Abstract: A reticle gripper barrier system for use in concert with a reticle gripper device that contacts a lithographic reticle is presented. In a particular embodiment, a reticle gripper barrier device includes a support plate affixed near or to the reticle gripper device and a gripper barrier or a set of concentric gripper barriers affixed to or near the support plate. A reticle gripper barrier system includes one or more reticle gripper barrier devices that form a complete or partial barrier around the point or points where the reticle gripper device contacts a lithographic reticle. The gripper barriers block contaminants and prevent them from migrating towards the mask and do not contact the lithographic reticle. The gripper barriers can be interleaved with corresponding contact barriers on a lithographic reticle, which the gripper device is contacting.

Abstract: A reticle gripper barrier system for use in concert with a reticle gripper device that contacts a lithographic reticle is presented. In a particular embodiment, a reticle gripper barrier device includes a support plate affixed near or to the reticle gripper device and a gripper barrier or a set of concentric gripper barriers affixed to or near the support plate. A reticle gripper barrier system includes one or more reticle gripper barrier devices that form a complete or partial barrier around the point or points where the reticle gripper device contacts a lithographic reticle. The gripper barriers block contaminants and prevent them from migrating towards the mask and do not contact the lithographic reticle. The gripper barriers can be interleaved with corresponding contact barriers on a lithographic reticle, which the gripper device is contacting.

Abstract: The present invention is directed to a reticle barrier system that prevents contaminants from landing on a mask within lithographic systems using extreme ultra violet light. In particular, a reticle barrier system is provided that consists of a mask barrier and a set of contact barriers. The mask barrier surrounds a mask formed on a reticle, while the contact barriers are affixed between the mask and contact spots on a reticle. The barriers have a height relative to the mask, and different geometries are provided. Collectively, the mask and contact barriers reduce the number of contaminants landing on a mask surface without the use of a pellicle. In an alternate embodiment, the reticle barrier system includes only a mask barrier. Similarly, in another alternate embodiment, the reticle barrier system includes only contact barriers.

Abstract: An improved reticle frame structure surrounds the perimeter of a reticle substrate and contacts it at the edge with precision guidance surfaces as the reticle is lowered onto the device. In an embodiment, the reticle contacts conical sections that correct its position and orientation along the plane of its mask surface, and spherical surfaces to position the reticle at its standardized datum reference areas. Near the intersection of the X and Y reference planes, a minimal area of the reticle face comes to rest on a spherical mounting surface as far away from the reticle mask as possible. This surface completes a tripod of vertical support in conjunction with the cones, which maintain contact with the reticle edges only. Secondary and tertiary spherical support surfaces can be provided for vertical support of the other two lateral corners of the reticle face to mitigate reticle tilt while it is being lowered onto the tripod contact points.

Abstract: The present invention is directed to a reticle barrier system that prevents contaminants from landing on a mask within lithographic systems using extreme ultra violet light. In particular, a reticle barrier system is provided that consists of a mask barrier and a set of contact barriers. The mask barrier surrounds a mask formed on a reticle, while the contact barriers are affixed between the mask and contact spots on a reticle. The barriers have a height relative to the mask, and different geometries are provided. Collectively, the mask and contact barriers reduce the number of contaminants landing on a mask surface without the use of a pellicle. In an alternate embodiment, the reticle barrier system includes only a mask barrier. Similarly, in another alternate embodiment, the reticle barrier system includes only contact barriers.