Patents by Inventor Richard Bosmans

Richard Bosmans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10011522
    Abstract: Method for treating antireflection coatings on an optical substrate (17) involves a stage for carrying out the physical vacuum-deposit of a fluorinated polymer-containing layer having a low refractive index and is characterized in that the stage includes in deposing a silicium or magnesium fluoride/fluorinated polymer hybrid layer (21d) by simultaneous vacuum evaporation of silicium or magnesium fluoride and the fluorinated polymer, In a preferred embodiment, the fluorinated polymer is embodied in the form of a polymer or tetrafluorethylen polymer and the components are evaporated by a Joule effect or by electron bombardment. The method is advantageously used for improving the adherence of a low refractive index layer to a subjacent layer of a pile of antireflection coatings which is deposited on any optical substrate or the inventive substrate. The substrate produced by the method and a device for carrying out the method are also disclosed.
    Type: Grant
    Filed: September 1, 2004
    Date of Patent: July 3, 2018
    Assignee: ESSILOR INTERNATIONAL
    Inventors: Karin Scherer, Pascale Lacan, Richard Bosmans
  • Publication number: 20160024643
    Abstract: A method for depositing, under vacuum, an amorphous layer primarily containing fluorine and carbon onto a substrate (9), characterized in that it comprises a step for depositing this layer with an ion gun (1) for ejecting ions in the form of a beam of accelerated ions that is created from at least one compound containing fluorine and carbon in a gaseous form or saturated vapor supplied to the ion canon. A method of this type makes it possible, in particular, to improve the adherence of an outer layer having a low index of refraction to the underlying layer of an anti-reflective stack. A device suited for carrying out the method is also described.
    Type: Application
    Filed: July 27, 2015
    Publication date: January 28, 2016
    Inventors: Karin SCHERER, Pascale LACAN, Richard BOSMANS
  • Patent number: 7572006
    Abstract: A transparent and polarizing vision element (2) divided into several areas. At least two of said areas are associated with a luminous polarization filter. The light flowing through the element is allocated differently for two the areas according to a direction of polarization of the light. At least one polarization filter is oriented vertically, and at least one polarization filter is oriented horizontally in relation to the usual position of the element.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: August 11, 2009
    Assignee: Essiler International (compagnie Generale D'optique)
    Inventors: Cédric Begon, John Biteau, Claudine Biver, Richard Bosmans, Jean-Paul Cano, Guillaume Giraudet, Richard Muisener
  • Publication number: 20070177099
    Abstract: A transparent and polarizing vision element (2) divided into several areas. At least two of said areas are associated with a luminous polarization filter. The light flowing through the element is allocated differently for two the areas according to a direction of notarization of the light. At least one polarization filter is oriented vertically, and at least one polarization filter is oriented horizontally in relation to the usual position of the element.
    Type: Application
    Filed: March 29, 2005
    Publication date: August 2, 2007
    Inventors: Cedric Begon, John Biteau, Claudine Biver, Richard Bosmans, Jean-Paul Cano, Guillaume Giraudet, Richard Muisener
  • Publication number: 20060275556
    Abstract: A method for depositing, under vacuum, an amorphous layer primarily containing fluorine and carbon onto a substrate (9), characterized in that it comprises a step for depositing this layer with an ion gun (1) for ejecting ions in the form of a beam of accelerated ions that is created from at least one compound containing fluorine and carbon in a gaseous form or saturated vapor supplied to the ion canon. A method of this type makes it possible, in particular, to improve the adherence of an outer layer having a low index of refraction to the underlying layer of an anti-reflective stack. A device suited for carrying out the method is also described.
    Type: Application
    Filed: September 2, 2004
    Publication date: December 7, 2006
    Inventors: Karin Scherer, Pascale Lacan, Richard Bosmans
  • Publication number: 20060257557
    Abstract: Method for treating antireflection coatings on an optical substrate (17) involves a stage for carrying out the physical vacuum-deposit of a fluorinated polymer-containing layer having a low refractive index and is characterised in that the stage includes in deposing a silicium or magnesium fluoride/fluorinated polymer hybrid layer (21d) by simultaneous vacuum evaporation of silicium or magnesium fluoride and the fluorinated polymer, In a preferred embodiment, the fluorinated polymer is embodied in the form of a polymer or tetrafluorethylen polymer and the components are evaporated by a Joule effect or by electron bombardment. The method is advantageously used for improving the adherence of a low refractive index layer to a subjacent layer of a pile of antireflection coatings which is deposited on any optical substrate or the inventive substrate. The substrate produced by the method and a device for carrying out the method are also disclosed.
