Patents by Inventor Reto Schlittler

Reto Schlittler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8053037
    Abstract: A device for patterning structures on a substrate includes an imaging device having a scanning tip, a light emitting device, and a space around the scanning tip. The space comprises a vapor of a material which is suitable for Chemical Vapor Deposition onto the substrate when decomposed. The light emitting device is adapted to emit a light beam, which has an intensity not capable to decompose the vapor, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapor.
    Type: Grant
    Filed: November 9, 2004
    Date of Patent: November 8, 2011
    Assignee: International Business Machines Corporation
    Inventors: Siegfried F. Karg, Roland Germann, Heike E. Riel, Walter Heinrich Riess, Reto Schlittler
  • Patent number: 7847926
    Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.
    Type: Grant
    Filed: December 2, 2007
    Date of Patent: December 7, 2010
    Assignee: International Business Machines Corporation
    Inventors: Gerhard Meyer, Hanspeter Ott, Reto Schlittler, Percy Zahl
  • Publication number: 20090258166
    Abstract: A device for patterning structures on a substrate includes an imaging device having a scanning tip, a light emitting device, and a space around the scanning tip. The space comprises a vapour of a material which is suitable for Chemical Vapour Deposition onto the substrate when decomposed. The light emitting device is adapted to emit a light beam, which has an intensity not capable to decompose the vapour, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapour.
    Type: Application
    Filed: November 9, 2004
    Publication date: October 15, 2009
    Applicant: International Business Machines Corporation
    Inventors: Siegfried F. Karg, Roland Germann, Heike E. Riel, Walter Heinrich Riess, Reto Schlittler
  • Patent number: 7351604
    Abstract: A method for forming a microstructures is described. The method comprises: depositing a seed material on a substrate; growing a nanotube from the seed material; depositing microstructure material on the substrate to embed the nanotube in the microstructure material; and, detaching the substrate to release the microstructure. The resulting mictostructure comprises a body portion and a nanotube embedded in the body portion.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: April 1, 2008
    Assignee: International Business Machines Corporation
    Inventors: Graham Cross, Michel Despont, Urs T. Duerig, Grégoire Genolet, Reto Schlittler, Peter Vettiger
  • Publication number: 20080074656
    Abstract: The invention provides an apparatus for defining a pattern on a substrate (52). The apparatus comprises an emission source (48) for directing an emission (50) to the substrate (52), defining a working position (60) between the emission source (48) and the substrate (52), at least one shadow mask (66) having one or more apertures (68, 70, 72, 74) and at least one inspection device for inspecting the properties of the substrate (52) and/or the pattern, the inspection device having at least one inspection tool (82; 88, 90, 92, 94). The shadow mask (66) and the inspection tool (82; 88, 90, 92, 94) are separately provided on a movable portion (6), so that the shadow mask (66) and the inspection tool (82; 88, 90, 92, 94) are subsequently movable into the working position (60). The invention is further related to a method for defining a pattern on a substrate.
    Type: Application
    Filed: December 2, 2007
    Publication date: March 27, 2008
    Inventors: Gerhard Meyer, Hanspeter Ott, Reto Schlittler, Percy Zahl
  • Patent number: 7315367
    Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.
    Type: Grant
    Filed: June 16, 2005
    Date of Patent: January 1, 2008
    Assignee: International Business Machines Corporation
    Inventors: Gerhard Meyer, Hanspeter Ott, Reto Schlittler, Percy Zahl
  • Publication number: 20050280792
    Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.
