Patents by Inventor Richard G. Hansen

Richard G. Hansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110092638
    Abstract: Polydiorganosiloxane polyoxamide, linear, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting a diamine with a precursor having at least one polydiorganosiloxane segment and at least two oxalyamino groups. The polydiorganosiloxane polyoxamide block copolymers are of the (AB)n type.
    Type: Application
    Filed: December 28, 2010
    Publication date: April 21, 2011
    Inventors: Charles M. Leir, Karl E. Benson, Richard G. Hansen, Mark D. Purgett, Albert I. Everaerts, Audrey A. Sherman
  • Patent number: 7915370
    Abstract: Branched polydiorganosiloxane polyamide, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting one or more amine compounds including at least one polyamine with a precursor having at least one polydiorganosiloxane segment and at least two ester groups.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: March 29, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Audrey A. Sherman, David B. Olson, Stephen A. Johnson, Craig E. Hamer, David S. Hays, Richard G. Hansen
  • Publication number: 20110071268
    Abstract: A copolymer comprises at least two repeating units of formula I In this formula each R1 is independently an alkyl, haloalkyl, aralkyl, alkenyl, aryl, or aryl substituted with an alkyl, alkoxy, or halo; each Y is independently an alkylene, aralkylene, or a combination thereof; each G is independently a bond or a divalent residue equal to a diamine of formula R3HN-G-NHR3 minus the two —NHR3 groups; each R3 is independently hydrogen or alkyl or R3 taken together with G and to the nitrogen to which they are both attached form a heterocyclic group; each n is independently an integer of 0 to 1500; each p is independently an integer of 1 to 10; and each q is independently an integer of 1 or greater, and wherein at least 50% of the q's are the integer 2.
    Type: Application
    Filed: September 21, 2009
    Publication date: March 24, 2011
    Inventors: David S. HAYS, Richard G. Hansen, Stephen A. Johnson, Benjamin J. Bending
  • Publication number: 20110071270
    Abstract: Silicone polyoxamide and silicone polyoxamide-hydrazide copolymers comprise at least two repeating units of formula I In this formula, each R1 is independently an alkyl, haloalkyl, aralkyl, alkenyl, aryl, or aryl substituted with an alkyl, alkoxy, or halo; each Y is independently an alkylene, aralkylene, or a combination thereof; each G is independently a bond or a divalent residue equal to a diamine of formula R3HN-G-NHR3 minus the two —NHR3 groups; each R3 is independently hydrogen or alkyl or R3 taken together with G and with the nitrogen to which they are both attached form a heterocyclic group; each n is independently an integer of 0 to 1500; each p is independently an integer of 1 to 10, and the average of p is 1.2 or greater; and each q is independently an integer of 1 or greater, and every q is not the same integer.
    Type: Application
    Filed: September 21, 2009
    Publication date: March 24, 2011
    Inventors: David S. HAYS, Richard G. HANSEN, Stephen A. JOHNSON, Benjamin J. BENDING, Kyle J. LINDSTROM
  • Patent number: 7883652
    Abstract: Polydiorganosiloxane polyoxamide, linear, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting a diamine with a precursor having at least one polydiorganosiloxane segment and at least two oxalyamino groups. The polydiorganosiloxane polyoxamide block copolymers are of the (AB)n type.
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: February 8, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Charles M. Leir, Karl E. Benson, Richard G. Hansen, Mark D. Purgett, Albert I. Everaerts, Audrey A. Sherman
  • Publication number: 20110028668
    Abstract: Polyurethane-based polymer compositions that include diacetylene segments are provided.
    Type: Application
    Filed: October 8, 2010
    Publication date: February 3, 2011
    Inventors: Jeffrey J. Cernohous, Steven D. Koecher, Richard G. Hansen, G. Marco Bommarito
  • Patent number: 7820297
    Abstract: A multilayer film includes a first layer of a first polymeric material and a second layer of a second polymeric material. The first material has a first index of refraction and the second material has a second index of refraction less than the first index of refraction. In one embodiment, the second material includes a polydiorganosiloxane polyamide block copolymer. In another embodiment, the second material includes a polydiorganosiloxane polyoxamide block copolymer.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: October 26, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Karl E. Benson, Richard G. Hansen, Stephen A. Johnson, Charles M. Leir, Richard Y. Liu, Mark D. Purgett, Hildegard M. Schneider, Audrey A. Sherman
  • Patent number: 7816472
    Abstract: Polyurethane-based polymer compositions that include diacetylene segments are provided.
    Type: Grant
    Filed: August 19, 2004
    Date of Patent: October 19, 2010
    Assignee: 3m Innovative Properties Company
    Inventors: Jeffrey J. Cernohous, Steven D. Koecher, Richard G. Hansen, G. Marco Bommarito
  • Publication number: 20100221511
    Abstract: A multilayer film includes a first layer of a first polymeric material and a second layer of a second polymeric material. The first material has a first index of refraction and the second material has a second index of refraction less than the first index of refraction. In one embodiment, the second material includes a polydiorganosiloxane polyamide block copolymer. In another embodiment, the second material includes a polydiorganosiloxane polyoxamide block copolymer.
