Abstract: A multi-station stereolithographic group, includes: support and movement apparatus for a modelling plate with respect to a fixed base facing the modelling plate, the fixed base including at least two work stations positioned in respective areas able to be reached by the modelling plate moved by the support and movement apparatus. Such a fixed base includes at least three work stations: at least one first station for forming an object, at least one second station for washing a formed object, at least one third station for stabilising a formed object.

Abstract: A cartridge for a stereolithographic machine, includes a body, which in turn, includes a container, delimited by walls, having a bottom, and an opposite access opening allowing access inside the container, inlet and outlet mouths for a photopolymerisable material, at least one tank for same. The tank includes a transit opening for a photopolymerisable material and an air passage opening communicating with the environment; and includes: circulation means to circulate the photopolymerisable material between the outlet mouth and the inlet mouth of the container. Between the circulation means and the inlet and outlet mouths, and between the circulation means and the transit and air passage openings, valve means are interposed, configured to alternatively allow various circulation configurations of the cartridge, either preventing or allowing passage of photopolymerisable material between the container and the tank; or allowing the passage of material between the outlet and inlet mouths of the same container.

Abstract: A stereolithography system includes a tank provided with a bottom and a stereolithography machine provided with a supporting frame and with a supporting structure operatively associated with the supporting frame and defining a housing configured to accommodate the tank. The tank includes a duct made of a deformable material and having a first mouth and a second mouth in fluid-dynamic communication with the tank; the supporting structure is configured in such a way as to assume, with respect to the supporting frame, a first position and a second position in which the tank is in an inclined position with respect to the bearing plane of the supporting frame, and the stereolithography machine includes a counteracting mechanism configured to be placed into contact with the duct in that second position.

Abstract: A stereolithography machine includes a support structure arranged resting on a substantially horizontal support plane having a reference direction, a tank, having a bottom, coupled with the support structure, a support group coupled with the support structure for the movement above the tank of a modelling plate so that the modelling surface of the modelling plate faces the bottom in a substantially parallel position. The tank includes a recirculation circuit configured to move a photosensitive liquid substance contained in the tank from a first end to a second end of the tank, both defined along the reference direction, to carry out inside the tank a continuous recirculation of the resin that, by gravity, flows out from the first end at a greater height, to the second end at a lower height, and the same resin is returned by the recirculation circuit from the second end to the first end.

Abstract: The invention is a cartridge (1, 100) for stereolithography machines (200), which comprises a supporting structure (3) provided with connection means (10) suited to removably connect it to the stereolithography machine (200), a first reservoir (5) suited to contain a material (M1, M2) and provided with a first duct (8) and with a delivery mouth (81) which are suited to place it in communication with a container (4), a feeding unit (7) suited to feed the material (M1, M2) from the first reservoir (5) to the container (4), shutter means (9) suited to close the delivery mouth (81) of the first duct (8), and a second reservoir (12) suited to contain the material (M1, M2). The cartridge (1, 100) furthermore comprises a second duct (13) interposed between the first reservoir (5) and the second reservoir (12) in such a way as to place them in communication with each other.

Abstract: The invention is a cartridge (1, 100) for stereolithography machines (200), which comprises a supporting structure (3) provided with connection means (10) suited to removably connect it to the stereolithography machine (200), a first reservoir (5) suited to contain a material (M1, M2) and provided with a first duct (8) and with a delivery mouth (81) which are suited to place it in communication with a container (4), a feeding unit (7) suited to feed the material (M1, M2) from the first reservoir (5) to the container (4), shutter means (9) suited to close the delivery mouth (81) of the first duct (8), and a second reservoir (12) suited to contain the material (M1, M2). The cartridge (1, 100) furthermore comprises a second duct (13) interposed between the first reservoir (5) and the second reservoir (12) in such a way as to place them in communication with each other.

Abstract: A stereolithography system includes a tank provided with a bottom and a stereolithography machine provided with a supporting frame and with a supporting structure operatively associated with the supporting frame and defining a housing configured to accommodate the tank. The tank includes a duct made of a deformable material and having a first mouth and a second mouth in fluid-dynamic communication with the tank; the supporting structure is configured in such a way as to assume, with respect to the supporting frame, a first position and a second position in which the tank is in an inclined position with respect to the bearing plane of the supporting frame, and the stereolithography machine includes a counteracting mechanism configured to be placed into contact with the duct in that second position.

