Patents by Inventor Rene Carpaij

Rene Carpaij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method to Determine the Value of Process Parameters BAsed on Scatterometry Data
    Publication number: 20070222979
    Abstract: A method according to an embodiment includes obtaining calibration measurement data, with an optical detection apparatus, from a plurality of marker structure sets provided on a calibration substrate. Each marker structure set includes at least one calibration marker structure created using different known values of the process parameter. The method includes obtaining measurement data, with the optical detection apparatus, from at least one marker structure provided on a substrate and exposed using an unknown value of the process parameter; and determining the unknown value of the process parameter from the obtained measurement data by employing regression coefficients in a model based on the known values of the process parameter and the calibration measurement data.
    Type: Application
    Filed: February 22, 2005
    Publication date: September 27, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Van Der Laan, Rene Carpaij, Hugo Cramer, Antoine Kiers
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050264790
    Abstract: A lithographic apparatus comprises an illumination system for providing a projection beam of radiation and a support structure for supporting a patterning device which impart the projection beam with a pattern in its cross-section. The patterning device has a non-flat critical dimension (CD) profile across its width. A projection system projects the patterned beam onto a target portion of a substrate. Dose variation device for varying the radiation dose across the width of the target portion compensates for the non-flat CD profile of the patterning device.
    Type: Application
    Filed: June 1, 2004
    Publication date: December 1, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maurice Janssen, Rene Carpaij, Jan Van Schoot
  • Method to determine the value of process parameters based on scatterometry data
    Publication number: 20050185174
    Abstract: A method according to an embodiment includes obtaining calibration measurement data, with an optical detection apparatus, from a plurality of marker structure sets provided on a calibration substrate. Each marker structure set includes at least one calibration marker structure created using different known values of the process parameter. The method includes obtaining measurement data, with the optical detection apparatus, from at least one marker structure provided on a substrate and exposed using an unknown value of the process parameter; and determining the unknown value of the process parameter from the obtained measurement data by employing regression coefficients in a model based on the known values of the process parameter and the calibration measurement data.
    Type: Application
    Filed: May 26, 2004
    Publication date: August 25, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Laan, Rene Carpaij, Hugo Cramer, Antoine Kiers