Abstract: Methods and apparatus for inspecting nuclear waste, for example drums of intermediate level nuclear waste, are disclosed. In particular, a single laser pulse may be directed at a pitcher-catcher laser target structure, with subsequent separate detection of the generated X-rays and neutrons.

Abstract: Methods and apparatus for inspecting nuclear waste, for example drums of intermediate level nuclear waste, are disclosed. In particular, a single laser pulse may be directed at a pitcher-catcher laser target structure, with subsequent separate detection of the generated X-rays and neutrons.

Abstract: A method for forming a regularly repeating pattern in a thin film on a substrate by ablating it directly with radiation form a pulsed laser beam characterised in that the radiation beam is caused to pass through a suitable mask delineating the pattern, the image of the mask pattern being de-magnified onto the surface of the film by a suitable projection lens so that the energy density at the film is sufficiently high so as to cause the film to be removed directly by ablation, the imprinting steps being carried out: in a repetitive series of discrete laser ablation steps using a mask that is stationary with respect to the projection lens and represents only a small area of the total area of the substrate and using a single short pulse of radiation at each step to illuminate the mask, the radiation pulse having such an energy density at the substrate that it is above the threshold value for ablation of the film; and the series of discrete laser ablation steps being repeated over the full area of the surface of

Abstract: A method for forming a regularly repeating pattern on to a substrate comprising the steps of: applying a resist on a surface of a substrate to be processed; imprinting on the applied resist a pattern formed by exposing it to a beam of ultra violet (‘UV’) light, which has been caused to pass through a suitable mask delineating the pattern and then trough a focusing lens on to the resist, so as to cause chemical changes in the resist which makes it more or less soluble in a suitable developer solution; the imprinting step being carried out: in a repetitive series of discrete exposure steps using a mask held stationery with respect to the beam and the lens that represents only a small area of the total area of the substrate and using a single short pulse of UV radiation at each step to illuminate the mask, the radiation pulse having such an energy density at the substrate that it is below the threshold value for ablation of the resist; and the series of discrete exposure steps being repeated over the full area o