Patents by Inventor Reto Schlittler
Reto Schlittler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8053037Abstract: A device for patterning structures on a substrate includes an imaging device having a scanning tip, a light emitting device, and a space around the scanning tip. The space comprises a vapor of a material which is suitable for Chemical Vapor Deposition onto the substrate when decomposed. The light emitting device is adapted to emit a light beam, which has an intensity not capable to decompose the vapor, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapor.Type: GrantFiled: November 9, 2004Date of Patent: November 8, 2011Assignee: International Business Machines CorporationInventors: Siegfried F. Karg, Roland Germann, Heike E. Riel, Walter Heinrich Riess, Reto Schlittler
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Patent number: 7847926Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.Type: GrantFiled: December 2, 2007Date of Patent: December 7, 2010Assignee: International Business Machines CorporationInventors: Gerhard Meyer, Hanspeter Ott, Reto Schlittler, Percy Zahl
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Publication number: 20090258166Abstract: A device for patterning structures on a substrate includes an imaging device having a scanning tip, a light emitting device, and a space around the scanning tip. The space comprises a vapour of a material which is suitable for Chemical Vapour Deposition onto the substrate when decomposed. The light emitting device is adapted to emit a light beam, which has an intensity not capable to decompose the vapour, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapour.Type: ApplicationFiled: November 9, 2004Publication date: October 15, 2009Applicant: International Business Machines CorporationInventors: Siegfried F. Karg, Roland Germann, Heike E. Riel, Walter Heinrich Riess, Reto Schlittler
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Patent number: 7351604Abstract: A method for forming a microstructures is described. The method comprises: depositing a seed material on a substrate; growing a nanotube from the seed material; depositing microstructure material on the substrate to embed the nanotube in the microstructure material; and, detaching the substrate to release the microstructure. The resulting mictostructure comprises a body portion and a nanotube embedded in the body portion.Type: GrantFiled: November 21, 2002Date of Patent: April 1, 2008Assignee: International Business Machines CorporationInventors: Graham Cross, Michel Despont, Urs T. Duerig, Grégoire Genolet, Reto Schlittler, Peter Vettiger
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Publication number: 20080074656Abstract: The invention provides an apparatus for defining a pattern on a substrate (52). The apparatus comprises an emission source (48) for directing an emission (50) to the substrate (52), defining a working position (60) between the emission source (48) and the substrate (52), at least one shadow mask (66) having one or more apertures (68, 70, 72, 74) and at least one inspection device for inspecting the properties of the substrate (52) and/or the pattern, the inspection device having at least one inspection tool (82; 88, 90, 92, 94). The shadow mask (66) and the inspection tool (82; 88, 90, 92, 94) are separately provided on a movable portion (6), so that the shadow mask (66) and the inspection tool (82; 88, 90, 92, 94) are subsequently movable into the working position (60). The invention is further related to a method for defining a pattern on a substrate.Type: ApplicationFiled: December 2, 2007Publication date: March 27, 2008Inventors: Gerhard Meyer, Hanspeter Ott, Reto Schlittler, Percy Zahl
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Patent number: 7315367Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.Type: GrantFiled: June 16, 2005Date of Patent: January 1, 2008Assignee: International Business Machines CorporationInventors: Gerhard Meyer, Hanspeter Ott, Reto Schlittler, Percy Zahl
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Publication number: 20050280792Abstract: The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.Type: ApplicationFiled: June 16, 2005Publication date: December 22, 2005Applicant: International Business Machines CorporationInventors: Gerhard Meyer, Hanspeter Ott, Reto Schlittler, Percy Zahl
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Patent number: 6960782Abstract: Described is an electronic device comprising a junction formed between a first fullerene layer having a first doping concentration and a second fullerene layer having a second doping concentration different from the first doping concentration. The first doping concentration may be zero. The first and/or the second fullerene layer may be a monolayer. The second fullerene layer may comprise an electron donor. One example of such a device is a diode wherein the first fullerene layer is connected to an anode and the second fullerene layer is connected to a cathode. Another example is a field effect transistor wherein the first fullerene layer serves as a gate region and the second fullerene layer serves as a channel region. The second fullerene layer may alternatively comprise an electron acceptor. At least one of the first and second fullerene layers may be formed from C60, or may consist of a single bucky ball.Type: GrantFiled: April 28, 2003Date of Patent: November 1, 2005Assignee: International Business Machines CorporationInventors: Rolf Allenspach, Urs T. Duerig, Walter Riess, Reto Schlittler
