Patents by Inventor Richard Hogle

Richard Hogle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190070064
    Abstract: A portable, closed-loop system of capture, analysis, and feedback uses a headset containing a small unobtrusive camera and a control computer that communicates wirelessly with a wireless network and/or remote platform. The headset may also contain user controls, an audio feedback component, a battery, interconnection circuitry, cables, and connections for an intraoral device. The camera component of the headset captures images during an activity to be analyzed, such as walking or viewing a room, and sends data (e.g., visual data) to the controller. The controller transmits the data to a database on the remote platform that includes software that instantly analyzes the image information represented in the data, then provides immediate feedback to the headset. The controller may independently process the data.
    Type: Application
    Filed: March 7, 2017
    Publication date: March 7, 2019
    Inventors: Richard Hogle, Robert Beckman
  • Publication number: 20130276820
    Abstract: Methods and apparatus for the cleaning PECVD chambers that utilize molecular fluorine as the cleaning material.
    Type: Application
    Filed: August 10, 2011
    Publication date: October 24, 2013
    Inventors: Jean-Charles Cigal, Ying-Siang Hwang, Paul Alan Stockman, Richard Hogle, Stefan Petri
  • Publication number: 20120295038
    Abstract: A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth.
    Type: Application
    Filed: November 17, 2011
    Publication date: November 22, 2012
    Inventors: Ce Ma, Qing Min Wang, Patrick J. Helly, Richard Hogle
  • Publication number: 20090312817
    Abstract: The present invention relates to systems and methods for management of brain and body functions and sensory perception. For example, the present invention provides systems and methods of sensory substitution and sensory enhancement (augmentation) as well as motor control enhancement. The present invention also provides systems and methods of treating diseases and conditions, as well as providing enhanced physical and mental health and performance through sensory substitution, sensory enhancement, and related effects.
    Type: Application
    Filed: October 26, 2007
    Publication date: December 17, 2009
    Applicant: Wicab, Inc.
    Inventors: Richard Hogle, Scott Lederer, Mitchell Eugene Tyler
  • Publication number: 20090306741
    Abstract: The present invention relates to systems and methods for management of brain and body functions and sensory perception. For example, the present invention provides systems and methods of sensory substitution and sensory enhancement (augmentation) as well as motor control enhancement. The present invention also provides systems and methods of treating diseases and conditions, as well as providing enhanced physical and mental health and performance through sensory substitution, sensory enhancement, and related effects.
    Type: Application
    Filed: October 26, 2007
    Publication date: December 10, 2009
    Applicant: Wicab, Inc.
    Inventors: Richard Hogle, Scott Lederer
  • Patent number: 7514119
    Abstract: A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth.
    Type: Grant
    Filed: April 10, 2006
    Date of Patent: April 7, 2009
    Assignee: Linde, Inc.
    Inventors: Ce Ma, Qing Min Wang, Patrick J. Helly, Richard Hogle
  • Publication number: 20080281550
    Abstract: The present invention relates to systems and methods for characterizing balance function. In particular, the present invention provides systems and methods for monitoring balance function (e.g., in a single individual and/or plurality of individuals), generating one or more databases comprising balance function data, processing and/or analyzing databases comprising balance function data, and characterizing balance function (e.g., in a single individual and/or plurality of individuals (e.g., utilizing databases comprising balance function data)). Systems and methods of the present invention find use in, among other things, research, diagnostic and therapeutic applications.
    Type: Application
    Filed: May 12, 2008
    Publication date: November 13, 2008
    Applicant: WICAB, INC.
    Inventors: Richard Hogle, Robert Beckman
  • Publication number: 20070248516
    Abstract: A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.
    Type: Application
    Filed: April 21, 2006
    Publication date: October 25, 2007
    Inventors: Christopher Bailey, Michael Galtry, David Engerran, Andrew Seeley, Geoffrey Young, Michael Wilders, Kenneth Aitchison, Richard Hogle
  • Publication number: 20070079849
    Abstract: Methods and apparatus for cleaning a process chamber using a fluorine gas, wherein the fluorine gas is at least partially recycled for further use in the cleaning cycle. The method includes generation of the fluorine, separation of fluorine from the waste gas of the process chamber and abatement of the waste. The apparatus includes a vacuum pump for moving the waste gas and fluorine gas to and from the process chamber and can further include a sensing unit to determine the cleaning cycle endpoint.
    Type: Application
    Filed: October 12, 2005
    Publication date: April 12, 2007
    Inventors: Richard Hogle, Graham McFarlane
  • Publication number: 20070074743
    Abstract: The present invention relates to methods and apparatus used in the cleaning of chambers, such as semiconductor processing chambers. In particular, fluorine from a fluorine generator is used in the cleaning cycle and by-product hydrogen from the fluorine generation is used to condition the chamber and remove residual fluorine following the cleaning cycle.
