Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.

Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.

Abstract: An ultrasonic transducer system is provided for monitoring or treating a liquid medium (5) within a processing vessel, (8) such as a melting tank or a vessel with an chemically aggressive liquid medium. The purpose of monitoring can be characterization of flow velocities, melt surface levels and inhomogeneities in the liquid medium. The ultrasonic transducer system comprises at least one electro-acoustical transducer element (1) and an acoustic waveguide (3,4). A first extremity of the acoustic waveguide is connected to the transducer element outside the processing vessel, while a second extremity of the acoustic waveguide extends inside the processing vessel. The acoustic waveguide comprises one or more cavities (4) which extend throughout the whole acoustic waveguide's length. The cavities may be closed (6) at the acoustic waveguide's second extremity.

Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.

Abstract: System comprising at least one ultrasonic transducer (3) outside a room like a tube or vessel. The transducer is fit for transmitting and/or receiving an ultrasonic beam (6) into respectively from the interior of said room through the room's wall (2). The system comprises a matching element (5) at the interior's side of the wall, fit for matching the acoustic impedance and/or the sound speed of the wall material (2) and the those of the medium residing (1) within said room. The matching element may be mounted within a cavity in said wall, and may have a shape, at the side of the room, conforming to the room's inside shape. The matching element may have, at the side of the transducer, an arbitrarily curved shape, designed to obtain a certain desired beam directivity and/or to compensate for diffraction effects.

Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.

Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.

Abstract: A method and an apparatus for determining the velocity, direction and other magnitudes of a flow, in particular a gas flow, in which a strongly damped acoustic signal is emitted by a first transducer in a first direction through the flow towards a second transducer producing a damped electric signal, the first deflection thereof being compared with a threshold value which is lower than the peak value of said deflection, and exceeding said threshold value being used as the end of the time measurement period started at the emission of the acoustic signal by said first transducer. In particular a single first transducer is used, and a reflecting body is placed in front of said first transducer, adapted to reflect the acoustic pulses emitted by said transducer through the flow in different directions towards one or more second transducers.