Patents by Inventor Richard Hopla
Richard Hopla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20090004444Abstract: A positive-working photosensitive composition containing one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate.Type: ApplicationFiled: August 21, 2008Publication date: January 1, 2009Applicant: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Ahmad A. Naiini, Richard Hopla, David B. Powell, Jon Metivier, Il'ya Rushkin
-
Publication number: 20080305431Abstract: A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2??VI in which each of Y, V1, and V2 is defined in the specification; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; in which the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.Type: ApplicationFiled: June 10, 2008Publication date: December 11, 2008Inventors: David B. Powell, Ahmad A. Naiini, N. Jon Metivier, II'ya Rushkin, Richard Hopla
-
Patent number: 7416830Abstract: A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.Type: GrantFiled: February 18, 2005Date of Patent: August 26, 2008Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Ahmad A. Naiini, Richard Hopla, David B. Powell, Jon Metivier, Il'ya Rushkin
-
Patent number: 7399572Abstract: A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and each R1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is independently H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; and wherein V1 and V2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can=0 only when Y? n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.Type: GrantFiled: June 2, 2006Date of Patent: July 15, 2008Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: David B. Powell, Ahmad A. Naiini, N. Jon Metivier, Il'ya Rushkin, Richard Hopla
-
Patent number: 7220520Abstract: A photosensitive resin composition comprising: (d) at least one polybenzoxazole precursor polymer (e) at least one compound having structure VI V1—Y—V2 VI wherein Y is selected from S, O, NR2, (HOCH)p, and each R1 is selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is selected from H, SH, CH3, C2H5, and a linear or branched C1–C4 alkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein V1 and V2 are independently selected from the group consisting of wherein, m is independently an integer from 0 to 4 with the proviso that m=0 only when Y= n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the substrate is subsequently processed to form an image, and with the proviso that if the polybenzoxazole precursorType: GrantFiled: June 2, 2006Date of Patent: May 22, 2007Assignee: Fujifilm Electronic Materials U.S.A., Inc.Inventors: Ahmad A. Naiini, David B. Powell, N. Jon Metivier, Il'ya Rushkin, Richard Hopla
-
Patent number: 7195849Abstract: A positive photosensitive resin composition comprising: (a) at least one polybenzoxazole precursor polymer having structure I or II; (b) at least one photosensitive compound selected from compounds described by structures III–V, (c) at least one solvent; and (d) optionally an adhesion promoter.Type: GrantFiled: March 4, 2004Date of Patent: March 27, 2007Assignee: Arch Specialty Chemicals, Inc.Inventors: Ahmad A. Naiini, Pamela J. Waterson, William D. Weber, Ilya Rushkin, Richard Hopla, Jon Metivier
-
Publication number: 20060286484Abstract: A pretreatment composition of: (a) at least one compound having structure VI V1—Y—V2??VI wherein Y is selected from the group consisting of S, O, NR2, (HOCH)p, and each R1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is independently H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; and wherein V1 and V2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can =0 only when Y? n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.Type: ApplicationFiled: June 2, 2006Publication date: December 21, 2006Inventors: David Powell, Ahmad Naiini, N. Metivier, Il'ya Rushkin, Richard Hopla
-
Publication number: 20060275699Abstract: A photosensitive resin composition comprising: (d) at least one polybenzoxazole precursor polymer (e) at least one compound having structure VI V1—Y—V2 ??VI wherein Y is selected from S, O, NR2, (HOCH)p, and each R1 is selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R2 is selected from H, SH, CH3, C2H5, and a linear or branched C1-C4 alkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein V1 and V2 are independently selected from the group consisting of wherein, m is independently an integer from 0 to 4 with the proviso that m=0 only when Y= n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the substrate is subsequently processed to form an image, and with the proviso that if the polybenzoxazole precursor polymer solType: ApplicationFiled: June 2, 2006Publication date: December 7, 2006Inventors: Ahmad Naiini, David Powell, N. Metivier, Il'ya Rushkin, Richard Hopla
-
Patent number: 7132205Abstract: An end-capped polybenzoxazole precursor having acid labile functional groups, positive working photosensitive compositions thereof and use of the compositions for producing heat resistant relief images on substrates.Type: GrantFiled: June 3, 2004Date of Patent: November 7, 2006Assignee: Arch Specialty Chemicals, Inc.Inventors: Ilya Rushkin, Ahmad A. Naiini, Richard Hopla, Pamela J. Waterson, William D. Weber
-
