Patents by Inventor Ricardo Borges

Ricardo Borges has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112348
    Abstract: A backbone machine learning model is applied to a captured image of a number of documents to identify image features of the captured image. A head machine learning model is applied to the image features to identify a number of candidate quadrilaterals within the captured image. An edge detection technique is applied to each candidate quadrilateral to identify edges of a corresponding document of the captured image within the candidate quadrilateral.
    Type: Application
    Filed: February 9, 2021
    Publication date: April 4, 2024
    Inventors: Rafael Borges, Lucas Nedel Kirsten, Luis Fernando Becker Santos, Ricardo Ribani
  • Publication number: 20180056308
    Abstract: An adjustable dual showering unit contains a first showerhead assembly, a second showerhead assembly, and a showerhead arm. The first showerhead assembly and the second showerhead assembly extend from the showerhead arm allowing multiple individuals to shower together. The distance between the first showerhead assembly and the second showerhead assembly is adjustable. The distance from the showerhead arm to a head portion of both the first showerhead assembly and the second showerhead assembly is also adjustable. Moreover, the orientation of the head portion of both the first showerhead assembly and the second showerhead assembly can be adjusted. Moreover, a fluid flow control valve allows the user to control the first showerhead assembly independent of the second showerhead assembly of vice versa. Thus, a unique showering experience is provided.
    Type: Application
    Filed: August 23, 2017
    Publication date: March 1, 2018
    Inventor: Ricardo Borges
  • Publication number: 20070120147
    Abstract: Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
    Type: Application
    Filed: November 13, 2006
    Publication date: May 31, 2007
    Applicant: Nitronex Corporation
    Inventors: Walter Nagy, Ricardo Borges, Jeffrey Brown, Apurva Chaudhari, James Cook, Allen Hanson, Jerry Johnson, Kevin Linthicum, Edwin Piner, Pradeep Rajagopal, John Roberts, Sameer Singhal, Robert Therrien, Andrei Vescan
  • Patent number: 6956250
    Abstract: The invention includes providing gallium nitride materials including thermally conductive regions and methods to form such materials. The gallium nitride materials may be used to form semiconductor devices. The thermally conductive regions may include heat spreading layers and heat sinks. Heat spreading layers distribute beat generated during device operation over relatively large areas to prevent excessive localized heating. Heat sinks typically are formed at either the backside or topside of the device and facilitate heat dissipation to the environment. It may be preferable for devices to include a heat spreading layer which is connected to a heat sink at the backside of the device. A variety of semiconductor devices may utilize features of the invention including devices on silicon substrates and devices which generate large amounts of heat such as power transistors.
    Type: Grant
    Filed: February 23, 2001
    Date of Patent: October 18, 2005
    Assignee: Nitronex Corporation
    Inventors: Ricardo Borges, Kevin J. Linthicum, T. Warren Weeks, Thomas Gehrke
  • Publication number: 20050167775
    Abstract: Gallium nitride material transistors and methods associated with the same are provided. The transistors may be used in power applications by amplifying an input signal to produce an output signal having increased power. The transistors may be designed to transmit the majority of the output signal within a specific transmission channel (defined in terms of frequency), while minimizing transmission in adjacent channels. This ability gives the transistors excellent linearity which results in high signal quality and limits errors in transmitted data. The transistors may be designed to achieve low ACPR values (a measure of excellent linearity), while still operating at high drain efficiencies and/or high output powers. Such properties enable the transistors to be used in RF power applications including third generation (3G) power applications based on W-CDMA modulation.
    Type: Application
    Filed: August 5, 2004
    Publication date: August 4, 2005
    Applicant: Nitronex Corporation
    Inventors: Walter Nagy, Ricardo Borges, Jeffrey Brown, Apurva Chaudhari, James Cook, Allen Hanson, Jerry Johnson, Kevin Linthicum, Edwin Piner, Pradeep Rajagopal, John Roberts, Sameer Singhal, Robert Therrien, Andrei Vescan
  • Publication number: 20050145851
    Abstract: Gallium nitride material structures, including devices, and methods associated with the same are provided. In some embodiments, the structures include one or more isolation regions which electrically isolate adjacent devices. One aspect of the invention is the discovery that the isolation regions also can significantly reduce the leakage current of devices (e.g., transistors) made from the structures, particularly devices that also include a passivating layer formed on a surface of the gallium nitride material. Lower leakage currents can result in increased power densities and operating voltages, amongst other advantages.
    Type: Application
    Filed: June 28, 2004
    Publication date: July 7, 2005
    Applicant: Nitronex Corporation
    Inventors: Jerry Johnson, Ricardo Borges, Jeffrey Brown, James Cook, Allen Hanson, Edwin Piner, Pradeep Rajagopal, John Roberts, Sameer Singhal, Robert Therrien, Andrei Vescan
  • Publication number: 20050127397
    Abstract: The invention includes providing gallium nitride materials including thermally conductive regions and methods to form such materials. The gallium nitride materials may be used to form semiconductor devices. The thermally conductive regions may include heat spreading layers and heat sinks. Heat spreading layers distribute heat generated during device operation over relatively large areas to prevent excessive localized heating. Heat sinks typically are formed at either the backside or topside of the device and facilitate heat dissipation to the environment. It may be preferable for devices to include a heat spreading layer which is connected to a heat sink at the backside of the device. A variety of semiconductor devices may utilize features of the invention including devices on silicon substrates and devices which generate large amounts of heat such as power transistors.
    Type: Application
    Filed: February 3, 2005
    Publication date: June 16, 2005
    Applicant: Nitronex Corporation
    Inventors: Ricardo Borges, Kevin Linthicum, T. Weeks, Thomas Gehrke
  • Publication number: 20020117695
    Abstract: The invention includes providing gallium nitride materials including thermally conductive regions and methods to form such materials. The gallium nitride materials may be used to form semiconductor devices. The thermally conductive regions may include heat spreading layers and heat sinks. Heat spreading layers distribute heat generated during device operation over relatively large areas to prevent excessive localized heating. Heat sinks typically are formed at either the backside or topside of the device and facilitate heat dissipation to the environment. It may be preferable for devices to include a heat spreading layer which is connected to a heat sink at the backside of the device. A variety of semiconductor devices may utilize features of the invention including devices on silicon substrates and devices which generate large amounts of heat such as power transistors.
    Type: Application
    Filed: February 23, 2001
    Publication date: August 29, 2002
    Inventors: Ricardo Borges, Kevin J. Linthicum, T. Warren Weeks, Thomas Gehrke