Abstract: An ultra violet light transmitting polymer is obtainable by the polymerisation of at least one compound having a substantially non UV absorbing core group comprising; linear or branched aliphatic hydrocarbons which may contain an aliphatic ring; or polydialkylsiloxanes. The compounds have at least one functional group comprising formula (A), (B) or (C):and each of the groups —R3— are, independently, linking groups which may be present or absent and, where present, may be a C1 to C10 hydrocarbon chain, which may contain an ether linkage. Methods for producing the polymers and uses for the polymers are also described.

Abstract: The present invention relates generally to flexible polyurethane foam compositions that incorporate partially and/or totally exfoliated, clay based nanocomposite material. The invention also relates to the foams formed from the compositions, the preparation of the foams and uses thereof.

Abstract: A rope including a heat sensitive component which is subject to a visible change in appearance, such as a color change, when exposed to a selected elevated temperature resulting from a strain-related heat release from the rope. The heat sensitive coating may be contained in a coating over a fiber of the rope or a rope strand, or may be incorporated in sheath located over the load-bearing core of the rope.

Abstract: A wavelength-selective arrangement interacts with optical radiation propagating in a transmission medium. The arrangement includes a selector member made of a polar organic material which exhibits piezoelectric properties, the selector member having an interaction surface for interacting with the radiation. The selector member is provided with structure for propagating surface acoustic waves along the interaction surface so as to create a grating and thereby determine its interacting properties in relation to the wavelength of the radiation, in a selectively variable manner.

Abstract: Polymeric materials useful as positive resists comprise a backbone formed from an addition polymer which is degradable by radiation and at least 3 pendant polymeric groups which show no appreciable positive resist characteristics. Preferably these materials comprise a backbone which is a polymethacrylate ester and from 3 to 5 pendant polystyrene groups. These polymers exhibit increased sensitivity and resistance to plasma processing and provide resists which are useful as components of integrated circuits.