Patents by Inventor Richard D. Olmsted
Richard D. Olmsted has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10905116Abstract: In some example, the disclosure relates to a fabric assembly comprising a flexible substrate including a top surface; a plurality of plates attached to the top surface of the flexible substrate and arrayed in a pattern such that a plurality of continuous gaps are defined between adjacent plates; and one or more antibacterial agents are contained in or on at least one of the substrate and the plurality of guard plates wherein the antimicrobial agents are selected to reduce the fabric assembly's surface population of at least one of bacteria, virus, mold, fungus, or algae.Type: GrantFiled: April 4, 2017Date of Patent: February 2, 2021Assignee: Higher Dimension Materials, Inc.Inventors: Young-Hwa Kim, Richard D. Olmsted, Nusrallah Jubran
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Publication number: 20200176622Abstract: In some examples, an assembly including at least one vertical support; a plurality of Heliopanels affixed to the at least one vertical support, each Heliopanel of the plurality of Heliopanels including one or more substrates; a plurality of Heliocells affixed to the one or more substrates of the plurality of Heliopanels such that a plurality of continuous gaps is defined between adjacent Heliocells and wherein the gaps permit air, water and sunlight to pass through the Heliopanels, wherein each Heliocells of the plurality of Heliocells includes one or more solar cell units, and wherein the solar cell units are contained in one or more encapsulants to protect the solar cell units from one or more of water and oxygen molecules, atmospheric pollutants, dirt, soot, and strong chemicals or by mechanical abrasion, impact, UV light, or temperature; and electrical conductors interconnecting the Heliocells to each another to form an electrical circuit.Type: ApplicationFiled: June 15, 2018Publication date: June 4, 2020Inventors: Young-Hwa Kim, Richard D. Olmsted
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Publication number: 20190110471Abstract: In some example, the disclosure relates to a fabric assembly comprising a flexible substrate including a top surface; a plurality of plates attached to the top surface of the flexible substrate and arrayed in a pattern such that a plurality of continuous gaps are defined between adjacent plates; and one or more antibacterial agents are contained in or on at least one of the substrate and the plurality of guard plates wherein the antimicrobial agents are selected to reduce the fabric assembly's surface population of at least one of bacteria, virus, mold, fungus, or algae.Type: ApplicationFiled: April 4, 2017Publication date: April 18, 2019Applicant: Higher Dimension Materials, Inc.Inventors: Young-Hwa Kim, Richard D. Olmsted, Nusrallah Jubran
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Publication number: 20180229468Abstract: In some examples, the disclosure relates to a layered fabric assembly comprising a fabric substrate; a plurality of plates affixed to a top surface of the fabric substrate and arrayed in a pattern such that continuous gaps are defined between adjacent plates; and an embossing support layer affixed to a bottom surface of the fabric substrate, wherein the thickness of the embossing support layer varies to define a plurality of raised portions separated by lower portions. The raised and lower portions each contain multiple plates and define a coarse-grained structure that varies on a size scale larger than the size scale of the plurality of plates and gaps of the flexible substrate. In some examples, the fabric assembly combines the superior abrasion, wear, stain, and/or cut resistance afforded the plurality of plates and gaps on the fabric, with a coarse-grained structure that provides such additional attributes.Type: ApplicationFiled: July 29, 2016Publication date: August 16, 2018Inventors: Richard D. Olmsted, Peter Charles Cooper
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Publication number: 20130209735Abstract: In some examples, the disclosure relates to a fabric assembly comprising a flexible substrate including a top surface; a plurality of plates affixed to the top surface of the flexible substrate and arrayed in a pattern such that a plurality of continuous gaps are defined between adjacent plates; and a coating formed on at least one of the substrate and plurality of guard plates, wherein the coating is selected to increase at least one of scuff resistance, oil resistance, water resistance, stain resistance of the fabric assembly.Type: ApplicationFiled: August 18, 2011Publication date: August 15, 2013Applicant: HIGHER DIMENSION MATERIALS, INC.Inventors: Young-Hwa Kim, Nusrallah Jubran, Peter Gottschalk, Daniel P. Stubbs, Richard D. Olmsted
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Publication number: 20090071544Abstract: The invention includes a high pressure fluid processing device for shearing particles in a fluid mixture. The fluid processing device makes use of a first annular flow path that is directed toward a second annular flow path. The two annular flow paths flow toward one another through a bore in a cylinder and meet one another within the cylinder. The pressure fluid processing device includes two rods that are spaced apart from one another across an impingement zone.Type: ApplicationFiled: September 14, 2007Publication date: March 19, 2009Applicant: VEK NANOTECHNOLOGIES, INC.Inventors: MARK SERAFIN, RICHARD D. OLMSTED
