Abstract: Disclosed are inhibitors for TAF1. The TAF1 inhibitors are compounds having a structure according to one of the Formula described herein. Methods of using the disclosed compounds to treat proliferative disorders are also disclosed.

Abstract: Methods and electroplating systems for controlling plating electrolyte concentration on an electrochemical plating apparatus for substrates are disclosed. A method involves: (a) providing an electroplating solution to an electroplating system; (b) electroplating the metal onto the substrate while the substrate is held in a cathode chamber of an electroplating cell of electroplating system; (c) supplying the make-up solution to the electroplating system via a make-up solution inlet; and (d) supplying the secondary electroplating solution to the electroplating system via a secondary electroplating solution inlet. The secondary electroplating solution includes some or all components of the electroplating solution. At least one component of the secondary electroplating solution has a concentration that significantly deviates from its target concentration.

Abstract: Disclosed are inhibitors for TAF1. Methods of using the disclosed compounds to treat cancer are also disclosed.

Abstract: Methods and electroplating systems for controlling plating electrolyte concentration on an electrochemical plating apparatus for substrates are disclosed. A method involves: (a) providing an electroplating solution to an electroplating system; (b) electroplating the metal onto the substrate while the substrate is held in a cathode chamber of an electroplating cell of electroplating system; (c) supplying the make-up solution to the electroplating system via a make-up solution inlet; and (d) supplying the secondary electroplating solution to the electroplating system via a secondary electroplating solution inlet. The secondary electroplating solution includes some or all components of the electroplating solution. At least one component of the secondary electroplating solution has a concentration that significantly deviates from its target concentration.

Abstract: A fixation system (900) for the fixation of a first bone fragment (932) relative to a second bone fragment (934); the fixation system (900) comprising at least one first bone engagement element engagable with the first bone fragment (932), wherein the first bone engagement element has an elongate body portion, a proximal end, a distal end, and a passageway extending through the body portion from the proximal end to the distal end, at least one further bone engagement element engageable with the second bone fragment (934) and having a tensile element (920) securement portion for affixing a tensile element (920) to the further bone engagement element; wherein the tensile element (920) passing the first bone engagement element when engaged with the first bone fragment (932) is fixed relative to the further bone engagement element when engaged with the second bone fragment (934) by the tensile element (920) securement portion; such that the first bone fragment (932) is affixed relative to the second bone fragment

Abstract: Systems, apparatuses, and methods may provide for technology that arranges stair wells for memory devices. The memory device includes a memory array and a memory block coupled to the memory array. The memory block includes a first through array via area and a first staircase area coupled to a plurality of decks. The first staircase area includes a first stair well and a second stair well located contiguous to the first stair well.

Abstract: Methods and electroplating systems for controlling plating electrolyte concentration on an electrochemical plating apparatus for substrates are disclosed. A method involves: (a) providing an electroplating solution to an electroplating system; (b) electroplating the metal onto the substrate while the substrate is held in a cathode chamber of an electroplating cell of electroplating system; (c) supplying the make-up solution to the electroplating system via a make-up solution inlet; and (d) supplying the secondary electroplating solution to the electroplating system via a secondary electroplating solution inlet. The secondary electroplating solution includes some or all components of the electroplating solution. At least one component of the secondary electroplating solution has a concentration that significantly deviates from its target concentration.

Abstract: Methods and electroplating systems for controlling plating electrolyte concentration on an electrochemical plating apparatus for substrates are disclosed. A method involves: (a) providing an electroplating solution to an electroplating system; (b) electroplating the metal onto the substrate while the substrate is held in a cathode chamber of an electroplating cell of electroplating system; (c) supplying the make-up solution to the electroplating system via a make-up solution inlet; and (d) supplying the secondary electroplating solution to the electroplating system via a secondary electroplating solution inlet. The secondary electroplating solution includes some or all components of the electroplating solution. At least one component of the secondary electroplating solution has a concentration that significantly deviates from its target concentration.

Abstract: Disclosed herein are photonic materials. The photonic materials can comprise: a first layer comprising InxGa1-xN, wherein x is from 0 to 0.5; a second layer comprising ZnSnN2; and a third layer comprising InyGa1-yN, wherein y is from 0 to 0.5; wherein the second layer is disposed between and in contact with the first layer and the third layer, such that the second layer is sandwiched between the first layer and the third layer. In some examples, the photonic materials can be sandwiched between two or more barrier layers to form a quantum well.

Abstract: Methods and electroplating systems for controlling plating electrolyte concentration on an electrochemical plating apparatus for substrates are disclosed. A method involves: (a) providing an electroplating solution to an electroplating system; (b) electroplating the metal onto the substrate while the substrate is held in a cathode chamber of an electroplating cell of electroplating system; (c) supplying the make-up solution to the electroplating system via a make-up solution inlet; and (d) supplying the secondary electroplating solution to the electroplating system via a secondary electroplating solution inlet. The secondary electroplating solution includes some or all components of the electroplating solution. At least one component of the secondary electroplating solution has a concentration that significantly deviates from its target concentration.

