Abstract: A substrate alignment and exposure system is disclosed The alignment is performed by capturing an image of the substrate with a pattern recognition system, determining the offset from the alignment and moving the substrate relative to the reticle to be in alignment. A first optical alignment system which captures an image of a position of the substrate off of the primary axis of the exposure optics is used to perform pre-alignment. A second optical alignment system captures an image of the reticle and the substrate through the lens of the exposure optics. The pattern recognition system recognizes the alignment keys on the reticle, alignment targets on the substrate, and computes their positions and displacement from alignment. The relative alignment can be direct or inferred. Any angular and translational misalignment is calculated. The pattern recognition system then moves the substrate to be in alignment with the reticle.

Abstract: In personal identification systems which compare passwords in a verification computer to identify a user, successive passwords are generated, or retrieved from a stored list in the verification computer in response to each entry of a public username into the verification computer. A user device carried by the user retrieves the next successive password from a stored list in response to a command from the user and displays the password. The user then reads this password and offers it to the verification computer via a keyboard entry to be compared with the password already generated or retrieved in response to the username (the expected password).