Patents by Inventor Richard Du Croo de Jongh

Richard Du Croo de Jongh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Off-axis levelling in lithographic projection apparatus
    Publication number: 20050157281
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Application
    Filed: August 16, 2004
    Publication date: July 21, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jasper, Erik Loopstra, Theodorus Modderman, Gerrit Nijmeijer, Nicholaas Van Asten, Frederik Heuts, Jacobus Gemen, Richard Du Croo De Jongh, Marcus Boonman, Jacob Klinkhamer, Thomas Castenmiller
  • Off-axis levelling in lithographic projection apparatus
    Publication number: 20050088638
    Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
    Type: Application
    Filed: October 29, 2004
    Publication date: April 28, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jasper, Erik Loopstra, Theodorus Modderman, Gerrit Nijmeijer, Nicolaas van Asten, Frederik Heuts, Jacobus Geman, Richard Du Croo de Jongh, Marcus Boonman, Jacob Klinkhamer, Thomas Castenmiller