    Type: Application
    Filed: October 4, 2005
    Publication date: April 5, 2007
    Inventors: Graham McFarlane, Richard Hogle
  • Publication number: 20060276049
    Abstract: The present invention provides a system, apparatus and method for improving the efficiency of a semiconductor processing system, such as a deposition system by decreasing or substantially eliminating the accumulation of by-products in the apparatus components of the semiconductor processing system. The present invention further relates to improving the efficiency of a foreline trap associated with a semiconductor processing system, wherein the trap removes substantially all of the by-products from the exhaust gas from the processing chamber. In addition, the present invention provides a system, apparatus and method for efficiently clearing traps of accumulated by-products from exhaust gas of a semiconductor processing system.
    Type: Application
    Filed: June 6, 2005
    Publication date: December 7, 2006
    Inventors: Christopher Bailey, Richard Hogle, Andrew Seeley
  • Publication number: 20060269667
    Abstract: A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth.
    Type: Application
    Filed: April 10, 2006
    Publication date: November 30, 2006
    Inventors: Ce Ma, Qing Wang, Patrick Helly, Richard Hogle
  • Publication number: 20060042462
    Abstract: A method and apparatus is disclosed for producing fluorine by providing a contained fluorine precursor source located proximate to or remotely from an adsorbent bed, optionally in a replaceable unit that may be a replaceable module comprising both the fluorine source and the adsorbent bed. Fluorine derived preferably from a nitrogen trifluoride source and used to remove deposited silicon-containing impurities in reaction chambers is reclaimed from an adsorbent bed, and made available to the reaction chamber as a supplemental fluorine source to reduce the total required amount of nitrogen trifluoride source gas. The separation column adsorbent is regenerated in cyclical intervals using a reverse flow of inert gas.
    Type: Application
    Filed: October 14, 2005
    Publication date: March 2, 2006
    Inventors: Edward Ezell, Richard Hogle, Walter Whitlock, Graham McFarlane
  • Publication number: 20060016459
    Abstract: The present invention provides for the use of F2 in the process of deposition chamber cleaning which is especially effective if operated under high pressure conditions. In addition, the present invention provides for the use of F2 under high pressure to perform substrate etching or wafer thinning procedures at a high etch rate.
    Type: Application
    Filed: May 5, 2005
    Publication date: January 26, 2006
    Inventors: Graham McFarlane, Richard Hogle
  • Publication number: 20050250347
    Abstract: A method and apparatus for introducing a fluorine-containing flow stream to a deposition process to maintain process by-product volatility and reduce or eliminate by-product formation and/or interference.
    Type: Application
    Filed: December 21, 2004
    Publication date: November 10, 2005
    Inventors: Christopher Bailey, Richard Hogle, Simon Purdon, Revati Pradhan-Kasmalkar, Aaron Sullivan, Qing Wang, Ce Ma
  • Publication number: 20050220331
    Abstract: A system for detection and control of deposition on pendant tubes in recovery and power boilers includes one or more deposit monitoring sensors operating in infrared regions of about 4 or 8.7 microns and directly producing images of the interior of the boiler, or producing feeding signals to a data processing system for information to enable a distributed control system by which the boilers are operated to operate said boilers more efficiently. The data processing system includes an image pre-processing circuit in which a 2-D image formed by the video data input is captured, and includes a low pass filter for performing noise filtering of said video input. It also includes an image compensation system for array compensation to correct for pixel variation and dead cells, etc., and for correcting geometric distortion. An image segmentation module receives a cleaned image from the image pre-processing circuit for separating the image of the recovery boiler interior into background, pendant tubes, and deposition.
    Type: Application
    Filed: May 24, 2005
    Publication date: October 6, 2005
    Applicant: Combustion Specialists, Inc.
    Inventors: George Kychakoff, Martin Afromowitz, Richard Hogle
  • Publication number: 20050191225
    Abstract: Apparatus and methods useful for disposal of hydrogen generated from a fluorine generation cell are described. In one embodiment the apparatus comprises an aerosol reduction unit and a catalytic combustion unit. The catalyst in the catalytic combustion unit is maintained at a temperature such that a pilot light or electrical spark apparatus may be eliminated. Fluorine generation apparatus and methods including an aerosol reduction unit and catalytic unit are also described.
    Type: Application
    Filed: January 16, 2004
    Publication date: September 1, 2005
    Inventors: Richard Hogle, Donald Satchell, Robin Clough, Robert Dawson, David Gawlowski
  • Patent number: 5485736
    Abstract: A method of forming a seamless cylinder shell in which a layer of nickel is electroplated on a steel sheet so that a composite sheet is formed. The composite sheet is then preferably cut into a circular blank before further processing. The circular blank is subjected to an oxalic acid pretreatment for the nickel side and a zinc phosphate pretreatment for the steel side to retain a lubricant on the two opposed surfaces thereof and is thereafter lubricated with the lubricant. The circular blank is preferably cupped, relubricated, and drawn into the seamless cylinder shell. The seamless cylinder shell can be finished into a seamless gas cylinder by spinning one end of the cylinder into a cylinder head, internally threading the formed cylinder head, and then heat treating the cylinder.
    Type: Grant
    Filed: March 22, 1994
    Date of Patent: January 23, 1996
    Assignee: The BOC Group, Inc.
    Inventors: John P. Collier, Richard Hogle, James G. Marsh, Prakash Thomas