Patents by Inventor Renshun You

Renshun You has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180111405
    Abstract: A micro-optical device for double-sided imaging, a preparation method therefor and an application thereof. The micro-optical device for double-sided imaging comprises a first microlens layer (1), a functional layer (4), a second microlens layer (2) and a miniature graphic layer (3) which are mutually compounded in sequence, the first microlens layer (1) being a first microlens array formed by arranging a plurality of first microlenses (11), and the second microlens layer (2) being a second microlens array formed by arranging a plurality of second microlenses (21); and the functional layer (4) is arranged on the surface of the second microlens layer (2), and a material for the functional layer (4) has a refractive index different from that of a surrounding material.
    Type: Application
    Filed: December 9, 2015
    Publication date: April 26, 2018
    Inventors: Liangheng Xu, Xiaolei Zhuang, Lanxin Dong, Renshun You
  • Patent number: 8334082
    Abstract: A sensitive liquid crystalline polymeric material suitable for the reflective hologram recording and the preparing method thereof are disclosed. The material includes a base film, a buffer layer coated on one side of the base film, a sensitive polymeric layer coated on the other side of the buffer layer and a protective layer coated on the surface of the sensitive polymeric layer.
    Type: Grant
    Filed: July 29, 2008
    Date of Patent: December 18, 2012
    Assignee: Shanghai Techsun Anti-Counterfeiting Technology Holding Co., Ltd.
    Inventors: Liangheng Xu, Yun Gao, Renshun You, Kai Yang, Xuewen Xu
  • Publication number: 20110129764
    Abstract: A sensitive liquid crystalline polymeric material suitable for the reflective hologram recording and the preparing method thereof are disclosed. The material includes a base film, a buffer layer coated on one side of the base film, a sensitive polymeric layer coated on the other side of the buffer layer and a protective layer coated on the surface of the sensitive polymeric layer.
    Type: Application
    Filed: July 29, 2008
    Publication date: June 2, 2011
    Applicant: SHANGHAI FUNDAN TECHSUN NEW TECHNOLOGY CO. LTD.
    Inventors: Liangheng Xu, Yun Gao, Renshun You, Kai Yang, Xuewen Xu
  • Publication number: 20100167180
    Abstract: A photosensitive film for holographic recording and its production method thereof are disclosed. The film comprises a base film, a buffer layer coated on one side of the base film, a photosensitive polymer coating layer formed by applying a photosensitive coating on the other side of the buffer layer, and a surface protective film covering the surface of the photosensitive polymer coating layer. Interference fringe patterns of a holographic image or an amphichronic graph are recorded in the photosensitive polymer coating layer. The film according to the present invention is a photosensitive material composed of two polymers of different refractive indexes, when coherent light beams intersect in its recording medium and produce an interference fringe pattern in the medium, monomers therein are excited accordingly and undergo free radical polymerization, thereby forming a hologram.
    Type: Application
    Filed: March 19, 2008
    Publication date: July 1, 2010
    Inventors: Liangheng Xu, Yun Gao, Yang Shen, Renshun You