Abstract: An input knob for use with a touch screen device includes stationary and moveable members. The stationary member adheres to a touch screen of the device. The moveable member moves relative to the stationary member, and is secured to the surface via the stationary member. The moveable member produces touch events on the touch surface as bits of data in response to movement of the moveable member. The moveable member may include a rotary encoder. The stationary member may include conductive pads in contact with the surface and in selective contact with a conductive mass of the moveable member. The moveable member may be ring-shaped, removeable and repositionable with respect to the surface, and/or constructed of or coated by dielectric materials. The knob may lack a direct hardwired electrical connection to or through the surface. A display system includes the touch screen device and knob.

Abstract: An input knob for use with a touch screen device includes stationary and moveable members. The stationary member adheres to a touch screen of the device. The moveable member moves relative to the stationary member, and is secured to the surface via the stationary member. The moveable member produces touch events on the touch surface as bits of data in response to movement of the moveable member. The moveable member may include a rotary encoder. The stationary member may include conductive pads in contact with the surface and in selective contact with a conductive mass of the moveable member. The moveable member may be ring-shaped, removeable and repositionable with respect to the surface, and/or constructed of or coated by dielectric materials. The knob may lack a direct hardwired electrical connection to or through the surface. A display system includes the touch screen device and knob.

Abstract: Embodiments relate to a grid short clearing system is provided for gridded ion beam sources used in industrial applications for materials processing systems that reduces grid damage during operation. In various embodiments, the ion source is coupled to a process chamber and a grid short clearing system includes methods for supplying a gas to the process chamber and setting the gas pressure to a predetermined gas pressure in the range between 50 to 750 Torr, applying an electrical potential difference between each adjacent pair of grids using a current-limited power supply, and detecting whether or not the grid shorts are cleared. The electrical potential difference between the grids is at least 10% lower than the DC electrical breakdown voltage between the grids with no contaminants.

Abstract: Embodiments relate to a grid short clearing system is provided for gridded ion beam sources used in industrial applications for materials processing systems that reduces grid damage during operation. In various embodiments, the ion source is coupled to a process chamber and a grid short clearing system includes methods for supplying a gas to the process chamber and setting the gas pressure to a predetermined gas pressure in the range between 50 to 750 Torr, applying an electrical potential difference between each adjacent pair of grids using a current-limited power supply, and detecting whether or not the grid shorts are cleared. The electrical potential difference between the grids is at least 10% lower than the DC electrical breakdown voltage between the grids with no contaminants.