    Type: Application
    Filed: September 1, 2004
    Publication date: November 16, 2006
    Inventors: Karin Scherer, Pascale Lacan, Richard Bosmans
  • Publication number: 20060023311
    Abstract: The method according to the invention comprises forming on a SiOxFy layer a silica SiO2 and/or metal oxide protective layer obtained through ion beam-assisted vapor phase deposition, comprising bombarding the layer being formed with a beam of positive ions formed from a rare gas, oxygen or a mixture of two or more of such gases, or through cathodic sputtering of a silicon or metal layer followed by an oxidation step of the silicon or the metal layer. Application to the production of antireflection coatings.
    Type: Application
    Filed: August 7, 2003
    Publication date: February 2, 2006
    Applicant: Essilor International Compangnie Generale d'Optique
    Inventors: Karin Scherer, Pascale Lacan, Philippe Roisin, Richard Bosmans
  • Patent number: 6797649
    Abstract: The invention concerns a method comprising evaporating silicon and/or SiOx, wherein said evaporating is further defined as occurring in the presenceof oxygen if silicon or SiOx with x less than two is being evaporated, to form a silicon oxide film at the surface of a substrate and in bombarding said silicon film, while it is being formed, with a beam of positive ions derived from both a polyfluorocarbon compound and a rare gas. The invention is useful for producing low-index antiglare films.
    Type: Grant
    Filed: July 25, 2003
    Date of Patent: September 28, 2004
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Karin Scherer, Pascale Lacan, Richard Bosmans
  • Publication number: 20040092131
    Abstract: The invention concerns a method which consists in evaporating silicon oxide to form a silicon oxide film at the surface of a substrate and in bombarding said silicon film, while it is being formed, with a beam of positive ions derived from both a polyfluorocarbon compound and a rare gas. The invention is useful for producing low-index antiglare films.
    Type: Application
    Filed: July 25, 2003
    Publication date: May 13, 2004
    Inventors: Karin Scherer, Pascale Lacan, Richard Bosmans
  • Patent number: 6596368
    Abstract: An organic substrate having optically-active layers deposited by magnetron sputtering and a preparation process for it are provided. Gas pressure used for carrying out better adhesion by sputtering is high, comprised between 0.8 and 5.0 Pa. Sputtering is particularly suitable for targets of Si, Ti, Zr and organic substrates with or without anti-abrasive coating. Improved adhesion of thin films is obtained.
    Type: Grant
    Filed: January 30, 2001
    Date of Patent: July 22, 2003
    Assignee: Essilor International
    Inventors: Jöm-Steffen Liebig, Klaus Goedicke, Volker Kirchhoff, Gerhard Keller, Richard Bosmans, Pascal Comble
  • Publication number: 20030075814
    Abstract: The invention concerns a method for obtaining an ophthalmic lens comprising a surface utility microstructure, in particular antiglare. The method for obtaining an ophthalmic lens comprising a surface utility microstructure consists in a step for transferring the microstructure into the lens surface from a mould whereof the internal surface bears the microstructure and has a sight correcting geometric design, the microstructure being initially determined by an interferential process. The invention is useful for making ophthalmic lenses.
    Type: Application
    Filed: June 24, 2002
    Publication date: April 24, 2003
    Applicant: Essilor International Compagnie Generale d'Optique
    Inventors: Gerhard Keller, Jean-Francois Dufresne, Gilles Massey, Sidney Shaw White, Walter Charles Braley, Wilson Basilio Morales, Richard Bosmans
  • Patent number: 6491851
    Abstract: The invention concerns a method for obtaining an ophthalmic lens comprising a surface utility microstructure, in in particular antiglare. The method for obtaining an ophthalmic lens comprising a surface utility microstructure consists in a step for transferring the microstructure into the lens surface from a mould whereof the internal surface bears the microstructure and has a sight correcting geometric design, the microstructure being initially determined by an interferential process. The invention is useful for making ophthalmic lenses.
    Type: Grant
    Filed: June 9, 2000
    Date of Patent: December 10, 2002
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Gerhard Keller, Jean-François Dufresne, Gilles Massey, Sidney Shaw White, Jr., Walter Charles Braley, Wilson Basilio Morales, Jr., Richard Bosmans
  • Patent number: 5745240
    Abstract: In situ stress measurement is carried out within a thin film upon its deposition on a substrate. The substrate is supported on a rotatable collective holder having a plurality of sites therefor and the thin film is deposited in the course of rotation of the collective holder. An individual holder is provided for carrying a test sample at one of a plurality of sites on the collective holder. A sensor is adapted to measure deformation of the test sample, thereby to determine the stress within the film deposited along the test sample and hence the stress within the film deposited on the substrate.
    Type: Grant
    Filed: June 3, 1996
    Date of Patent: April 28, 1998
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Fatima Frakso, Richard Bosmans, Luc Nouvelot