Patents by Inventor Rena MUKAIYAMA

Rena MUKAIYAMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10649337
    Abstract: Provided is a positive type lithographic printing plate precursor including at least: a support which has a hydrophilic surface or a hydrophilic layer; and an underlayer, an interlayer, and an upper layer on the support in this order, in which the underlayer contains a polymer compound 1 which has at least one structure selected from the group consisting of a urethane bond, an acetal structure, and a urea bond in a main chain, the interlayer contains a polymer compound 2 which has at least one structure selected from the group consisting of a sulfonamide group, an active imide group, and a urea bond in a side chain, the upper layer contains a polymer compound 3 which has a phenolic hydroxy group, and one or more layers among the underlayer, the interlayer, and the upper layer contain an infrared absorbent.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: May 12, 2020
    Assignee: FUJIFILM CORPORATION
    Inventors: Takashi Sato, Rena Mukaiyama, Yuichi Yasuhara
  • Patent number: 10564545
    Abstract: A photosensitive resin composition contains a polymer compound having a linking group represented by Formula A-1 in the main chain; and an infrared absorbing material. In Formula A-1, R1 and R2 each independently represent a hydrogen atom or a monovalent organic group, and X1 is a specific linking group.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: February 18, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Rena Mukaiyama, Atsuyasu Nozaki, Takashi Sato, Kotaro Asano
  • Patent number: 10363733
    Abstract: Provided are a photosensitive resin composition which enables production of a lithographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a lithographic printing plate having excellent chemical resistance and excellent printing durability, a lithographic printing plate precursor obtained by using the photosensitive resin composition, a method for producing a lithographic printing plate, and a new polymer compound. The photosensitive resin composition of the present invention contains: a polymer compound which has an amine bond or a quaternary ammonium salt bond, and at least one bond selected from the group consisting of a urea bond, a urethane bond, and a carbonate bond in the main chain and has a sulfonamide group or a phenolic hydroxyl group in the main chain and/or the side chain; and an infrared absorbing material.
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: July 30, 2019
    Assignee: FUJIFILM CORPORATION
    Inventors: Atsuyasu Nozaki, Takashi Sato, Rena Mukaiyama
  • Publication number: 20190212652
    Abstract: Provided is a positive type lithographic printing plate precursor including at least: a support which has a hydrophilic surface or a hydrophilic layer; and an underlayer, an interlayer, and an upper layer on the support in this order, in which the underlayer contains a polymer compound 1 which has at least one structure selected from the group consisting of a urethane bond, an acetal structure, and a urea bond in a main chain, the interlayer contains a polymer compound 2 which has at least one structure selected from the group consisting of a sulfonamide group, an active imide group, and a urea bond in a side chain, the upper layer contains a polymer compound 3 which has a phenolic hydroxy group, and one or more layers among the underlayer, the interlayer, and the upper layer contain an infrared absorbent.
    Type: Application
    Filed: March 13, 2019
    Publication date: July 11, 2019
    Inventors: Takashi SATO, Rena MUKAIYAMA, Yuichi YASUHARA
  • Patent number: 10338469
    Abstract: A photosensitive resin composition contains a polymer compound having a constitutional unit represented by the following Formula A-1 as a constitutional unit A and at least one constitutional unit among constitutional units represented by the following Formulas B-1 to B-6 as a constitutional unit B in the main chain, and an infrared absorbing material.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: July 2, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Kotaro Asano, Atsuyasu Nozaki, Takashi Sato, Rena Mukaiyama, Kazuto Shimada
  • Publication number: 20170173938
    Abstract: Provided are a photosensitive resin composition which enables production of a lithographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a lithographic printing plate having excellent chemical resistance and excellent printing durability, a lithographic printing plate precursor obtained by using the photosensitive resin composition, a method for producing a lithographic printing plate, and a new polymer compound. The photosensitive resin composition of the present invention contains: a polymer compound which has an amine bond or a quaternary ammonium salt bond, and at least one bond selected from the group consisting of a urea bond, a urethane bond, and a carbonate bond in the main chain and has a sulfonamide group or a phenolic hydroxyl group in the main chain and/or the side chain; and an infrared absorbing material.
    Type: Application
    Filed: March 2, 2017
    Publication date: June 22, 2017
    Inventors: Atsuyasu NOZAKI, Takashi SATO, Rena MUKAIYAMA
  • Publication number: 20170017153
    Abstract: There is provided a photosensitive resin composition which enables production of a lithographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a lithographic printing plate having excellent printing durability and excellent chemical resistance, a lithographic printing plate precursor obtained by using the photosensitive resin composition, and a method for producing a lithographic printing plate. The photosensitive resin composition contains a polymer compound having a constitutional unit represented by the following Formula A-1 as a constitutional unit A and at least one constitutional unit among constitutional units represented by the following Formulas B-1 to B-6 as a constitutional unit B in the main chain, and an infrared absorbing material.
    Type: Application
    Filed: September 29, 2016
    Publication date: January 19, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Kotaro ASANO, Atsuyasu NOZAKI, Takashi SATO, Rena MUKAIYAMA, Kazuto SHIMADA
  • Publication number: 20170017154
    Abstract: There is provided a photosensitive resin composition which enables production of a lithographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a lithographic printing plate having excellent printing durability, excellent chemical resistance, and, in particular, excellent printing durability at the time of using a low quality print material, a lithographic printing plate precursor obtained by using the photosensitive resin composition, and a method for producing a lithographic printing plate. The photosensitive resin composition contains a polymer compound having a linking group represented by Formula A-1 in the main chain; and an infrared absorbing material. In Formula A-1, R1 and R2 each independently represent a hydrogen atom or a monovalent organic group, and X1 is a specific linking group.
    Type: Application
    Filed: September 28, 2016
    Publication date: January 19, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Rena MUKAIYAMA, Atsuyasu NOZAKI, Takashi SATO, Kotaro ASANO