Patents by Inventor Reuven Boxman

Reuven Boxman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210032131
    Abstract: A liquid treatment apparatus constituted of: a vessel arranged to contain liquid; at least one first electrode in contact with the liquid; at least one second electrode in contact with the liquid; an electrical pulse generator, a first polarity output of the electrical pulse generator coupled to each of the first electrodes and a second polarity output of the electrical pulse generator coupled to each of the second electrodes, the first polarity opposing the second polarity; at least one third electrode disposed in the liquid in the vessel, and a mechanical force generator arranged to provide a predetermined mechanical force along a predetermined path within the liquid, a portion of the mechanical force applied to the least one third electrode so as to chaotically interrupt a conducting pathway formed by the at least one third electrode between a pair of the first and second electrodes.
    Type: Application
    Filed: February 28, 2019
    Publication date: February 4, 2021
    Inventors: Nahum PARKANSKY, Reuven BOXMAN, Ariel MEIROVICH
  • Publication number: 20080223855
    Abstract: An observation window for a microwave device exhibiting microwave radiation of a predetermined frequency, the observation window comprising two optically transparent conductive films, each of the transparent conductive films primarily reflecting incident microwave radiation and being substantially parallel and spatially separated from each other by a predetermined distance, the predetermined distance being equal to an odd integer multiple of one quarter of the wavelength of the microwave radiation of the predetermined frequency in the interstice between the transparent films, the predetermined distance having a tolerance of plus or minus 0.15 of the wavelength in the interstice.
    Type: Application
    Filed: October 15, 2006
    Publication date: September 18, 2008
    Applicant: CLEARWAVE LTD.
    Inventors: Reuven Boxman, Vladimir Dikhtyar, Evgeny Gidalevich, Vladimir Zhitomirsky
  • Patent number: 6706157
    Abstract: A vacuum arc plasma gun deposition system includes a cathode, several anode assemblies that define a plasma channel, a current source for causing electrical current to flow from the anode assemblies to the cathode, a mechanism for moving the anode axially to keep the active surface of the cathode substantially at a fixed position relative to the anode assemblies, mechanisms for moving the anode assemblies to keep the cross sectional size of the plasma channel substantially constant, a mechanism for cooling the cathode by conducting heat away from lateral surfaces of the cathode, and mechanisms for ensuring that a non-flat substrate is coated uniformly. The scope of the invention includes methods of making coated products by depositing coatings on substrates using this vacuum arc plasma gun deposition system, and the coated products so made.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: March 16, 2004
    Assignee: TransArc Ltd.
    Inventors: Raymond Reuven Boxman, Samuel Goldsmith, Yair David
  • Publication number: 20040026232
    Abstract: A method for forming nanostructures on a workpiece includes the steps of: positioning a counter-electrode and a workpiece electrode arrangement relative to each other, such that, there is a gap between the counter-electrode and the workpiece electrode arrangement; and applying an electrical pulse between the workpiece electrode arrangement and the counter electrode, such that, an electrical discharge in produced in the gap. The electrical discharge forms at least one nanostructure in a first region of a surface of the workpiece electrode arrangement. The electrical pulse has a duration of less than one millisecond. The first region is selectively determined by a shape of the counter-electrode and a relative positioning of the workpiece electrode arrangement and the counter-electrode. The scope of the invention also includes a system for performing this method.
    Type: Application
    Filed: July 9, 2003
    Publication date: February 12, 2004
    Applicant: Ramot at Tel Aviv University Ltd.
    Inventors: Raymond Reuven Boxman, Nahum Parkansky
  • Publication number: 20030047444
    Abstract: A vacuum arc plasma gun deposition system includes a cathode, several anode assemblies that define a plasma channel, a current source for causing electrical current to flow from the anode assemblies to the cathode, a mechanism for moving the anode axially to keep the active surface of the cathode substantially at a fixed position relative to the anode assemblies, mechanisms for moving the anode assemblies to keep the cross sectional size of the plasma channel substantially constant, a mechanism for cooling the cathode by conducting heat away from lateral surfaces of the cathode, and mechanisms for ensuring that a non-flat substrate is coated uniformly. The scope of the invention includes methods of making coated products by depositing coatings on substrates using this vacuum arc plasma gun deposition system, and the coated products so made.
    Type: Application
    Filed: May 6, 2002
    Publication date: March 13, 2003
    Applicant: TRANSARC LTD.
    Inventors: Raymond Reuven Boxman, Samuel Goldsmith, Yair David