Patents by Inventor Richad A. Farrell

Richad A. Farrell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Asymmetric templates for forming non-periodic patterns using directed self-assembly materials
    Patent number: 8956808
    Abstract: A method includes forming a template having a plurality of elements above a process layer, wherein portions of the process layer are exposed between adjacent elements of the template. A directed self-assembly layer is formed over the exposed portions. The directed self-assembly layer has alternating etchable components and etch-resistant components. The etchable components of the directed self-assembly layer are removed. The process layer is patterned using the template and the etch-resistant components of the directed self-assembly layer. Non-periodic elements are defined in the process later by the template and periodic elements are defined in the process layer by the etch-resistant components of the directed self-assembly layer.
    Type: Grant
    Filed: December 4, 2012
    Date of Patent: February 17, 2015
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Gerard M. Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone, Moshe E. Preil
  • CHEMICAL AND PHYSICAL TEMPLATES FOR FORMING PATTERNS USING DIRECTED SELF-ASSEMBLY MATERIALS
    Publication number: 20140224764
    Abstract: A method includes forming a chemical guide layer above a process layer. A template having a plurality of elements is formed above the process layer. The chemical guide layer is disposed on at least portions of the process layer disposed between adjacent elements of the template. A directed self-assembly layer is formed over the chemical guide layer. The directed self-assembly layer has alternating etchable components and etch-resistant components. The etchable components of the directed self-assembly layer are removed. The process layer is patterned using the template and the etch-resistant components of the directed self-assembly layer as an etch mask.
    Type: Application
    Filed: February 11, 2013
    Publication date: August 14, 2014
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Gerard M. Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone, Moshe E. Preil
  • Chemical and physical templates for forming patterns using directed self-assembly materials
    Patent number: 8790522
    Abstract: A method includes forming a chemical guide layer above a process layer. A template having a plurality of elements is formed above the process layer. The chemical guide layer is disposed on at least portions of the process layer disposed between adjacent elements of the template. A directed self-assembly layer is formed over the chemical guide layer. The directed self-assembly layer has alternating etchable components and etch-resistant components. The etchable components of the directed self-assembly layer are removed. The process layer is patterned using the template and the etch-resistant components of the directed self-assembly layer as an etch mask.
    Type: Grant
    Filed: February 11, 2013
    Date of Patent: July 29, 2014
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Gerard M. Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone, Moshe E. Preil
  • ASYMMETRIC TEMPLATES FOR FORMING NON-PERIODIC PATTERNS USING DIRECTES SELF-ASSEMBLY MATERIALS
    Publication number: 20140154630
    Abstract: A method includes forming a template having a plurality of elements above a process layer, wherein portions of the process layer are exposed between adjacent elements of the template. A directed self-assembly layer is formed over the exposed portions. The directed self-assembly layer has alternating etchable components and etch-resistant components. The etchable components of the directed self-assembly layer are removed. The process layer is patterned using the template and the etch-resistant components of the directed self-assembly layer. Non-periodic elements are defined in the process later by the template and periodic elements are defined in the process layer by the etch-resistant components of the directed self-assembly layer.
    Type: Application
    Filed: December 4, 2012
    Publication date: June 5, 2014
    Inventors: Gerard M. Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone, Moshe E. Preil