Patents by Inventor Richard Hertel
Richard Hertel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10062548Abstract: A gas injection system for an ion beam device, the gas injection system including an extraction plate, an extraction aperture formed in the extraction plate for allowing passage of an ion beam, a first gas distributor removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein, a second gas distributor removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein, a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold, and a residue removal gas source connected to the gas manifold.Type: GrantFiled: August 31, 2015Date of Patent: August 28, 2018Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.Inventors: Jay Wallace, Ernest Allen, Richard Hertel, Kevin Daniels, Glen Gilchrist
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Patent number: 10004133Abstract: An apparatus to treat a substrate. The apparatus may include a reactive gas source having a reactive gas outlet disposed in a process chamber, the reactive gas outlet to direct a first reactive gas to the substrate; a plasma chamber coupled to the process chamber and including an extraction plate having an extraction aperture extending along a first direction, disposed within the process chamber and movable along a second direction perpendicular to the first direction between a first position facing the reactive gas source and a second position facing the extraction aperture; and a gas flow restrictor disposed between the reactive gas outlet and the extraction aperture, the gas flow restrictor defining a differential pumping channel between at least the plasma chamber and substrate stage.Type: GrantFiled: July 7, 2017Date of Patent: June 19, 2018Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Shurong Liang, Costel Biloiu, Glen F. R. Gilchrist, Vikram Singh, Christopher Campbell, Richard Hertel, Alexander Kontos, Piero Sferlazzo, Tsung-Liang Chen
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Publication number: 20170311430Abstract: An apparatus to treat a substrate. The apparatus may include a reactive gas source having a reactive gas outlet disposed in a process chamber, the reactive gas outlet to direct a first reactive gas to the substrate; a plasma chamber coupled to the process chamber and including an extraction plate having an extraction aperture extending along a first direction, disposed within the process chamber and movable along a second direction perpendicular to the first direction between a first position facing the reactive gas source and a second position facing the extraction aperture; and a gas flow restrictor disposed between the reactive gas outlet and the extraction aperture, the gas flow restrictor defining a differential pumping channel between at least the plasma chamber and substrate stage.Type: ApplicationFiled: July 7, 2017Publication date: October 26, 2017Inventors: Shurong Liang, Costel Biloiu, Glen F.R. Gilchrist, Vikram Singh, Christopher Campbell, Richard Hertel, Alexander Kontos, Piero Sferlazzo, Tsung-Liang Chen
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Patent number: 9706634Abstract: An apparatus to treat a substrate. The apparatus may include a reactive gas source having a reactive gas outlet disposed in a process chamber, the reactive gas outlet to direct a first reactive gas to the substrate; a plasma chamber coupled to the process chamber and including an extraction plate having an extraction aperture extending along a first direction, disposed within the process chamber and movable along a second direction perpendicular to the first direction between a first position facing the reactive gas source and a second position facing the extraction aperture; and a gas flow restrictor disposed between the reactive gas outlet and the extraction aperture, the gas flow restrictor defining a differential pumping channel between at least the plasma chamber and substrate stage.Type: GrantFiled: December 16, 2015Date of Patent: July 11, 2017Assignee: Varian Semiconductor Equipment Associates, IncInventors: Shurong Liang, Costel Biloiu, Glen F. R. Gilchrist, Vikram Singh, Christopher Campbell, Richard Hertel, Alexander Kontos, Piero Sferlazzo, Tsung-Liang Chen
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Publication number: 20170062185Abstract: A gas injection system for an ion beam device, the gas injection system including an extraction plate, an extraction aperture formed in the extraction plate for allowing passage of an ion beam, a first gas distributor removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein, a second gas distributor removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein, a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold, and a residue removal gas source connected to the gas manifold.Type: ApplicationFiled: August 31, 2015Publication date: March 2, 2017Inventors: Jay Wallace, Ernest Allen, Richard Hertel, Kevin Daniels, Glen Gilchrist
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Publication number: 20170042010Abstract: An apparatus to treat a substrate. The apparatus may include a reactive gas source having a reactive gas outlet disposed in a process chamber, the reactive gas outlet to direct a first reactive gas to the substrate; a plasma chamber coupled to the process chamber and including an extraction plate having an extraction aperture extending along a first direction, disposed within the process chamber and movable along a second direction perpendicular to the first direction between a first position facing the reactive gas source and a second position facing the extraction aperture; and a gas flow restrictor disposed between the reactive gas outlet and the extraction aperture, the gas flow restrictor defining a differential pumping channel between at least the plasma chamber and substrate stage.Type: ApplicationFiled: December 16, 2015Publication date: February 9, 2017Inventors: Shurong Liang, Costel Biloiu, Glen F.R. Gilchrist, Vikram Singh, Christopher Campbell, Richard Hertel, Alexander Kontos, Piero Sferlazzo, Tsung-Liang Chen
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Patent number: 8746666Abstract: A media carrier, adapted to hold a plurality of pieces of magnetic media, is disclosed. This media carrier can be placed on the workpiece support, or platen, allowing the magnetic media to be processed. In some embodiments, the media carrier is designed such that only one side of the magnetic media is exposed, requiring a robot or other equipment to invert each piece of media in the carrier to process the second side. In other embodiments, the media carrier is designed such that both sides of the magnetic media are exposed. In this scenario, the media carrier is inverted on the platen to allow processing of the second side.Type: GrantFiled: May 5, 2011Date of Patent: June 10, 2014Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Richard Hertel, Julian Blake, Edward Macintosh, Alexander Kontos, Frank Sinclair, Christopher Rowland, Mayur Jagtap, Sankar Ganesh Kolappan
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Publication number: 20060258128Abstract: Substrate masking apparatus includes a platen assembly to support a substrate for processing, a mask having an aperture, a retaining mechanism to retain the mask in a masking position, and a positioning mechanism to change the relative positions of the mask and the substrate so that different areas of the substrate are exposed through the aperture in the mask. The apparatus may further include a mask loading mechanism to transfer the mask to and between the masking position and a non-masking position. The processing may include ion implantation of the substrate with different implant parameter values in different areas. In other embodiments, an area of the substrate to be processed is selectable by a mask, a shutter or a beam modifier in front of the substrate.Type: ApplicationFiled: January 11, 2006Publication date: November 16, 2006Inventors: Peter Nunan, Anthony Renau, Alan Sheng, Paul Murphy, Kyu-Ha Shim, Charles Teodorczyk, Steven Anella, Samuel Barsky, Lawrence Ficarra, Richard Hertel
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Publication number: 20060147136Abstract: An air bearing including a unitary, i.e., single piece, housing, which removes the need for an insert, is disclosed. The air bearing may include a shaft opening longitudinally extending through the housing for receiving the shaft; a plurality of passages that longitudinally extend into the housing for communicating a gas; a set of a plurality of nozzle seat openings, each nozzle seat opening extending from the shaft opening and intersecting one of the passages; and a nozzle positioned in each nozzle seat opening at a distance from the shaft opening for injecting the gas into the shaft opening to support the shaft. The air bearing allows for contact of the shaft to the shaft opening in the housing without damage, no leakage, and easier and more cost-effective manufacturability.Type: ApplicationFiled: January 5, 2005Publication date: July 6, 2006Inventors: Richard Hertel, Jeffery Krampert