    Type: Application
    Filed: June 16, 2005
    Publication date: December 22, 2005
    Applicant: International Business Machines Corporation
    Inventors: Gerhard Meyer, Hanspeter Ott, Reto Schlittler, Percy Zahl
  • Patent number: 6960782
    Abstract: Described is an electronic device comprising a junction formed between a first fullerene layer having a first doping concentration and a second fullerene layer having a second doping concentration different from the first doping concentration. The first doping concentration may be zero. The first and/or the second fullerene layer may be a monolayer. The second fullerene layer may comprise an electron donor. One example of such a device is a diode wherein the first fullerene layer is connected to an anode and the second fullerene layer is connected to a cathode. Another example is a field effect transistor wherein the first fullerene layer serves as a gate region and the second fullerene layer serves as a channel region. The second fullerene layer may alternatively comprise an electron acceptor. At least one of the first and second fullerene layers may be formed from C60, or may consist of a single bucky ball.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: November 1, 2005
    Assignee: International Business Machines Corporation
    Inventors: Rolf Allenspach, Urs T. Duerig, Walter Riess, Reto Schlittler
  • Publication number: 20050130551
    Abstract: A method for forming a microstructures is described. The method comprises: depositing a seed material on a substrate; growing a nanotube from the seed material; depositing microstructure material on the substrate to embed the nanotube in the microstructure material; and, detaching the substrate to release the microstructure. The resulting mictostructure comprises a body portion and a nanotube embedded in the body portion.
    Type: Application
    Filed: November 21, 2002
    Publication date: June 16, 2005
    Inventors: Graham Cross, Michel Despont, Urs Duerig, Gregoire Genolet, Reto Schlittler
  • Patent number: 6800369
    Abstract: The invention is directed to a method of manufacturing single-walled carbon nanotubes comprising the steps of providing on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst, and heating the at least one pillar in the presence of a first magnetic or electric field. It further is directed to a precursor arrangement for manufacturing single-walled carbon nanotubes comprising on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst. A third aspect is a nanotube arrangement comprising a substrate and thereupon at least one crystal comprising a bundle of single-walled carbon nanotubes with essentially identical orientation and structure.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: October 5, 2004
    Assignee: International Business Machines Corporation
    Inventors: James Gimzewski, Reto Schlittler, Jin Won Seo
  • Publication number: 20040115114
    Abstract: The invention is directed to a method of manufacturing single-walled carbon nanotubes comprising the steps of providing on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst, and heating the at least one pillar. It further is directed to a precursor arrangement for manufacturing single-walled carbon nanotubes comprising on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst. A third aspect is a nanotube arrangement comprising a substrate and thereupon at least one crystal comprising a bundle of single-walled carbon nanotubes with essentially identical orientation and structure.
    Type: Application
    Filed: February 5, 2004
    Publication date: June 17, 2004
    Inventors: James Gimzewski, Jin Woo Seo, Reto Schlittler, Mark E Welland
  • Publication number: 20040016922
    Abstract: Described is an electronic device comprising a junction formed between a first fullerene layer having a first doping concentration and a second fullerene layer having a second doping concentration different from the first doping concentration. The first doping concentration may be zero. The first and/or the second fullerene layer may be a monolayer. The second fullerene layer may comprise an electron donor. One example of such a device is a diode wherein the first fullerene layer is connected to an anode and the second fullerene layer is connected to a cathode. Another example is a field effect transistor wherein the first fullerene layer serves as a gate region and the second fullerene layer serves as a channel region. The second fullerene layer may alternatively comprise an electron acceptor. At least one of the first and second fullerene layers may be formed from C60, or may consist of a single bucky ball.
    Type: Application
    Filed: April 28, 2003
    Publication date: January 29, 2004
    Inventors: Rolf Allenspach, Urs T. Duerig, Walter Riess, Reto Schlittler
  • Publication number: 20020130610
    Abstract: The invention is directed to a method of manufacturing single-walled carbon nanotubes comprising the steps of providing on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst, and heating the at least one pillar in the presence of a first magnetic or electric field. It further is directed to a precursor arrangement for manufacturing single-walled carbon nanotubes comprising on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst. A third aspect is a nanotube arrangement comprising a substrate and thereupon at least one crystal comprising a bundle of single-walled carbon nanotubes with essentially identical orientation and structure.
    Type: Application
    Filed: November 9, 2001
    Publication date: September 19, 2002
    Inventors: James Gimzewski, Reto Schlittler, Jin Won Seo