Patents by Inventor Richard F. McRay
Richard F. McRay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9368326Abstract: A scan head assembled to a scan arm for an ion implanter and a scan arm using the same are provided, wherein the scan head comprises a case, a shaft assembly, an ESC, a first driving mechanism and a second driving mechanism. The case has a normal center line. The shaft assembly passes through a first side of the case and has a twist axis, a first pivot point fixed relative to the case and a first end located outside the case. The ESC is fastened on the first end and capable of holding a work piece. The first driving mechanism is capable of driving the shaft assembly, the ESC and the work piece to tilt relative to the normal center line. The second driving mechanism is capable of driving the shaft assembly, the ESC and the work piece to rotate about the twist axis.Type: GrantFiled: June 17, 2013Date of Patent: June 14, 2016Assignee: ADVANCED ION BEAM TECHNOLOGY, INC.Inventor: Richard F. McRay
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Patent number: 9190312Abstract: A chuck assembly has a wafer chuck attached to a shaft that has a passage defined therewithin. The chuck assembly also has a seal module that has a rotatable assembly and a fixed assembly. The rotatable assembly is disposed around and anchored to the shaft and has a spacer, a rotatable collar, a rotatable diaphragm, and a rotatable seal ring connected to the rotatable collar through the diaphragm with a leak-tight seal. The fixed assembly is disposed around the spacer and has a fixed collar and a fixed seal ring that is sealed to the fixed collar with a leak-tight seal. The fixed collar has a passage defined therewithin that has an opening that connects through the spacer to the passage defined within the shaft. The chuck assembly further includes a housing, to which the fixed assembly is fastened, that may be affixed to a base.Type: GrantFiled: July 27, 2011Date of Patent: November 17, 2015Assignee: ADVANCED ION BEAM TECHNOLOGY, INC.Inventor: Richard F. McRay
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Publication number: 20140367587Abstract: A scan head assembled to a scan arm for an ion implanter and a scan arm using the same are provided, wherein the scan head comprises a case, a shaft assembly, an ESC, a first driving mechanism and a second driving mechanism. The case has a normal center line. The shaft assembly passes through a first side of the case and has a twist axis, a first pivot point fixed relative to the case and a first end located outside the case. The ESC is fastened on the first end and capable of holding a work piece. The first driving mechanism is capable of driving the shaft assembly, the ESC and the work piece to tilt relative to the normal center line. The second driving mechanism is capable of driving the shaft assembly, the ESC and the work piece to rotate about the twist axis.Type: ApplicationFiled: June 17, 2013Publication date: December 18, 2014Inventor: Richard F. McRAY
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Patent number: 8895944Abstract: A scan head assembled to a scan arm for an ion implanter and a scan arm using the same are provided, wherein the scan head is capable of micro tilting a work piece and comprises a case, a shaft assembly, an electrostatic chuck, a first driving mechanism and a micro-tilt mechanism. The shaft assembly passes through a first side of the case and has a twist axis. The electrostatic chuck is fastened on a first end of the shaft assembly outside the case for holding the work piece. The first driving mechanism is disposed within the case and capable of driving the shaft assembly and the ESC to rotate about the twist axis. The micro-tilt mechanism is disposed within the case and capable of driving the shaft assembly and the ESC to tilt relative to the case.Type: GrantFiled: January 18, 2013Date of Patent: November 25, 2014Assignee: Advanced Ion Beam Technology, Inc.Inventor: Richard F. McRay
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Publication number: 20130026722Abstract: A chuck assembly has a wafer chuck attached to a shaft that has a passage defined therewithin. The chuck assembly also has a seal module that has a rotatable assembly and a fixed assembly. The rotatable assembly is disposed around and anchored to the shaft and has a spacer, a rotatable collar, a rotatable diaphragm, and a rotatable seal ring connected to the rotatable collar through the diaphragm with a leak-tight seal. The fixed assembly is disposed around the spacer and has a fixed collar and a fixed seal ring that is sealed to the fixed collar with a leak-tight seal. The fixed collar has a passage defined therewithin that has an opening that connects through the spacer to the passage defined within the shaft. The chuck assembly further includes a housing, to which the fixed assembly is fastened, that may be affixed to a base.Type: ApplicationFiled: July 27, 2011Publication date: January 31, 2013Applicant: ADVANCED ION BEAM TECHNOLOGY, INCInventor: Richard F. MCRAY
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Publication number: 20120317993Abstract: An atmospheric controlled chamber includes a support assembly capable of holding a workpiece over a specific surface of the support assembly, a heat-transfer assembly located close to the support assembly and capable of transferring heat to and from the exterior of the chamber, and at least one thermopile device disposed in the support assembly. The thermopile device(s) is configured to transfer heat between the specific surface (or viewed as the held workpiece) and the heat-transfer assembly. A gas assembly is optionally surrounded by the chamber wall and capable of ensuring the existence and controlling the pressure of an essentially static gas between the held workpiece and the specific surface, wherein the gas is used as a thermal medium for conducting heat. The thermopile device acts as an efficient heat pump, so as to provide extra lower/higher workpiece temperature, a greater cooling/heating rates, and more flexible rate control.Type: ApplicationFiled: June 17, 2011Publication date: December 20, 2012Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.Inventor: RICHARD F. MCRAY
