Abstract: A method for presenting performance data from a process flow includes providing a tool link associated with a first subset of the performance data for at least one tool in the process flow; providing a recipe link associated with a second subset of the performance data for at least one recipe in the process flow; displaying the first subset of the performance data in response to the tool link being selected; and displaying the second subset of the performance data in response to the recipe link being selected.

Abstract: In a semiconductor process which utilizes a plasma within a process tool chamber, a method of using optical emission spectroscopy (OES) to monitor a particular parameter of the process is disclosed. A first wavelength present in the plasma is determined which varies highly in intensity depending on the particular parameter by observing a statistically significant sample representing variations of the particular parameter. A second wavelength of chemical significance to the process is also determined which is relatively stable in intensity over time irrespective of variations of the particular parameter, also by observing a statistically significant sample representing variations of the particular parameter. These two wavelengths may be determined from test wafers and off-line physical measurements.