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Publication number: 20080185326Abstract: The disclosure is directed to a fluid processing system utilizing an open-end filter assembly to produce a product fluid. The system includes a fluid pump to deliver the raw fluid to a fluid processor and a heat exchanger to control the temperature of the processed fluid. The processed fluid is sent to an open-end filter assembly that allows a first portion of the processed fluid to pass through a filter element. A second portion of the processed fluid does not pass through the filter element and is directed back to the high pressure pump for further processing. In one example, the open-end filter assembly includes an outer cylinder that surrounds a cylindrical filter element to create an outer flow channel and an inner flow channel. Fluid may be introduced to the outer flow channel in a tangential orientation to enhance circular flow around the filter element.Type: ApplicationFiled: February 7, 2007Publication date: August 7, 2008Inventors: Mark Serafin, Stanley R. Ellis, Neal K. Nelson, Richard D. Olmsted
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Publication number: 20080144430Abstract: The disclosure is directed to a high pressure fluid processing device for mixing, reacting, or otherwise combining fluids. The fluid processing device includes opposing, annular flow channels of different annular path areas. A first fluid enters the fluid processing device and flows through the first annular flow channel while the second fluid enters the fluid processing device and flows through the second annular flow channel. The opposing flows of fluids collide with one another within the flow channels, and exit through an outlet. The different annular path areas of the two annular flow channels may allow the two fluids to have different densities, viscosities, or both.Type: ApplicationFiled: December 14, 2006Publication date: June 19, 2008Inventors: Mark Serafin, Neal K. Nelson, Jr., Richard D. Olmsted
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Publication number: 20080105316Abstract: The disclosure is directed to techniques for processing multiple fluid product streams. The techniques employ multiple intensifier pump systems in combination with a fluid processing device to mix, react or otherwise combine multiple fluid product streams. The intensifier pump systems produce fluid product streams with substantially uniform pressure levels for introduction into the fluid processing device. The fluid processing device directs the multiple fluid product streams at one another via opposing flow paths, providing a dispersed phase. The intensifier pump systems include supply pumps that deliver separate fluid products at intermediate pressure levels. Charge intensifier pumps receive the separate fluid products and apply hydraulic intensification to expel the products at high pressure levels. Product intensifier pumps receive the intensified fluid products and expel them at high pressures.Type: ApplicationFiled: October 18, 2006Publication date: May 8, 2008Inventors: Mark Serafin, Neal K. Nelson, Richard D. Olmsted
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Publication number: 20080076332Abstract: The disclosure is directed to a system that processes chemical mechanical planarization (CMP) slurries to reduce or eliminate large particles in the slurries, which can scratch integrated circuit wafers without substantially altering a percentage of solids in the CMP slurry by weight. In particular, the system breaks up particles of a CMP slurry using an intensifier pump system and a fluid processing device. The techniques have proven much more effective than conventional filtering techniques in reducing or eliminating scratches to integrated circuit wafers when a processed CMP slurry is used in a CMP process.Type: ApplicationFiled: September 21, 2006Publication date: March 27, 2008Inventors: Mark Serafin, Neal K. Nelson, Richard D. Olmsted
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Patent number: 6051630Abstract: A process and a high pressure apparatus are disclosed which are useful in preparing magnetic dispersions and other dispersions of hard, non-compliant particulates. The apparatus can be monitored for clogs and wear and allows for relatively quick and inexpensive replacement of orifices. The apparatus includes a high pressure pump and a series of impingement chambers comprising an input manifold where the process stream is split into two or more streams and an output manifold where the streams are recombined after passing through restrictive orifices configured in such a manner that the streams impinge on each other at high velocities. The orifices in each succeeding impingement zone are the same size or smaller than the orifices in the preceding impingement zone, and the orifices in the final impingement zone must be smaller than the orifices in the first impingement zone.Type: GrantFiled: October 12, 1998Date of Patent: April 18, 2000Assignee: 3M Innovative Properties CompanyInventors: Mark Serafin, Richard D. Olmsted, Richard M. Fuller, Bhaskar V. Velamakanni, Zvi Rogovin
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Patent number: 5852076Abstract: A process and a high pressure apparatus are disclosed which are useful in preparing magnetic dispersions and other dispersions of hard, non-compliant particulates. The apparatus can be monitored for clogs and wear and allows for relatively quick and inexpensive replacement of orifices. The apparatus includes a high pressure pump and a series of impingement chambers comprising an input manifold where the process stream is split into two or more streams and an output manifold where the streams are recombined after passing through restrictive orifices configured in such a manner that the streams impinge on each other at high velocities. The orifices in each succeeding impingement zone are the same size or smaller than the orifices in the preceding impingement zone, and the orifices in the final impingement zone must be smaller than the orifices in the first impingement zone.Type: GrantFiled: November 7, 1997Date of Patent: December 22, 1998Assignee: Minnesota Mining and Manufacturing CompanyInventors: Mark Serafin, Richard D. Olmsted, Richard M. Fuller, Bhaskar V. Velamakanni, Zvi Rogovin