Abstract: A coated substrate, especially a glass substrate, such coated substrate having high photocatalytic activity and low visible light reflection as well as being highly abrasion resistant. Preferably, the coating is a titanium oxide coating, the photolytic activity is greater than 5×10?3 cm?1min?1, and coating side visible light reflection is 35% or lower.

Abstract: A process for the production of a photocatalytically active self-cleaning coated substrate, especially a glass substrate, which comprises depositing a titanium oxide coating on the surface of the substrate by contacting it with a fluid mixture containing a source of titanium and a source of oxygen, the substrate being at a temperature of at least 600° C. The coated surface has good durability, a high photocatalytic activity and a low visible light reflection. Most preferably the deposition temperature is in the range 645° C. to 7200° C. which provides especially good durability. The fluid mixture preferably contains titanium chloride and an ester, especially ethyl acetate. Also disclosed is a self cleaning coated substrate, especially a glass substrate, having high photocatalytic activity and low visible light reflection and a durable self-cleaning coated glass.

Abstract: A coated substrate, especially a glass substrate, such coated substrate having high photocatalytic activity and low visible light reflection as well as being highly abrasion resistant. Preferably, the coating is a titanium oxide coating, the photolytic activity is greater than 5×10−3 cm−1min−1, and coating side visible light reflection is 35% or lower.