Patents by Inventor Richard Bruls
Richard Bruls has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9195148Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.Type: GrantFiled: July 13, 2010Date of Patent: November 24, 2015Assignee: ASML Holding N.V.Inventors: Matthew Lipson, Taras Shvets, Richard Bruls
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Publication number: 20100271605Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.Type: ApplicationFiled: July 13, 2010Publication date: October 28, 2010Applicant: ASML Holding N.V.Inventors: Matthew Lipson, Taras Shvets, Richard Bruls
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Patent number: 7781029Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.Type: GrantFiled: June 23, 2006Date of Patent: August 24, 2010Assignee: ASML Holding N.V.Inventors: Matthew Lipson, Taras Shvets, Richard Bruls
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Publication number: 20080049201Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.Type: ApplicationFiled: May 18, 2007Publication date: February 28, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Marco Stavenga, Hans Jansen, Peter Wanten, Johannes Leonardus Cuijpers, Raymond Beeren, Richard Bruls, Martinus Leenders, Anthonius Petrus De Jong
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Publication number: 20060240365Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.Type: ApplicationFiled: June 23, 2006Publication date: October 26, 2006Applicant: ASML Holding N.V.Inventors: Matthew Lipson, Taras Shvets, Richard Bruls
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Publication number: 20060170899Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: ApplicationFiled: December 23, 2005Publication date: August 3, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Robertus Cornelis De Kruif, Richard Bruls, Johannes Wilhelmus Teeuwsen, Erik Buurman
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Publication number: 20060146310Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: ApplicationFiled: December 23, 2005Publication date: July 6, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Robertus De Kruif, Richard Bruls, Thomas Castenmiller, Johannes De Klerk, Erik Buurman
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Publication number: 20060139606Abstract: In known lithographic apparatus the projection beam is symmetrical, while the process window can be asymmetrical. The invention addresses this problem by providing a lithographic apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein there is further provided a system for providing an asymmetric projection beam bandwidth distribution.Type: ApplicationFiled: December 23, 2004Publication date: June 29, 2006Applicant: ASML Netherlands B.V.Inventors: Robertus De Kruif, Richard Bruls
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Publication number: 20060139607Abstract: Projection beam bandwidth contributes to optical proximity curve/Iso-Dense bias of a system, and can vary from one system to another. This can result in proximity mis-match between systems. The invention addresses this problem by providing a lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; the projection beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein there are provided means for modifying the projection beam bandwidth distribution.Type: ApplicationFiled: December 23, 2004Publication date: June 29, 2006Applicant: ASML Netherlands B.V.Inventors: Richard Bruls, Robertus De Kruif
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Publication number: 20060139610Abstract: Projection beam bandwidth contributes to optical proximity curve/Iso-Dense bias of a system, and can vary from one system to another. This can result in proximity mis-match between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein there is provided a system for modifying the projection beam bandwidth distribution.Type: ApplicationFiled: January 18, 2005Publication date: June 29, 2006Applicant: ASML Netherlands B.V.Inventors: Richard Bruls, Robertus Cornelis De Kruif
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Publication number: 20060132749Abstract: A method is provided for compensating for the effect of flare due to stray radiation in use of a projection system of lithographic apparatus to project a radiation beam patterned by a patterning device to produce a pattern image in an image plane. The method comprising establishing a power spectral density (PSD) indicative of the spatial frequency of the stray radiation produced by the projection system, and determining, from the PSD, a modulation transfer function (MTF) relating the PSD to the pattern applied by the patterning device in such a way that the effect of flare on the pattern image is taken into account. The MTF is then used to determine the effect of flare on a critical dimension (CD) of the pattern image, and a relationship is established between any change in the CD of the pattern image and a change in the CD of the pattern. The patterning device may then be designed in such a way as to at least partially offset the effect of flare on the CD of the pattern image.Type: ApplicationFiled: December 21, 2004Publication date: June 22, 2006Applicant: ASML Netherlands B.V.Inventors: Richard Bruls, Marcel Johannes Demarteau, Bertus Vleeming, Thomas Hoogenboom
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Publication number: 20060109448Abstract: A method is provided to reduce differences between the way in which reticle chucking forces and gravity force act upon the reticle during use and during assembly of the pellicle, and to combine this with a similar reduction concerning pellicle chucking forces and gravity force acting upon the pellicle during bonding to the reticle and during quality control of the pellicle. The shape of the pellicle is measured for control in the same orientation of the pellicle with respect to gravity force as during use of the pellicle, and during bonding the pellicle and the reticle are held in the same way and in the same orientation as during control of the pellicle and use of the reticle in the lithographic apparatus, respectively.Type: ApplicationFiled: November 23, 2004Publication date: May 25, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Richard Bruls, Joseph Laganza, Tammo Uitterdijk, Herman Boom
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Publication number: 20050280789Abstract: The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle.Type: ApplicationFiled: June 17, 2005Publication date: December 22, 2005Applicant: ASML Netherlands B.V.Inventors: Richard Bruls, Orlando Cicilia, Tammo Uitterdijk, Herman Boom
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Publication number: 20050175776Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: November 12, 2004Publication date: August 11, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Bod Streefkerk, Johannes Baselmans, Richard Bruls, Marcel Mathijs Dierichs, Sjoerd Donders, Christiaan Hoogendam, Hans Jansen, Erik Loopstra, Jeroen Johannes Mertens, Johannes Mulkens, Ronald Severijns, Sergei Shulepov, Herman Boom, Timotheus Sengers
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Publication number: 20050140949Abstract: A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.Type: ApplicationFiled: April 30, 2004Publication date: June 30, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Jasper, Marcel Baggen, Richard Bruls, Orlando Cicilia, Hendrikus Alphonsus Van Dijck, Gerardus Carolus Hofmans, Albert Johannes Jansen, Carlo Cornelis Luijten, Willem Pongers, Martijn Dominique Wehrens, Tammo Uitterdijk, Herman Boom, Marcel Johannes Louis Demarteau