Abstract: Techniques for data manipulation using processor cluster address generation are disclosed. One or more processor clusters capable of executing software-initiated work requests are accessed. A plurality of dimensions from a tensor is flattened into a single dimension. A work request address field is parsed, where the address field contains unique address space descriptors for each of the plurality of dimensions, along with a common address space descriptor. A direct memory access (DMA) engine coupled to the one or more processor clusters is configured. Addresses are generated based on the unique address space descriptors and the common address space descriptor. The plurality of dimensions can be summed to generate a single address. Memory is accessed using two or more of the addresses that were generated. The addresses are used to enable DMA access.

Abstract: An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.

Abstract: An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.

Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

Abstract: Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device (1010) are substantially in contact and coplanar.

Abstract: Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device (1010) are substantially in contact and coplanar.

Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

Abstract: A Robot Position Calibration Tool (RPCT) is used to accurately calibrate a robot position for a reticle hand-off to a transfer station in a lithography tool with minimized particle generation and outgassing. Method(s), system(s) and computer program product(s) are described to calibrate the robot with minimal sensor usage and minimal slippage of a payload leading to minimized particle generation and outgassing inside a vacuum chamber of a lithography tool.

Abstract: The present invention provides a method of charging at least one container, such as a tube, with an energetic material. The method comprises the step of reducing a pressure of a fluid in an interior portion of the or each container. The method also comprises the step of positioning the energetic material at a position that is exterior to the or each container and at which a pressure is higher than in the interior portion of the or each container in a manner such that a suction results which sucks the energetic material into the interior portion of the or each container and thereby charges the or each container with the energetic material.

Abstract: A modular explosives cartridge comprises a tubular body having lockable coupling members secured on opposite ends thereof to form a bayonet coupling between opposite ends of respective cartridges to form an elongate tubular explosives cartridge. The lockable coupling members each include a sealing membrane to form a sealed closure at opposite ends of the tubular body, the sealing membranes being pierced during coupling to form a continuous column of explosive composition within said elongate tubular cartridge.