Patent number: 7129011Abstract: A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): ?wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is about less then 1000; Ar1 is a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar2 is a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, or a divalent aliphatic group that may contain silicon; Ar3 is a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof; Ar4 is Ar1 (OH)2 or Ar2; G is a monovalent organic group a carbonyl, carbonyloxy or sulfonyl group; (b) one or more photo-active compounds which release acid upon irradiation (PAGs); (c) one or more latent crosslinkers each of which contains at least two ˜N—(CH2OR)n units (n=1 or 2, wherein R is a linear or branched C1–C8 alkyl group); (d) at least one solvent, and (e) at least one dissolution rate modifier, withType: GrantFiled: June 3, 2004Date of Patent: October 31, 2006Assignee: Arch Specialty Chemicals, Inc.Inventors: Ilya Rushkin, Ahmad A. Naiini, Richard Hopla, Pamela J. Waterson, William D. Weber, David B. Powell
-
Patent number: 7101652Abstract: New photosensitive PBO precursor polymers which contain diazoquinone moieties attached to its backbone and in which all amino end groups are converted into amide groups. The photosensitive formulation based on the disclosed PBO precursor polymers have good imaging and mechanical properties as well as superior shelf life stability. Photosensitive polybenzoxazole precursor polymers having (sulfon)amide end groups (with or without attached diazoquinone groups) can be formulated into photosensitive compositions with diazoquinone photoactive compounds which lack benzylic hydrogens on the backbone to yield compositions producing films significantly lighter in color after curing.Type: GrantFiled: March 9, 2004Date of Patent: September 5, 2006Assignee: Arch Specialty Chemicals, Inc.Inventors: Ahmad A. Naiini, Ilya Rushkin, Richard Hopla, Donald Racicot
-
Patent number: 7018776Abstract: Stable non-photosensitive polyimide precursor compositions with an adhesion promoter in a non-NMP solvent for use in forming high temperature resistant relief images and a process for making said images.Type: GrantFiled: December 10, 2003Date of Patent: March 28, 2006Assignee: Arch Specialty Chemicals, Inc.Inventors: Ilya Rushkin, Ahmad A. Naiini, William D. Weber, Don Perry, Richard Hopla
-
Publication number: 20060063095Abstract: A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.Type: ApplicationFiled: February 18, 2005Publication date: March 23, 2006Inventors: Ahmad Naiini, Richard Hopla, David Powell, Jon Metivier, Il'ya Rushkin
-
Publication number: 20050181297Abstract: A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.Type: ApplicationFiled: February 18, 2005Publication date: August 18, 2005Inventors: Ahmad Naiini, Richard Hopla, David Powell, Jon Metivier, Il'ya Rushkin
-
Patent number: 6929891Abstract: A heat resistant negative working photosensitive composition that comprises (a) one or more polybenzoxazole precursor polymers (I): wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 and (x+y) is about less then 1000; Ar1 is selected from the group consisting of a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar2 is selected from the group consisting a divalent aromatic, a divalent heterocyclic, a divalent alicyclic, a divalent aliphatic group that may contain silicon, or mixtures thereof; Ar3 is selected from the group consisting a divalent aromatic group, a divalent aliphatic group, a divalent heterocyclic group, or mixtures thereof; Ar4 is selected from the group consisting Ar1 (OH)2 or Ar2; G is an organic group selected from the group consisting groups having a carbonyl, carbonyloxy or sulfonyl group attached directly to the terminal NH group of the polymer; (b) one or more photo-active compounds which release acid upon irrType: GrantFiled: March 8, 2004Date of Patent: August 16, 2005Assignee: Arch Specialty Chemicals, Inc.Inventors: Ilya Rushkin, Ahmad A. Naiini, Richard Hopla, Pamela J. Waterson, William D. Weber
-
Publication number: 20040253542Abstract: An end-capped polybenzoxazole precursor having acid labile functional groups, positive working photosensitive compositions thereof and use of the compositions for producing heat resistant relief images on substrates.Type: ApplicationFiled: June 3, 2004Publication date: December 16, 2004Applicant: Arch Specialty Chemicals, Inc.Inventors: Ilya Rushkin, Ahmad A. Naiini, Richard Hopla, Pamela J. Waterson, William D. Weber
-
Publication number: 20040253537Abstract: A heat resistant negative working photosensitive composition that comprisesType: ApplicationFiled: June 3, 2004Publication date: December 16, 2004Applicant: Arch Specialty Chemicals, Inc.Inventors: IIya Rushkin, Ahmad A. Naiini, Richard Hopla, Pamela J. Waterson, William D. Weber, David B. Powell
-
Publication number: 20040249110Abstract: New photosensitive PBO precursor polymers which contain diazoquinone moieties attached to its backbone and in which all amino end groups are converted into amide groups. The photosensitive formulation based on the disclosed PBO precursor polymers have good imaging and mechanical properties as well as superior shelf life stability.Type: ApplicationFiled: March 9, 2004Publication date: December 9, 2004Applicant: ARCR SPECIALTY CHEMICALS, INC.Inventors: Ahmad A. Naiini, Ilya Rushkin, Richard Hopla, Donald Racicot
-
Publication number: 20040229166Abstract: A heat resistant negative working photosensitive composition that comprisesType: ApplicationFiled: March 8, 2004Publication date: November 18, 2004Applicant: ARCH SPECIALTY CHEMICALS, INC.Inventors: Ilya Rushkin, Ahmad A. Naiini, Richard Hopla, Pamela J. Waterson, William D. Weber
-
Publication number: 20040229160Abstract: A positive photosensitive resin composition comprising:Type: ApplicationFiled: March 4, 2004Publication date: November 18, 2004Applicant: ARCH SPECIALTY CHEMICALS, INC.Inventors: Ahmad A. Naiini, Pamela J. Waterson, William D. Weber, Ilya Rushkin, Richard Hopla, Jon Metivier