Abstract: A shielded modular connector system includes a first portion having a first housing and a plurality of first contact modules, the first housing including a first interface surface and a first interface perimeter surrounding the first interface surface, a first plurality of bays to receive the plurality of first contact modules, and a grounding ring. The system further includes a second portion configured to mate with the first portion, and having a second housing and a plurality of second contact modules. The second housing includes a second interface surface and a second interface perimeter surrounding the second interface surface and designed to face the first interface surface, a second plurality of bays configured to receive the plurality of second contact modules, and a backshell located along at least a portion of the second interface perimeter and extending away from the second interface surface.

Abstract: A CVD reactor comprising a gas inlet element which has a cooling device and gas outlet openings which lead into a process chamber. The process chamber has a feeder zone directly adjoining the gas inlet element and a process zone with one or more substrate holders. The process zone follows the feeder zone in a flow direction of a process gas entering the process chamber from the gas outlet openings. The feeder zone has a first floor portion directly adjoining the gas inlet element and a second floor portion located between the first floor portion and the process zone. In order to prevent the formation of parasitic coatings during deposition of, for example, silicon carbide at the start of the feeder zone, the first floor portion rises in the flow direction, so that the height of the process chamber initially decreases starting from the gas inlet element.

Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.

Abstract: An endoscope includes a dichroic prism assembly configured to receive light from an object image through an entrance face. The assembly includes a first prism and a further dichroic prism assembly for splitting light in three light components, the first prism having a cross section with corners designed so that an incoming beam is partially reflected twice inside and exits the first prism through an exit face towards a first sensor. The dichroic prism assembly includes a compensator prism between the first prism and the further dichroic prism assembly. A first path length travelled by the part of the incoming beam reflected twice inside the first prism towards the first sensor is the same as path lengths travelled by a part of the incoming beam entering the further dichroic prism assembly towards each of three sensors, accounting for adjustment for focal plane focus position difference in wavelengths at the sensors.

Abstract: The invention relates to powder coating compositions suitable for low temperature powder coating crosslinking typically at curing temperature is between 75 and 140° C. which can be used for powder coating temperature-sensitive substrates like MDF, wood, plastic or temperature sensitive metal alloys.

Abstract: The invention relates to a method for detecting visible and infrared light using a medical imaging system, said medical imaging system comprising a camera module configured to receive a visible light signal and at least one infrared light signal from an object image. The medical imaging system for detecting visible and comprises an input for visible light for illuminating a tissue; an input for excitation light for exciting a fluorescence agent in the tissue; a camera module configured to receive a visible light signal and at least one infrared light signal from an object image in the tissue. The camera module comprises at least a first, second, and third optical path for directing light from the object image to a first, second, and third filter and sensor combination respectively. In any order, the first, second, and third filters are a green filter, an infrared filter, and a red/blue patterned filter comprising red and blue filters in alternating pattern.

Abstract: A compound of formula (I), or a pharmaceutically acceptable salt thereof.

Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.

Abstract: A method for determining a target feature in a model of a patterning process based on local electric fields estimated for the patterning process. The method includes obtaining a mask stack region of interest. The mask stack region of interest has one or more characteristics associated with propagation of electromagnetic waves through the mask stack region of interest. The mask stack region of interest includes the target feature. The method includes estimating a local electric field based on the one or more characteristics associated with the propagation of electromagnetic waves through the mask stack region of interest. The local electric field is estimated for a portion of the mask stack region of interest in proximity to the target feature. The method includes determining the target feature based on the estimated local electric field.

Abstract: A jumper assembly for connecting together first and second circuit boards. The jumper assembly includes a frame secured to a flexible circuit having a plurality of conductive traces. The frame includes a bridge that connects together first and second side structures, each having a window and a moveable lever. The first side structure is secured over the first circuit board and the second side structure is secured over the second circuit board. First end portions of the traces of the flexible circuit are secured to contact pads of the first circuit board, while second end portions of the traces of the flexible circuit are secured to contact pads of the second circuit board. The bridge of the frame is removed after the jumper assembly is secured to the first and second circuit boards.

Abstract: A method for determining a target feature in a model of a patterning process based on local electric fields estimated for the patterning process is described. The method includes obtaining a mask stack region of interest. The mask stack region of interest has one or more characteristics associated with propagation of electromagnetic waves through the mask stack region of interest. The mask stack region of interest includes the target feature. The method includes estimating a local electric field based on the one or more characteristics associated with the propagation of electromagnetic waves through the mask stack region of interest. The local electric field is estimated for a portion of the mask stack region of interest in proximity to the target feature. The method includes determining the target feature based on the estimated local electric field.

Abstract: The invention provides methods for treating infections, disorders or diseases caused by a human papillomavirus other than HPV-16 by determining the HPV type of the patient, providing a synthetic-long-peptide based therapeutic vaccine for treatment of said patient and administering said therapeutic vaccine to said patient. The invention further provides novel immunogenic compositions and therapeutic vaccines against human papillomaviruses other than HPV-16 and uses thereof.

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

Abstract: A method includes exposing number of fields on a substrate, obtaining data about a field and correcting exposure of the field in subsequent exposures. The method includes defining one or more sub-fields of the field based on the obtained data. Data relating to each sub-field is processed to produce sub-field correction information. A subsequent exposure of the one or more sub-fields is corrected using the sub-field correction information. By controlling a lithographic apparatus by reference to data of a particular sub-field within a field, overlay error can be reduced or minimized for a critical feature, rather than being averaged over the whole field. By controlling a lithographic apparatus with reference to a sub-field rather than only the whole field, a residual error can be reduced in each sub-field.

Abstract: The invention relates to a method for detecting visible and infrared light using a medical imaging system, said medical imaging system comprising a camera module configured to receive a visible light signal and at least one infrared light signal from an object image. The medical imaging system for detecting visible and comprises an input for visible light for illuminating a tissue; an input for excitation light for exciting a fluorescence agent in the tissue; a camera module configured to receive a visible light signal and at least one infrared light signal from an object image in the tissue. The camera module comprises at least a first, second, and third optical path for directing light from the object image to a first, second, and third filter and sensor combination respectively. In any order, the first, second, and third filters are a green filter, an infrared filter, and a red/blue patterned filter comprising red and blue filters in alternating pattern.

Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.

Abstract: An aqueous acidic composition for treating metal surfaces, the composition including the following components: a) at least one water soluble or water dispersable anionic polyelectrolyte; b) at least one organofunctional silane including one or more reactive functional groups selected from the group including amino, mercapto, methacryloxy, epoxy and vinyl; c) at least one water dispersible solid wax wherein the weight ratio between components a:b is in the range of 1:2-4:1, based on dry matter; the weight ratio between components (a+b):c is in the range of 1:3-3:1, based on dry matter, and wherein components a and b may be present—at least partially—as their graft reaction product. Another aspect is a treating method using this composition and use of the thus treated metal surface.

Abstract: The invention relates to a method for detecting visible and infrared light using a medical imaging system, said medical imaging system comprising a camera module configured to receive a visible light signal and at least one infrared light signal from an object image. The medical imaging system for detecting visible and comprises an input for visible light for illuminating a tissue; an input for excitation light for exciting a fluorescence agent in the tissue; a camera module configured to receive a visible light signal and at least one infrared light signal from an object image in the tissue. The camera module comprises at least a first, second, and third optical path for directing light from the object image to a first, second, and third filter and sensor combination respectively. In any order, the first, second, and third filters are a green filter, an infrared filter, and a red/blue patterned filter comprising red and blue filters in alternating pattern.

Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.

Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.