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Publication number: 20120281333Abstract: The invention is directed to a temperature-controllable electrostatic chuck having a heat-transfer body, one or more electrodes and one or more thermopile devices. The heat-transfer body transfers heat between the interior of the electrostatic chuck and the exterior of the electrostatic chuck via a heat-transfer assembly with heat-transfer fluid circulated to and from an external chiller. The one or more thermopile devices are in series between the heat-transfer body and a top surface of the electrostatic chuck, so that heat may be further transferred between a workpiece held on the top surface and the heat-transfer body. Accordingly, because the workpiece temperature may be adjusted by both the external chiller and the thermopile devices, the workpiece temperature may be further lowered when the cold sides of the thermopile device face the workpiece. Otherwise, the workpiece temperature may be further elevated when the hot sides of the thermopile device face the workpiece.Type: ApplicationFiled: May 6, 2011Publication date: November 8, 2012Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.Inventor: RICHARD F. MCRAY
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Patent number: 8198610Abstract: An ion implanter and an ion implant method are disclosed. The ion implanter has an aperture assembly with a variable aperture and is located between an ion source of an ion beam and a holder for holding a wafer. At least one of the size and the shape of the variable aperture is adjustable. The ion beam may be flexibly shaped by the variable aperture, so that the practical implantation on the wafer can be controllably adjusted without modifying an operation of both the ion source and mass analyzer or applying a magnetic field to modify the ion beam. An example of the aperture assembly has two plates, each having an opening formed on its edge such that a variable aperture is formed by a combination of these openings. By respectively moving the plates, the size and the shape of the variable aperture can be changed.Type: GrantFiled: October 20, 2009Date of Patent: June 12, 2012Assignee: Advanced Ion Beam Technology, Inc.Inventor: Richard F. McRay
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Publication number: 20110089334Abstract: An ion implanter and an ion implant method are disclosed. The ion implanter has an aperture assembly with a variable aperture and is located between an ion source of an ion beam and a holder for holding a wafer. At least one of the size and the shape of the variable aperture is adjustable. The ion beam may be flexibly shaped by the variable aperture, so that the practical implantation on the wafer can be controllably adjusted without modifying an operation of both the ion source and mass analyzer or applying a magnetic field to modify the ion beam. An example of the aperture assembly has two plates, each having an opening formed on its edge such that a variable aperture is formed by a combination of these openings. By respectively moving the plates, the size and the shape of the variable aperture can be changed.Type: ApplicationFiled: October 20, 2009Publication date: April 21, 2011Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.Inventor: Richard F. McRay
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Patent number: 7740247Abstract: The present invention is a compound sliding seal unit of markedly reduced size and height dimensions which is employed as a discrete assembly for both the passage across and the at-will height adjustment of a mounted, rotatable shaft which extends from the atmospheric environment portion into the vacuum environmental portion of an ion implanter apparatus. The extended, rotatable shaft is typically fashioned as either a rotatable hollow tube or conduit (suitable for the passage of electrical components) and/or as a rotatable support suitable for the mounting of a pivotal scanning radial arm translation system. The manner of construction and the substantially reduced height dimensions of the compound sliding seal unit permits on-demand changes of height for the mounted, rotatable shaft which extends from the atmospheric environment and extends through the compound unit into the confined and limited spatial volume of a vacuum environment within a conventional ion implantation apparatus.Type: GrantFiled: November 10, 2008Date of Patent: June 22, 2010Assignee: Advanced Ion Beam Technology, Inc.Inventors: Richard F. McRay, Nicholas R. White
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Publication number: 20090066031Abstract: The present invention is a compound sliding seal unit of markedly reduced size and height dimensions which is employed as a discrete assembly for both the passage across and the at-will height adjustment of a mounted, rotatable shaft which extends from the atmospheric environment portion into the vacuum environmental portion of an ion implanter apparatus. The extended, rotatable shaft is typically fashioned as either a rotatable hollow tube or conduit (suitable for the passage of electrical components) and/or as a rotatable support suitable for the mounting of a pivotal scanning radial arm translation system. The manner of construction and the substantially reduced height dimensions of the compound sliding seal unit permits on-demand changes of height for the mounted, rotatable shaft which extends from the atmospheric environment and extends through the compound unit into the confined and limited spatial volume of a vacuum environment within a conventional ion implantation apparatus.Type: ApplicationFiled: November 10, 2008Publication date: March 12, 2009Inventors: Richard F. McRay, Nicholas R. White
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Patent number: 6025602Abstract: An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system.Type: GrantFiled: April 23, 1998Date of Patent: February 15, 2000Assignee: Eaton CorporationInventors: Peter H. Rose, Julian G. Blake, Adam A. Brailove, Zhongmin Yang, Richard F. McRay, Barbara J. Hughey
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Patent number: 5793050Abstract: An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system.Type: GrantFiled: November 26, 1996Date of Patent: August 11, 1998Assignee: Eaton CorporationInventors: Peter H. Rose, Julian G. Blake, Adam A. Brailove, Zhongmin Yang, Richard F. McRay, Barbara J. Hughey
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Patent number: 5221066Abstract: A roof rack for storing a removable roof or body panel when not on the automobile. Two L-shaped legs are mounted in sockets provided in a central column that swings from an inverted position where the legs are stowed alongside the column to deployed positions that support the column in an upright position. A pivoted pad on the column cooperates with abutments at the lower ends of the L-shaped legs to support the roof or other automotive body panel.Type: GrantFiled: December 2, 1991Date of Patent: June 22, 1993Inventors: Paul J. Ferrigan, Richard F. McRay