Patents by Inventor Richard D. Hreha
Richard D. Hreha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11572351Abstract: A chemical formulation having at least one solvent and a chemical having the structure of Formula (I): where R includes at least one aromatic moiety, and X and X? may both or independently include an aromatic moiety, an aliphatic moiety, or a hydrogen.Type: GrantFiled: May 27, 2021Date of Patent: February 7, 2023Assignee: Systima Technologies, Inc.Inventors: Richard D. Hreha, Tat H. Tong
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Patent number: 11440851Abstract: Methods of producing a carbon matrix composite are provided which include preparing a carbon matrix composite precursor comprising at least one carbon-based reinforcement material and a cured thermoset polymer matrix comprising a chemical composition in accordance with Formula I where n and m are integers, at least one of R1 or R2 comprises an aromatic moiety, and X is selected from the group consisting of CH2, NH, O, S, SO2, and combinations thereof. The methods further include heating the carbon matrix composite precursor in air to a first processing temperature of between 300° C. and 500° C. to form a carbon matrix composite intermediate, and heating the carbon matrix composite intermediate in nitrogen to a second processing temperature of between 900° C. to 1650° C. and holding at the second processing temperature for at least 1 hour in an inert gas environment to form the carbon matrix composite.Type: GrantFiled: February 14, 2019Date of Patent: September 13, 2022Assignee: Systima Technologies, Inc.Inventors: Richard D. Hreha, Kristopher K. Aber, Joel P. Brubaker, Kristin M. Cable, Michael D. Rauscher
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Patent number: 11028194Abstract: Chemical compositions are provided having the structure of Formula (I): where R includes at least one aromatic moiety, and X and X? may both or independently include an aromatic moiety, an aliphatic moiety, or a hydrogen. Additionally, chemical formulations are provided which include the chemical composition having the structure of Formula (I) and at least one solvent.Type: GrantFiled: October 24, 2019Date of Patent: June 8, 2021Assignee: Jalapeno Holdings, LLCInventors: Richard D. Hreha, Tat H. Tong
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Patent number: 10982095Abstract: Chemical compositions are provided having a structure in accordance with with the R group having a structure in accordance with R1 includes an alkyl group, R2 includes an alkylene group, and R3 includes an alkylene group in accordance with (CH2)x with x?2, and R4 includes the structure of Formula (II) or Formula (III). R5 includes a meta-substituted or para-substituted phenyl moiety. Additionally, elastomers produced by cross-linking the chemical composition of Formula (I) are provided.Type: GrantFiled: April 16, 2020Date of Patent: April 20, 2021Assignee: Jalapeno Holdings, LLCInventors: Richard D. Hreha, Joel P. Brubaker, Frank M. Zalar, Michael D. Rauscher
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Patent number: 10662329Abstract: Chemical compositions are provided having a structure in accordance with with the R group having a structure in accordance with R1 includes an alkyl group, R2 includes an alkylene group, and R3 includes an alkylene group in accordance with (CH2), with x?2, and R4 includes the structure of Formula (II) or Formula (III). R5 includes a meta-substituted or para-substituted phenyl moiety. Additionally, elastomers produced by cross-linking the chemical composition of Formula (I) are provided.Type: GrantFiled: June 26, 2018Date of Patent: May 26, 2020Assignee: Jalapeno Holdings, LLCInventors: Richard D. Hreha, Joel P. Brubaker, Frank M. Zalar, Michael D. Rauscher
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Patent number: 10501578Abstract: Chemical compositions are provided having the structure of Formula (I): where R includes at least one aromatic moiety, and X and X? may both or independently include an aromatic moiety, an aliphatic moiety, or a hydrogen. Additionally, chemical formulations are provided which include the chemical composition having the structure of Formula (I) and at least one solvent.Type: GrantFiled: February 23, 2017Date of Patent: December 10, 2019Assignee: Jalapeno Holdings, LLCInventors: Richard D. Hreha, Tat H. Tong
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Patent number: 10370508Abstract: Chemical compositions are provided that include at least one of Formula I or Formula II: where n and m are integers, at least one of R1 or R2 comprises an aromatic moiety, and X is selected from the group consisting of CH2, NH, O, S, SO2, and combinations thereof. Composites formed from the chemical composition and at least one reinforcement material are also provided.Type: GrantFiled: June 28, 2017Date of Patent: August 6, 2019Assignee: Jalapeno Holdings, LLCInventors: Richard D. Hreha, Joel P. Brubaker, Patrick J. Hood
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Patent number: 10344139Abstract: An electrically responsive polymer having a electrically responsive bulk polymer matrix, the electrically responsive polymer bulk polymer matrix comprising a base polymer matrix; an electrically responsive component, wherein the electrically responsive component comprises a disulfide, an oligosulfide moiety, or a plurality of thiol moieties; and an electrolyte salt; wherein the electrically responsive polymer is configured to transition from a first elastic modulus to a second elastic modulus when an external stimulus is applied to the electrically responsive polymer.Type: GrantFiled: August 3, 2016Date of Patent: July 9, 2019Assignee: Cornerstone Research Group, Inc.Inventors: Jason Michael Hermiller, Richard D. Hreha