Abstract: A cartridge for a stereolithographic machine, includes a body, which in turn, includes a container, delimited by walls, having a bottom, and an opposite access opening allowing access inside the container, inlet and outlet mouths for a photopolymerisable material, at least one tank for same. The tank includes a transit opening for a photopolymerisable material and an air passage opening communicating with the environment; and includes: circulation means to circulate the photopolymerisable material between the outlet mouth and the inlet mouth of the container. Between the circulation means and the inlet and outlet mouths, and between the circulation means and the transit and air passage openings, valve means are interposed, configured to alternatively allow various circulation configurations of the cartridge, either preventing or allowing passage of photopolymerisable material between the container and the tank; or allowing the passage of material between the outlet and inlet mouths of the same container.

Abstract: A multi-station stereolithographic group, includes: support and movement apparatus for a modelling plate with respect to a fixed base facing the modelling plate, the fixed base including at least two work stations positioned in respective areas able to be reached by the modelling plate moved by the support and movement apparatus. Such a fixed base includes at least three work stations: at least one first station for forming an object, at least one second station for washing a formed object, at least one third station for stabilising a formed object.

Abstract: A stereolithography machine comprising: a tank provided with a bottom; a modelling plate facing the bottom; a moving unit suited to move the modelling plate according to a direction of movement that is orthogonal to the bottom; a coupling unit between the modelling plate and the moving unit, comprising a first coupling member integral with the moving unit and a second coupling member integral with the modelling plate and movable with respect to the first coupling member according to the direction of movement; tightening means suited to be operated in such a way as to tighten the coupling members against each other according to a tightening direction that is orthogonal to the direction of movement, in order to lock the mutual movement of the coupling members.

Abstract: A stereolithography machine (1, 100, 200) that comprises a support structure (1a) arranged resting on a substantially horizontal support plane (?) having a reference direction (X), a tank (2) coupled with the support structure (1a) and provided with a bottom (2a), a support group (5) coupled with the support structure (1a) for the movement above the tank (2) of a modelling plate (3) so that the modelling surface (3a) of such a modelling plate (3) faces, substantially in a parallel position, the bottom (2a).

Abstract: A stereolithography machine comprising: a tank provided with a bottom; a modelling plate facing the bottom; a moving unit suited to move the modelling plate according to a direction of movement that is orthogonal to the bottom; a coupling unit between the modelling plate and the moving unit , comprising a first coupling member integral with the moving unit and a second coupling member integral with the modelling plate and movable with respect to the first coupling member according to the direction of movement; tightening means suited to be operated in such a way as to tighten the coupling members against each other according to a tightening direction that is orthogonal to the direction of movement, in order to lock the mutual movement of the coupling members.

Abstract: Stereolithography machine (1) comprising: a supporting frame (2); a tank (3) suited to contain a liquid substance; a supporting plate (4) associated with the supporting frame (2), suited to support the tank (3); a stopping unit (5) suited to firmly hold the tank (3) on the supporting plate (4) in a resting position; emitter means (6) suited to direct a predefined electromagnetic radiation (6a) towards the tank (3); a holding unit (7) of the tank (3) operatively associated with the supporting plate (4) through first actuator means (8) configured so as to move the tank (3) with respect to the supporting plate (4) according to a predefined trajectory of movement. The stopping unit (5) comprises second actuator means (17) that define for the stopping unit (5) an active configuration for holding the tank (3) and a rest configuration for releasing the tank (3).

Abstract: Stereolithography machine (1) comprising: a supporting frame (2); a tank (3) suited to contain a liquid substance; a supporting plate (4) associated with the supporting frame (2), suited to support the tank (3); a stopping unit (5) suited to firmly hold the tank (3) on the supporting plate (4) in a resting position; emitter means (6) suited to direct a predefined electromagnetic radiation (6a) towards the tank (3); a holding unit (7) of the tank (3) operatively associated with the supporting plate (4) through first actuator means (8) configured so as to move the tank (3) with respect to the supporting plate (4) according to a predefined trajectory of movement. The stopping unit (5) comprises second actuator means (17) that define for the stopping unit (5) an active configuration for holding the tank (3) and a rest configuration for releasing the tank (3).