Patents by Inventor Riccardo Binda

Riccardo Binda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Source-collector modules for EUV lithography employing a GIC mirror and a LPP source
    Patent number: 8895946
    Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: November 25, 2014
    Assignee: Media Lario S.R.L.
    Inventors: Natale M. Ceglio, Daniel Stearns, Jacques Kools, Giuseppe Valsecchi, Fabio Zocchi, Riccardo Binda