Abstract: A hub motor is disclosed, the hub motor is mounted on an axle assembly, the an axle assembly includes an axle rod and an axle sleeve, and an independent cassette flywheel is provided at one end of the axle sleeve where an end cover is located, a limiting sleeve is disposed outside of the cassette flywheel to prevent the cassette flywheel from detaching from the axle sleeve, and an anti-rotation piece for preventing rotation of the axle sleeve is provided at another end of the axle sleeve where a wheel hub is located.

Abstract: A hub motor is disclosed, the hub motor is mounted on an axle assembly, the an axle assembly includes an axle rod and an axle sleeve, and an independent cassette flywheel is provided at one end of the axle sleeve where an end cover is located, a limiting sleeve is disposed outside of the cassette flywheel to prevent the cassette flywheel from detaching from the axle sleeve, and an anti-rotation piece for preventing rotation of the axle sleeve is provided at another end of the axle sleeve where a wheel hub is located.

Abstract: A method includes receiving a broadcast message at a receiver device. The message includes identification information identifying a message-type associated with the message, reply-to information, and user information. The method further includes determining the received message is a broadcast message based on the message-type of the message and determining the message includes the reply-to information describing a reply-to address. The method additionally includes passing the user information contained within the message to a user interface when the message is a broadcast message including reply-to information and receiving an instruction from the user interface. The instruction is based on the user information and user input responsive to the user information. The method further includes producing and sending a reply message addressed to the reply-to address responsive to the instruction.

Abstract: An SMS CBS message includes location information that defines a relevant geographic area. A receiving device that is location aware is configured to receive the SMS CBS message and announce the message if the receiving device is within the relevant geographic area.

Abstract: A method includes receiving a broadcast message at a receiver device. The message includes identification information identifying a message-type associated with the message, reply-to information, and user information. The method further includes determining the received message is a broadcast message based on the message-type of the message and determining the message includes the reply-to information describing a reply-to address. The method additionally includes passing the user information contained within the message to a user interface when the message is a broadcast message including reply-to information and receiving an instruction from the user interface. The instruction is based on the user information and user input responsive to the user information. The method further includes producing and sending a reply message addressed to the reply-to address responsive to the instruction.

Abstract: A method is disclosed for accurately predicting the wet etch end points as a function of the temperature and concentration of the etching solution, as well as of the thickness of the film to be etched. This is accomplished by fitting an etch rate equation to the process of etching a film in terms of two constant parameters that are determined by one set of experiments performed on a given wet etch bench. Thereafter, the constants are used with the rate equation to calculate precisely the etch rate of a film, and then the etch rate is divided into a target film loss or a target film thickness to obtain etching time, or time to etch, which takes into account the variations in temperature and concentration, for example, of the acid in the solution. The resulting film either looses the specified amount of material, or acquires the specified thickness without incurring any damage, which is especially suited for sub-micron semiconductor technology where precise etching is required.

Abstract: Disclosed is a process for manufacturing a gate oxide of a MOSFET. Since the performance of the gate oxide is deteriorated in photo resist removing, DI healing and high temperature annealing are introduced to recover the gate oxide. A process for manufacturing the gate oxide of the MOSFET on a wafer, includes the steps of: pre-cleaning the wafer, forming gate oxide layer, coating a photo resist, exposing the photo resist, developing the photo resist, implanting ions over the developed photo resist, removing the photo resist, post-cleaning the gate oxide for the purpose of good attachment of a gate polysilicon layer, DI healing the gate oxide, and annealing the gate oxide at a high temperature. As a result, the pass rates for Ebd and Qbd tests of the gate oxide increase.