Abstract: Methods and electroplating systems for controlling plating electrolyte concentration on an electrochemical plating apparatus for substrates are disclosed. A method involves: (a) providing an electroplating solution to an electroplating system; (b) electroplating the metal onto the substrate while the substrate is held in a cathode chamber of an electroplating cell of electroplating system; (c) supplying the make-up solution to the electroplating system via a make-up solution inlet; and (d) supplying the secondary electroplating solution to the electroplating system via a secondary electroplating solution inlet. The secondary electroplating solution includes some or all components of the electroplating solution. At least one component of the secondary electroplating solution has a concentration that significantly deviates from its target concentration.

Abstract: Disclosed herein are photonic materials. The photonic materials can comprise: a first layer comprising InxGa1-xN, wherein x is from 0 to 0.5; a second layer comprising ZnSnN2; and a third layer comprising InyGa1-yN, wherein y is from 0 to 0.5; wherein the second layer is disposed between and in contact with the first layer and the third layer, such that the second layer is sandwiched between the first layer and the third layer. In some examples, the photonic materials can be sandwiched between two or more barrier layers to form a quantum well.

Abstract: Methods and electroplating systems for controlling plating electrolyte concentration on an electrochemical plating apparatus for substrates are disclosed. A method involves: (a) providing an electroplating solution to an electroplating system; (b) electroplating the metal onto the substrate while the substrate is held in a cathode chamber of an electroplating cell of electroplating system; (c) supplying the make-up solution to the electroplating system via a make-up solution inlet; and (d) supplying the secondary electroplating solution to the electroplating system via a secondary electroplating solution inlet. The secondary electroplating solution includes some or all components of the electroplating solution. At least one component of the secondary electroplating solution has a concentration that significantly deviates from its target concentration.

Abstract: The antiseptic and fragrance-free soap includes about 5% to 30% percent by weight of deionized water, about 3% to 10% by weight of caustic soda, about 25% to 90% by weight of vegetable fat, and about 0.1% to 1% by weight of antibacterial nanoparticles. The vegetable fat can be selected from the group consisting of olive oil, coconut oil, palm oil, almond oil, jojoba oil, shea butter, or a combination thereof. The antibacterial nanoparticles are preferably silver nanoparticles made by any conventional method.

Abstract: The dual axis solar tracker apparatus and method uses an azimuth actuator to adjust the azimuth of an attached solar panel and an elevation actuator to adjust the elevation of a panel seat holding the solar panel to track the azimuth and elevation of the sun as it moves through the sky. The panel seat rotatably supports the solar panel with two pins, and a support structure supports the panel seat with an elevation tracking pivot. The actuators are controlled with an actuator controller circuit that is controlled by a microcontroller. The microcontroller uses information about latitude, longitude, time of day and date to control the actuators and track the motion of sun without the need for sensors.

Abstract: Described herein are D-?-A type sensitizers of the formula (I) or (II) having a novel central ?-conjugated unit di-thiazolyl-benzodiazole and dye-sensitized electrodes including a substrate having an electrically conductive surface, an oxide semiconductor film formed on the conductive surface, and the above sensitizer of formula (I) or (II), as specified above, supported on the film. A solar cell includes the above electrode, a counter electrode, and an electrolyte deposited there between. The sensitizers of formula (I) and (II) efficiently sensitize the semiconductor materials and show a high solar to electricity conversion efficiency.

Abstract: Described herein are D-?-A type sensitizers of the formula (I) or (II) having a novel central ?-conjugated unit di-thiazolyl-benzodiazole and dye-sensitized electrodes including a substrate having an electrically conductive surface, an oxide semiconductor film formed on the conductive surface, and the above sensitizer of formula (I) or (II), as specified above, supported on the film. A solar cell includes the above electrode, a counter electrode, and an electrolyte deposited there between. The sensitizers of formula (I) and (II) efficiently sensitize the semiconductor materials and show a high solar to electricity conversion efficiency.

Abstract: The dual axis solar tracker apparatus and method uses an azimuth actuator to adjust the azimuth of an attached solar panel and an elevation actuator to adjust the elevation of a panel seat holding the solar panel to track the azimuth and elevation of the sun as it moves through the sky. The panel seat rotatably supports the solar panel with two pins, and a support structure supports the panel seat with an elevation tracking pivot. The actuators are controlled with an actuator controller circuit that is controlled by a microcontroller. The microcontroller uses information about latitude, longitude, time of day and date to control the actuators and track the motion of sun without the need for sensors.

Abstract: A wound healing device includes a mat of aligned nanofibers of polyaniline, o-aminobenzenesulfonic acid copolymer, polyvinyl alcohol and chitsosan oligossacaride. Method for fabricating the mat and treating wounds are also disclosed.

Abstract: There is provided a method to monitor a sensing system adapted to monitor an output of an electro-mechanical transmission. This includes monitoring rotational speed of a wheel operatively connected to a driveline operatively connected to the output of the electro-mechanical transmission. A first expected output of the transmission is determined based upon the output of the first sensor. A second expected output of the transmission is determined based upon a rotational speed of a torque-generative device operatively connected to the transmission. The first and second expected outputs and an output of the sensing system adapted to monitor the output of the electro-mechanical transmission are compared.