads or a highest support load decreases during the longitudinal skidding displacement towards the target position, the longitudinal skidding displacement precedes the transverse skidding displacement. If a sum of support loads or a highest support load increases during the longitudinal skidding displacement towards the target position, the transverse skidding displacement towards the target position precedes the longitudinal skidding displacement.

Abstract: For controlling movement of a cantilever of an offshore platform, displacements required for displacing an item to a target position including longitudinal skidding displacement and transverse skidding displacement of the cantilever of the cantilever are determined from current position data and target position data. From position dependent support load data support loads during the longitudinal skidding displacement are determined. If and until a sum of support loads or a highest support load decreases during the longitudinal skidding displacement towards the target position, the longitudinal skidding displacement precedes the transverse skidding displacement. If a sum of support loads or a highest support load increases during the longitudinal skidding displacement towards the target position, the transverse skidding displacement towards the target position precedes the longitudinal skidding displacement.

Abstract: A method for monitoring movement of a cantilever structure of an offshore platform, such as a jack-up platform or a self-elevating vessel, comprising providing a boundary model containing boundary limiting information of positions of the cantilever structure, wherein the boundary limiting information comprises at least position information of boundary limiting elements, such as obstacles; providing, during movement of the cantilever, position information of the cantilever representing an actual position of the cantilever; determining, during movement of the cantilever, a difference between the cantilever position information and the boundary limiting information of the boundary model; providing an output signal when the determined difference exceeds a predefined threshold value.

Abstract: A method for monitoring movement of a cantilever structure of an offshore platform, such as a jack-up platform or a self-elevating vessel, comprising providing a boundary model containing boundary limiting information of positions of the cantilever structure, wherein the boundary limiting information comprises at least position information of boundary limiting elements, such as obstacles; providing, during movement of the cantilever, position information of the cantilever representing an actual position of the cantilever; determining, during movement of the cantilever, a difference between the cantilever position information and the boundary limiting information of the boundary model; providing an output signal when the determined difference exceeds a predefined threshold value.

Abstract: The invention is directed to an arrangement for the suppression of unwanted spectral components (‘out-of-band’ radiation, as it is called) in a plasma-based radiation source. The object of the invention is to find a novel possibility for the suppression of unwanted spectral components in radiation exiting from a plasma-based EUV radiation source which permits a simple suppression of out-of-band radiation outside the desired EUV range without requiring costly manufacturing and adjustment of diffraction gratings. This object is met according to the invention in that a filter unit is provided between the plasma and an application location of the EUV radiation, which filter unit has at least one gas curtain comprising at least one rapidly flowing gas whose molecules have no absorption maxima for the desired EUV radiation and intensive absorption maxima for other, unwanted wavelengths that are emitted, at least in the IR region.

Abstract: The invention is directed to a method and arrangements for the suppression of debris in short-wavelength radiation sources based on a plasma, particularly for EUV sources for semiconductor lithography. The object of the invention is to find a novel possibility for suppressing the particle flow (debris) from a plasma which keeps the debris away from primarily optical components located downstream without excessive attenuation of the desired radiation emitted from the plasma. According to the invention, this object is met in that a buffer gas is injected inside the filter structure of the debris filter lateral to openings that are provided for passing the radiation.

Abstract: The invention is directed to a method and arrangements for the suppression of debris in short-wavelength radiation sources based on a plasma, particularly for EUV sources for semiconductor lithography. The object of the invention is to find a novel possibility for suppressing the particle flow (debris) from a plasma which keeps the debris away from primarily optical components located downstream without excessive attenuation of the desired radiation emitted from the plasma. According to the invention, this object is met in that a buffer gas is injected inside the filter structure of the debris filter lateral to openings that are provided for passing the radiation.