Patents by Inventor Rena Sturuoka

Rena Sturuoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition Method and Method for Manufacturing Deposition Substrate
    Publication number: 20130005121
    Abstract: One embodiment of the present invention is a deposition method for forming a layer 13a containing a deposition material on a deposition target surface of a second substrate, comprising the steps of forming an absorbing layer 12 over one surface of a first substrate 11; forming a material layer 13 containing the deposition material over the absorbing layer; performing first heat treatment on the material layer from the other surface of the first substrate to a temperature lower than the sublimation temperature of the deposition material so as to remove an impurity 14 in the material layer 13; disposing the one surface of the first substrate and the deposition target surface of the second substrate to face each other; and performing second heat treatment on the material layer from the other surface of the first substrate.
    Type: Application
    Filed: February 28, 2011
    Publication date: January 3, 2013
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Takahiro Ibe, Tomoya Aoyama, Rena Sturuoka, Satoshi Inoue, Tohru Sonoda