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Publication number: 20050130551Abstract: A method for forming a microstructures is described. The method comprises: depositing a seed material on a substrate; growing a nanotube from the seed material; depositing microstructure material on the substrate to embed the nanotube in the microstructure material; and, detaching the substrate to release the microstructure. The resulting mictostructure comprises a body portion and a nanotube embedded in the body portion.Type: ApplicationFiled: November 21, 2002Publication date: June 16, 2005Inventors: Graham Cross, Michel Despont, Urs Duerig, Gregoire Genolet, Reto Schlittler
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Patent number: 6800369Abstract: The invention is directed to a method of manufacturing single-walled carbon nanotubes comprising the steps of providing on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst, and heating the at least one pillar in the presence of a first magnetic or electric field. It further is directed to a precursor arrangement for manufacturing single-walled carbon nanotubes comprising on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst. A third aspect is a nanotube arrangement comprising a substrate and thereupon at least one crystal comprising a bundle of single-walled carbon nanotubes with essentially identical orientation and structure.Type: GrantFiled: November 9, 2001Date of Patent: October 5, 2004Assignee: International Business Machines CorporationInventors: James Gimzewski, Reto Schlittler, Jin Won Seo
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Publication number: 20040115114Abstract: The invention is directed to a method of manufacturing single-walled carbon nanotubes comprising the steps of providing on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst, and heating the at least one pillar. It further is directed to a precursor arrangement for manufacturing single-walled carbon nanotubes comprising on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst. A third aspect is a nanotube arrangement comprising a substrate and thereupon at least one crystal comprising a bundle of single-walled carbon nanotubes with essentially identical orientation and structure.Type: ApplicationFiled: February 5, 2004Publication date: June 17, 2004Inventors: James Gimzewski, Jin Woo Seo, Reto Schlittler, Mark E Welland
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Publication number: 20040016922Abstract: Described is an electronic device comprising a junction formed between a first fullerene layer having a first doping concentration and a second fullerene layer having a second doping concentration different from the first doping concentration. The first doping concentration may be zero. The first and/or the second fullerene layer may be a monolayer. The second fullerene layer may comprise an electron donor. One example of such a device is a diode wherein the first fullerene layer is connected to an anode and the second fullerene layer is connected to a cathode. Another example is a field effect transistor wherein the first fullerene layer serves as a gate region and the second fullerene layer serves as a channel region. The second fullerene layer may alternatively comprise an electron acceptor. At least one of the first and second fullerene layers may be formed from C60, or may consist of a single bucky ball.Type: ApplicationFiled: April 28, 2003Publication date: January 29, 2004Inventors: Rolf Allenspach, Urs T. Duerig, Walter Riess, Reto Schlittler
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Publication number: 20020130610Abstract: The invention is directed to a method of manufacturing single-walled carbon nanotubes comprising the steps of providing on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst, and heating the at least one pillar in the presence of a first magnetic or electric field. It further is directed to a precursor arrangement for manufacturing single-walled carbon nanotubes comprising on a substrate at least one pillar comprising alternate layers of a first precursor material comprising fullerene molecules and a second precursor material comprising a catalyst. A third aspect is a nanotube arrangement comprising a substrate and thereupon at least one crystal comprising a bundle of single-walled carbon nanotubes with essentially identical orientation and structure.Type: ApplicationFiled: November 9, 2001Publication date: September 19, 2002Inventors: James Gimzewski, Reto Schlittler, Jin Won Seo