Abstract: According to embodiments of the invention, a first ring node is arranged to protect against loops in an Ethernet ring by performing Ethernet ring protection (ERP) according to an Ethernet ring protection protocol (ERP) standard. The first ring node is located directly adjacent to at least one second ring node in the Ethernet ring which is not configured to perform ERP according to the same ERP protocol standard. The first ring node is configured to, upon detection of a link failure or recovery event in the Ethernet ring resulting in a flush operation of the filtering database (FDB) in the first ring node in accordance with the ERP protocol standard, send a message to the at least one second ring node which is operable to cause said at least one second ring node to perform a flush operation of its filtering database (FDB). Embodiments of the invention also include an Ethernet ring, a broadband communications network and methods for use in the first ring node and in the Ethernet ring.

Abstract: According to embodiments of the invention, a first ring node is arranged to protect against loops in an Ethernet ring by performing Ethernet ring protection (ERP) according to an Ethernet ring protection protocol (ERP) standard. The first ring node is located directly adjacent to at least one second ring node in the Ethernet ring which is not configured to perform ERP according to the same ERP protocol standard. The first ring node is configured to, upon detection of a link failure or recovery event in the Ethernet ring resulting in a flush operation of the filtering database (FDB) in the first ring node in accordance with the ERP protocol standard, send a message to the at least one second ring node which is operable to cause said at least one second ring node to perform a flush operation of its filtering database (FDB). Embodiments of the invention also include an Ethernet ring, a broadband communications network and methods for use in the first ring node and in the Ethernet ring.

Abstract: Upon detection of a rootkit, a host computer system is rebooted. The boot process is interrupted. Access to a media, e.g., a volume or disk, containing the rootkit is gained and the media is directly accessed. The rootkit is disabled, e.g., renamed or deleted, and the host computer system is rebooted a second time. If the rootkit has not been previously removed, e.g., only renamed, the rootkit is removed, e.g., using a conventional antivirus application. Thus, upon detection of a rootkit, the rootkit is removed without a clean boot.

Abstract: A maskless micro-ion-beam reduction lithography system is a system for projecting patterns onto a resist layer on a wafer with feature size down to below 100 nm. The MMRL system operates without a stencil mask. The patterns are generated by switching beamlets on and off from a two electrode blanking system or pattern generator. The pattern generator controllably extracts the beamlet pattern from an ion source and is followed by a beam reduction and acceleration column.

Abstract: A focused ion beam (FIB) system produces a final beam spot size down to 0.1 .mu.m or less and an ion beam output current on the order of microamps. The FIB system increases ion source brightness by properly configuring the first (plasma) and second (extraction) electrodes. The first electrode is configured to have a high aperture diameter to electrode thickness aspect ratio. Additional accelerator and focusing electrodes are used to produce the final beam. As few as five electrodes can be used, providing a very compact FIB system with a length down to only 20 mm. Multibeamlet arrangements with a single ion source can be produced to increase throughput. The FIB system can be used for nanolithography and doping applications for fabrication of semiconductor devices with minimum feature sizes of 0.1 .mu.m or less.