Patents by Inventor Richard D. Bauer

Richard D. Bauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7122078
    Abstract: The invention relates to an ink jet ink composition containing monodisperse polymer particles to provide an opaque ink with improved color brilliancy, ink jet ink sets based on this composition, and a methods for ink jet printing with the ink and/or ink jet sets.
    Type: Grant
    Filed: December 2, 2004
    Date of Patent: October 17, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Peter Frese, Richard D. Bauer, Marc Egen, Klaus Taennert, Martin Wulf, Rudolf Zentel
  • Patent number: 6218852
    Abstract: An automated handling apparatus for testing and labeling a printed circuit board. The apparatus comprises a housing having at least one tray exchanger assembly attached thereto. Disposed on the tray exchanger assembly is a cassette tray which accommodates at least one circuit board, and is selectively movable between first and second positions by the tray exchanger assembly. Also attached to the housing is a testing assembly for conducting a desired testing protocol upon the circuit board, a labeler assembly for applying a label to the circuit board subsequent to the completion of the testing protocol, and a loader assembly for selectively transporting the circuit board between the tray exchanger, testing, and labeling assemblies.
    Type: Grant
    Filed: October 29, 1998
    Date of Patent: April 17, 2001
    Inventors: Paul E. Smith, Jon T. Olis, Michael P. Callahan, Richard D. Bauer, Fred R. Behrendt
  • Patent number: 6176908
    Abstract: Aqueous, fluorescent red ink jet inks which meet US Postal Service requirements for metered mail are disclosed and comprise an aqueous vehicle, a red or magenta pigment, a polymeric dispersant, a fluorescent dye and, optionally a hydrotrope additive.
    Type: Grant
    Filed: September 20, 1999
    Date of Patent: January 23, 2001
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Richard D. Bauer, John Morrow Gardner, Loretta Ann Grezzo Page, David Alvin Tyvoll
  • Patent number: 5753042
    Abstract: A support for parts being electrostatically coated or painted as mounted upon an electrically charged rack wherein the support is formed of a flexible material and includes a flexible electrical conductive portion engaging the rack and part permitting the part to be charged, and a flexible non-conductive portion frictionally engaging the part. The support may include a masking cover defined on either of the portions engaging and protecting the part from painting. The support may be formed of thermoset rubber material, thermoplastics, polyvinylchloride material, or the like.
    Type: Grant
    Filed: August 8, 1996
    Date of Patent: May 19, 1998
    Assignee: Hi-Tech Flexible Products, Inc.
    Inventor: Richard D. Bauer
  • Patent number: 5262281
    Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.
    Type: Grant
    Filed: March 10, 1992
    Date of Patent: November 16, 1993
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Gwendyline Y. Y. Chen, Walter R. Hertler, Robert C. Wheland
  • Patent number: 5252427
    Abstract: The present invention provides an aqueous-processable, positive-working photoresist composition having improved photospeed and aqueous development rate without substantially reducing processing latitude in printed circuit chemistries. The compositions contain (a) a polymeric material having a polymer backbone with pendant acid labile groups which are bound directly or indirectly to the polymer backbone, and free acid groups, wherein the polymeric material has an acid number of about 25 and is substantially insoluble in 1% by weight aqueous sodium carbonate solution at 30.degree. C., and (b) a substance that forms an acid upon exposure to actinic radiation. The positive photoresists of this invention may be used to prepare printed circuits wherein the photoresist may be applied to the printed circuit substrate as a liquid coating, as a solid, dry film or from an electrodeposition bath.
    Type: Grant
    Filed: July 21, 1992
    Date of Patent: October 12, 1993
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Gwendyline Y. Y. Chen, William L. Hamilton
  • Patent number: 5145764
    Abstract: This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.
    Type: Grant
    Filed: September 10, 1991
    Date of Patent: September 8, 1992
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Gwendyline Y. Y. Chen, Walter R. Hertler, Robert C. Wheland
  • Patent number: 5120629
    Abstract: High resolution photosensitive electrostatic master which forms conductive exposed image areas upon imagewise exposure comprising an electrically conductive substrate bearing a photosensitive layer consisting essentially of at least one acid labile compound which decomposes to form acid, and a photoinitiator or photoinitiating system which upon exposure generates a catalytic amount of a strong acid. A xeroprinting process from producing positive images in said photosensitive layer of the master is also disclosed. The master is useful in the graphic arts field. e.g., making color proofs, preparation of printing circuit boards, resists, solder masks, etc.
    Type: Grant
    Filed: April 10, 1990
    Date of Patent: June 9, 1992
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Catherine T. Chang
  • Patent number: 5120633
    Abstract: Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of a substance that is an acid generator upon exposure to actinic radiation.
    Type: Grant
    Filed: April 10, 1990
    Date of Patent: June 9, 1992
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Gwendyline Y. Y. Chen, Walter R. Hertler, Robert C. Wheland
  • Patent number: 5077174
    Abstract: This invention relates to positive working resist compositions having utility in dry film photoresists and to fully aqueous methods for developing and stripping them.
    Type: Grant
    Filed: April 10, 1990
    Date of Patent: December 31, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Gwendyline Y. Chen, Walter R. Hertler, Robert C. Wheland
  • Patent number: 4948704
    Abstract: A positively working, tonable, photohardenable mixture, as well as image-forming material prepared therefrom are described, which as essential components, contains a binder or mixture of binders, a photohardenable compound, a photoinitiator or an initiator system and a multivalent metal compound to improve the toning properties of the material.
    Type: Grant
    Filed: September 29, 1989
    Date of Patent: August 14, 1990
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Ursula A. Kraska, Manfred A. J. Sondergeld
  • Patent number: 4892802
    Abstract: A positively working, tonable, photohardenable mixture, as well as image-forming material prepared therefrom are described, which as essential components, contains a binder or mixture of binders, a photohardenable compound, a photoinitiator or an initiator system and a multivalent metal compound to improve the toning properties of the material.
    Type: Grant
    Filed: January 23, 1989
    Date of Patent: January 9, 1990
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard D. Bauer, Ursula A. Kraska, Manfred A. Sondergeld
  • Patent number: 4849322
    Abstract: Photopolymer positive surprint color proofing film based on epoxy acrylate monomer exhibits low dot gain, low time dependence of toning and good tonal range. Binder can be methylmethacrylate/ethyl acrylate/acrylic acid copolymer, preferably cross-linked with zinc ions and plasticized with a second acrylate monomer and a mixture of triacetin and trimethylol propane.
    Type: Grant
    Filed: January 6, 1988
    Date of Patent: July 18, 1989
    Assignee: E. I. Du Pont De Nemours and Company
    Inventors: Richard D. Bauer, John G. Buzzell, Rusty E. Koenigkramer
  • Patent number: 4734356
    Abstract: Photopolymer positive surprint color proofing film based on epoxy acrylate monomer exhibits low dot gain, low time dependence of toning and good tonal range. Binder can be methylmethacrylate/ethyl acrylate/acrylic acid copolymer, preferably crosslinked with zinc ions and plasticized with a second acrylate monomer and a mixture of triacetin and trimethylol propane.
    Type: Grant
    Filed: April 30, 1986
    Date of Patent: March 29, 1988
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard D. Bauer, John G. Buzzell, Rusty E. Koenigkramer
  • Patent number: 4326010
    Abstract: Polyesters such as polycaprolactone have been found to be useful as an additive in photopolymerizable compositions for reducing adhesion to a support film.
    Type: Grant
    Filed: June 15, 1979
    Date of Patent: April 20, 1982
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Richard D. Bauer