Patents by Inventor Richard Joseph Himics

Richard Joseph Himics has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist containing a thiodipropionate compound
    Patent number: 4059449
    Abstract: This invention relates to a photoresist consisting of a novolak resin and a sensitizer containing a thiodipropionate compound.
    Type: Grant
    Filed: September 30, 1976
    Date of Patent: November 22, 1977
    Assignee: RCA Corporation
    Inventors: Thomas Francis Rosenkranz, Richard Joseph Himics
  • Photosensitive copolymer on silicon support
    Patent number: 4054454
    Abstract: Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.
    Type: Grant
    Filed: February 20, 1976
    Date of Patent: October 18, 1977
    Assignee: RCA Corporation
    Inventors: Richard Joseph Himics, Scott Oliver Graham, Daniel Louis Ross
  • Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer
    Patent number: 4045318
    Abstract: This invention pertains to a method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer wherein the poly(olefin sulfone) layer is exposed to ultra violet radiation prior to sputter etching the surface relief pattern into the metal layer.
    Type: Grant
    Filed: July 30, 1976
    Date of Patent: August 30, 1977
    Assignee: RCA Corporation
    Inventors: Richard Joseph Himics, Nitin Vithalbhai Desai, Eugene Samuel Poliniak
  • Olefin-SO.sub.2 copolymer film adhesion to a substrate
    Patent number: 4007295
    Abstract: To improve the adherence of an olefin-SO.sub.2 copolymer film employed as an electron beam resist to a metallic substrate, a thin film of gold is first applied to the substrate. The resulting bond is strong enough to withstand exposure to electron beams, development of the resist film and electroplating of the film witout undercutting, lifting or distortion of the film.
    Type: Grant
    Filed: July 28, 1975
    Date of Patent: February 8, 1977
    Assignee: RCA Corporation
    Inventors: Eugene Samuel Poliniak, Richard Joseph Himics, Henry Wielicki
  • Method of preparing a pattern on a silicon wafer
    Patent number: 3964909
    Abstract: Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.
    Type: Grant
    Filed: March 6, 1975
    Date of Patent: June 22, 1976
    Assignee: RCA Corporation
    Inventors: Richard Joseph Himics, Scott Oliver Graham, Daniel Louis Ross
  • Development of poly(1-methyl-1-cyclopentene-SO.sub.2) electron beam resist
    Patent number: 3935332
    Abstract: Three developer solvents 2-methylcyclohexanone, 3-methylcyclohexanone, and a mixture of acetonyl acetate and acetone, improve the resolution of electron beam exposed films of poly(1-methyl-1-cyclopentene-SO.sub.2) copolymers.
    Type: Grant
    Filed: January 9, 1975
    Date of Patent: January 27, 1976
    Assignee: RCA Corporation
    Inventors: Eugene Samuel Poliniak, Richard Joseph Himics
  • Preparation of olefin SO.sub.2 copolymer electron beam resist films and use of same for recording
    Patent number: 3935331
    Abstract: In preparing an electron beam resist film of a copolymer of an olefin and SO.sub.2, the steps of removing insoluble particles, drying the films under high vacuum and storing them in a moisture-free atmosphere are required to prevent cracking of the films during development.
    Type: Grant
    Filed: January 9, 1975
    Date of Patent: January 27, 1976
    Assignee: RCA Corporation
    Inventors: Eugene Samuel Poliniak, Howard George Scheible, Richard Joseph Himics