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Patent number: 9260640Abstract: Embodiments of a reversible thermoset adhesive formed by incorporating thermally-reversible cross-linking units and a method for making the reversible thermoset adhesive are provided. One approach to formulating reversible thermoset adhesives includes incorporating dienes, such as furans, and dienophiles, such as maleimides, into a polymer network as reversible covalent cross-links using Diels Alder cross-link formation between the diene and dienophile. The chemical components may be selected based on their compatibility with adhesive chemistry as well as their ability to undergo controlled, reversible cross-linking chemistry.Type: GrantFiled: August 22, 2013Date of Patent: February 16, 2016Assignee: Cornerstone Research Group, Inc.Inventors: Benjamin C. Mac Murray, Tat H. Tong, Richard D. Hreha
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Patent number: 8535119Abstract: A method of making shape memory chemical mechanical polishing pads is provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also provided is a method for using the shape memory chemical mechanical polishing pads to polish substrates.Type: GrantFiled: June 12, 2012Date of Patent: September 17, 2013Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Ravichandra V Palaparthi, Richard D Hreha, Benjamin John Vining
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Publication number: 20120252324Abstract: A method of making shape memory chemical mechanical polishing pads is provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also provided is a method for using the shape memory chemical mechanical polishing pads to polish substrates.Type: ApplicationFiled: June 12, 2012Publication date: October 4, 2012Applicant: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Richard D. Hreha, Ravichandra V. Palaparthi, Benjamin John Vining
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Patent number: 8221196Abstract: Shape memory chemical mechanical polishing pads are provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also provided are methods of making the shape memory chemical mechanical polishing pads and for using them to polish substrates.Type: GrantFiled: April 15, 2008Date of Patent: July 17, 2012Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.Inventors: Richard D. Hreha, Ravichandra V. Palaparthi, Benjamin John Vining
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Patent number: 8101689Abstract: The shape memory polymers disclosed are a reaction product of at least one reagent containing two active amino-hydrogen or two active phenolic-hydrogen with at least one multifunctional cross linking reagent which contains at least three or more active amino- or phenolic-hydrogen or is a reagent containing at least three glycidyl ether moieties which is then further mixed with at least one diglycidyl ether reagent whereupon the resulting mixture is cured and has a glass transition temperature higher than 00 C. This reaction creates crosslinking between the monomers and polymers such that during polymerization they form a crosslinked thermoset network.Type: GrantFiled: December 15, 2006Date of Patent: January 24, 2012Assignee: Cornerstone Research Group, Inc.Inventors: Tat Hung Tong, Benjamin J. Vining, Richard D. Hreha, Thomas J. Barnell
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Publication number: 20100137554Abstract: This disclosure covers a new methodology to produce high performance, high temperature, thermoset resins having shape memory characteristics based on cyanate ester resins. This methodology is based on pericyclic polycyclotrimerizations by utilizing a heretofore unknown polymerization mechanism based on equilibrium controlled condensation and cyclization. A mono-functional cyanate ester resin is reacted with at least one molecule terminated with a moiety containing an active hydrogen. One example of molecules with a moiety terminated with an active hydrogen are amine terminated dimethylsiloxane. The resulting compound is heated and reacted with a difunctional cyanate ester resin and cured. The Tg of the final Cyanate Ester SMP can be matched to specific requirements by adjusting the ratio of the previous said elements and/or the addition of other agents to adjust the physical properties of the final Cyanate Ester SMP.Type: ApplicationFiled: November 21, 2006Publication date: June 3, 2010Inventors: Richard D. Hreha, Benjamin J. Vining, Robert M. Schueler, David M. Nickerson
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Publication number: 20090258575Abstract: Shape memory chemical mechanical polishing pads are provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also provided are methods of making the shape memory chemical mechanical polishing pads and for using them to polish substrates.Type: ApplicationFiled: April 15, 2008Publication date: October 15, 2009Inventors: Richard D Hreha, Ravichandra V. Palaparthi, Benjamin John Vining
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Publication number: 20080269420Abstract: The shape memory polymers disclosed are a reaction product of at least one reagent containing two active amino-hydrogen or two active phenolic-hydrogen with at least one multifunctional cross linking reagent which contains at least three or more active amino- or phenolic-hydrogen or is a reagent containing at least three glycidyl ether moieties which is then further mixed with at least one diglycidyl ether reagent whereupon the resulting mixture is cured and has a glass transition temperature higher than 00C. This reaction creates crosslinking between the monomers and polymers such that during polymerization they form a crosslinked thermoset network.Type: ApplicationFiled: December 15, 2006Publication date: October 30, 2008Inventors: Tat Hung Tong, Benjamin J. Vining, Richard D. Hreha, Thomas J. Barnell