Patents by Inventor Richard Alan Sellis

Richard Alan Sellis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7794779
    Abstract: A process is described for manufacturing gas diffusion electrodes, which process comprises: (a) treating an area of a pre-shrunk porous hydrophobic substrate so as to restrict the slurry deposited in step b) to the said area, preferably by forming a well in the area and/or treating the substrate in the area to render it less hydrophobic, e.g. by plasma treating the area; (b) dispensing a slurry of catalyst onto the said area, (c) removing liquid from the dispensed slurry, (d) treating the dried slurry to remove organic materials and e) cutting the catalyst and the underlying portion of substrate from the rest of the substrate.
    Type: Grant
    Filed: April 7, 2004
    Date of Patent: September 14, 2010
    Assignee: Honeywell Analytics Ltd.
    Inventors: Neils Richard Stewart Hansen, Richard Alan Sellis, John Chapples