    Type: Application
    Filed: May 13, 2010
    Publication date: September 2, 2010
    Inventors: Karl E. Benson, Richard G. Hansen, Stephen A. Johnson, Charles M. Leir, Richard Y. Liu, Mark D. Purgett, Hildegard M. Schneider, Audrey A. Sherman
  • Publication number: 20100163809
    Abstract: Branched polydiorganosiloxane polyamide, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting one or more amine compounds including at least one polyamine with a precursor having at least one polydiorganosiloxane segment and at least two ester groups.
    Type: Application
    Filed: March 4, 2010
    Publication date: July 1, 2010
    Inventors: Audrey A. Sherman, David B. Olson, Stephen A. Johnson, Craig E. Hamer, David S. Hays, Richard G. Hansen
  • Patent number: 7705101
    Abstract: Branched polydiorganosiloxane polyamide, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting one or more amine compounds including at least one polyamine with a precursor having at least one polydiorganosiloxane segment and at least two ester groups.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: April 27, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Audrey A. Sherman, David B. Olson, Stephen A. Johnson, Craig E. Hamer, David S. Hays, Richard G. Hansen
  • Patent number: 7652163
    Abstract: Cyclic silazanes containing an oxamido ester group and methods of making these compounds are described. The compounds can be used, for example, to make oxamido ester-terminated siloxanes, which can be precursors for the preparation of various polymeric materials such as, for example, polydiorganosiloxane polyoxamides.
    Type: Grant
    Filed: February 10, 2009
    Date of Patent: January 26, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Charles M. Leir, Karl E. Benson, Richard G. Hansen
  • Patent number: 7628312
    Abstract: Aspects of the present invention feature a storage container formed from cardboard material. This particular storage container has a rectangular base unit having a front wall folded upwardly along a folded front edge of the rectangular base, a back wall folded upwardly along a folded back edge of the rectangular base with at least one cover slot and integral cover secure flap extending from within the at least one cover slot. On the top of the storage container, a outer cover panel extension to the front wall is folded in a spaced and parallel relationship to the rectangular base along a folded top edge of the front wall and having at least one cover tuck flap with an integral cover secure slot both cooperating with the at least one cover slot and integral cover secure flap respectively. Under the cardboard outer cover panel is an inner cover panel extension to the back wall folded along a folded top edge of the back wall in a spaced and parallel relationship to the rectangular base.
    Type: Grant
    Filed: December 15, 2005
    Date of Patent: December 8, 2009
    Inventors: Chris Mittelstaedt, Richard G. Hansen, Kevin McKim, Erich Boese, Tony Joyce
  • Publication number: 20090143557
    Abstract: Cyclic silazanes containing an oxamido ester group and methods of making these compounds are described. The compounds can be used, for example, to make oxamido ester-terminated siloxanes, which can be precursors for the preparation of various polymeric materials such as, for example, polydiorganosiloxane polyoxamides.
    Type: Application
    Filed: February 10, 2009
    Publication date: June 4, 2009
    Inventors: Charles M. Leir, Karl E. Benson, Richard G. Hansen
  • Publication number: 20090133832
    Abstract: Polydiorganosiloxane polyoxamide, linear, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting a diamine with a precursor having at least one polydiorganosiloxane segment and at least two oxalyamino groups. The polydiorganosiloxane polyoxamide block copolymers are of the (AB)n type.
    Type: Application
    Filed: January 29, 2009
    Publication date: May 28, 2009
    Inventors: Charles M. Leir, Karl E. Benson, Richard G. Hansen, Mark D. Purgett, Albert I. Everaerts, Audrey A. Sherman
  • Patent number: 7507849
    Abstract: Cyclic silazanes containing an oxamido ester group and methods of making these compounds are described. The compounds can be used, for example, to make oxamido ester-terminated siloxanes, which can be precursors for the preparation of various polymeric materials such as, for example, polydiorganosiloxane polyoxamides.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: March 24, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: Charles M. Leir, Karl E. Benson, Richard G. Hansen
  • Patent number: 7501184
    Abstract: Polydiorganosiloxane polyoxamide, linear, block copolymers and methods of making the copolymers are provided. The method of making the copolymers involves reacting a diamine with a precursor having at least one polydiorganosiloxane segment and at least two oxalyamino groups. The polydiorganosiloxane polyoxamide block copolymers are of the (AB)n type.
    Type: Grant
    Filed: December 23, 2005
    Date of Patent: March 10, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: Charles M. Leir, Karl E. Benson, Richard G. Hansen, Mark D. Purgett, Albert I. Everaerts, Audrey A. Sherman
  • Publication number: 20080318058
    Abstract: Polydiorganosiloxane polyamide, block copolymers having organic soft segments and methods of making the copolymers are provided.
    Type: Application
    Filed: June 22, 2007
    Publication date: December 25, 2008
    Inventors: Audrey A. Sherman, Stephen A. Johnson, Richard G. Hansen
  • Publication number: 20080319154
    Abstract: Cyclic silazanes containing an oxamido ester group and methods of making these compounds are described. The compounds can be used, for example, to make oxamido ester-terminated siloxanes, which can be precursors for the preparation of various polymeric materials such as, for example, polydiorganosiloxane polyoxamides.
    Type: Application
    Filed: June 22, 2007
    Publication date: December 25, 2008
    Inventors: Charles M. Leir, Karl E. Benson, Richard G. Hansen
  • Patent number: D597834
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: August 11, 2009
    Inventors: Chris Mittelstaedt, Richard G. Hansen, Kevin McKim, Erich Boese, Tony Joyce