Patents by Inventor Richard Joseph Bruls
Richard Joseph Bruls has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120295205Abstract: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.Type: ApplicationFiled: December 8, 2010Publication date: November 22, 2012Applicant: ASML Netherlands B.V.Inventors: Antonius Theodorus Wilhelmus Kempen, Richard Joseph Bruls, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Gerardus Hubertus Petrus Maria Swinkels, Wilbert Jan Mestrom
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Publication number: 20120057144Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: ApplicationFiled: October 12, 2011Publication date: March 8, 2012Applicant: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus DE KRUIF, Richard Joseph Bruls, Johannes Wihelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Patent number: 8089613Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: GrantFiled: July 19, 2010Date of Patent: January 3, 2012Assignee: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus De Kruif, Richard Joseph Bruls, Johannes Wilhelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Publication number: 20110273679Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.Type: ApplicationFiled: July 20, 2011Publication date: November 10, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Thijs Egidius Johannes Knaapen, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
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Publication number: 20110273677Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: July 20, 2011Publication date: November 10, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erick Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
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Publication number: 20110222040Abstract: A contaminant trap is used in an EUV radiation source apparatus. An EUV radiation beam is generated and focused through a low pressure gaseous atmosphere into a virtual source point. The EUV radiation creates a plasma in the low pressure hydrogen atmosphere through which it passes. A contaminant trap including electrodes is located in or around radiation beam as it approaches the virtual source point. A DC biasing source is connected to the electrodes to create an electric field oriented to deflect out of the beam path contaminant particles that have been negatively charged by the plasma. Additional RF electrodes and/or an ionizer enhance the plasma to increase the charging of the particles. The deflecting electrodes can be operated with RF bias for a short time, to ensure dissipation of the enhanced plasma.Type: ApplicationFiled: March 11, 2011Publication date: September 15, 2011Applicant: ASML Netherlands B.V.Inventors: Jens Arno STEINHOFF, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Erik Roelof LOOPSTRA, Hendrik Antony Johannes NEERHOF, Adrianus Johannes Maria VAN DIJK, Andrei Mikhailovich YAKUNIN, Luigi SCACCABAROZZI
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Publication number: 20100329290Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: ApplicationFiled: July 19, 2010Publication date: December 30, 2010Applicant: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus DE KRUIF, Richard Joseph Bruls, Johannes Wilhelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Publication number: 20100328634Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.Type: ApplicationFiled: May 12, 2010Publication date: December 30, 2010Applicant: ASML Netherlands B.V.Inventors: Bauke Jansen, Richard Joseph Bruls, Hans Jansen, Antonius Johannus Van der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Eric Willem Felix Casimiri
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Patent number: 7843552Abstract: The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle.Type: GrantFiled: June 17, 2005Date of Patent: November 30, 2010Assignee: ASML Netherlands B.V.Inventors: Richard Joseph Bruls, Orlando Serapio Cicilia, Tammo Uitterdijk, Herman Boom
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Patent number: 7817247Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: GrantFiled: December 23, 2005Date of Patent: October 19, 2010Assignee: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus De Kruif, Richard Joseph Bruls, Johannes Wilhelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Publication number: 20100157260Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.Type: ApplicationFiled: December 4, 2009Publication date: June 24, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Thijs Egidius Johannes KNAAPEN, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
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Publication number: 20100066987Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: ApplicationFiled: September 15, 2009Publication date: March 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes BRUIJSTENS, Richard Joseph BRULS, Hans JANSEN, Siebe LANDHEER, Laurentius Catrinus JORRITSMA, Arnout Johannes MEESTER, Bauke JANSEN, Ivo Adam Johannes Thomas, Marcio Alexandre Cano MIRANDA, Maurice Martinus Johannes VAN DER LEE, Gheorghe TANASA, Lambertus Dominicus NOORDAM
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Publication number: 20100066988Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.Type: ApplicationFiled: September 15, 2009Publication date: March 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
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Patent number: 7595863Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and includes a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: GrantFiled: December 23, 2005Date of Patent: September 29, 2009Assignee: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus Kruif, Richard Joseph Bruls, Thomas Josephus Maria Castenmiller, Johannes Wilhelmus De Klerk, Erik Petrus Buurman
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Publication number: 20090207397Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: March 26, 2009Publication date: August 20, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Patent number: 7534552Abstract: In known lithographic apparatus the projection beam is symmetrical, while the process window can be asymmetrical. The invention addresses this problem by providing a lithographic apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein there is further provided a system for providing an asymmetric projection beam bandwidth distribution.Type: GrantFiled: December 23, 2004Date of Patent: May 19, 2009Assignee: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus De Kruif, Richard Joseph Bruls
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Patent number: 7528929Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: November 12, 2004Date of Patent: May 5, 2009Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Publication number: 20090014030Abstract: A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.Type: ApplicationFiled: July 9, 2007Publication date: January 15, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Igor Petrus Maria Bouchoms, Richard Joseph Bruls, Hans Jansen, Martinus Hendrikus Antonius Leenders, Peter Franciscus Wanten, Marcus Theodoor Wilhelmus Van Der Heijden, Jacques Cor Johan Van Der Donck, Frederik Johannes Van Den Bogaard, Jan Groenewold, Sandra Van Der Graaf, Carmen Julia Zoldesi
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Publication number: 20080137049Abstract: A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.Type: ApplicationFiled: February 5, 2008Publication date: June 12, 2008Applicant: ASML Netherlands B.V.Inventors: Johannes Christiaan Maria Jasper, Marcel Koenraad Marie Baggen, Richard Joseph Bruls, Orlando Serapio Cicilia, Hendrikus Alphonsus Ludovicus Van Dijck, Gerardus Carolus Johannus Hofmans, Albert Johannes Maria Jansen, Carlo Cornelis Maria Luijten, Willem Richard Pongers, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Herman Boom, Marcel Johannes Louis Marie Demarteau
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Patent number: 7379154Abstract: A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.Type: GrantFiled: April 30, 2004Date of Patent: May 27, 2008Assignee: ASML Netherlands, B.V.Inventors: Richard Joseph Bruls, Orlando Serapio Cicilia, Hendrikus Alphonsus Ludovicus Van Dijck, Gerardus Carolus Johannus Hofmans, Tammo Uitterdijk