Patents by Inventor Richard Leyden

Richard Leyden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photocurable compositions for articles having stable tensile properties
    Patent number: 7718111
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.
    Type: Grant
    Filed: April 11, 2007
    Date of Patent: May 18, 2010
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David L. Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • ANTIMONY-FREE PHOTOCURABLE RESIN COMPOSITION AND THREE DIMENSIONAL ARTICLE
    Publication number: 20100015408
    Abstract: The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony-free cationic photoinitiator (v) a free radical photoinitiator, and (vi) a toughening agent. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications.
    Type: Application
    Filed: October 26, 2006
    Publication date: January 21, 2010
    Applicant: Huntsman International LLC
    Inventors: John Wai Fong, Richard Leyden, Laurence Messe, Ranjana C. Patel, Carole Vandenabeele
  • Photocurable compositions for articles having stable tensile properties
    Publication number: 20070256781
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0 groups per 100 grams of said composition.
    Type: Application
    Filed: April 11, 2007
    Publication date: November 8, 2007
    Applicant: Huntsman Advanced Materials Americas Inc.
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Photocurable compositions for articles having stable tensile properties
    Patent number: 7232850
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl groups per 100 grams of said composition.
    Type: Grant
    Filed: October 3, 2003
    Date of Patent: June 19, 2007
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Liquid radiation-curable composition, especially for stereolithography
    Publication number: 20050228064
    Abstract: The present invention relates to a liquid, radiation-curable composition containing a cationically activated component, a cationic photoinitiator or a mixture of cationic photoinitiators, at least an effective amount of a compound having at least one terminal and/or pendant unsaturated group and at least one hydroxyl group in its molecule. The composition is free of free radical initiator. The compositions described herein are particularly useful in stereolithography process systems for producing three-dimensional articles.
    Type: Application
    Filed: March 21, 2005
    Publication date: October 13, 2005
    Applicant: Huntsman Advanced Materials Americas Inc.
    Inventors: David Johnson, Richard Leyden, Ranjana Patel, Frank Tran
  • Photocurable compositions for articles having stable tensile properties
    Publication number: 20050072519
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.
    Type: Application
    Filed: October 3, 2003
    Publication date: April 7, 2005
    Inventors: David Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Liquid, radiation-curable composition, especially for stereolithography
    Publication number: 20010046642
    Abstract: The present invention relates to a liquid, radiation-curable composition containing a cationically activated component, a cationic photoinitiator or a mixture of cationic photoinitiators, at least an effective amount of a compound having at least one terminal and/or pendant unsaturated group and at least one hydroxyl group in its molecule. The composition is free of free radical initiator. The compositions described herein are particularly useful in stereolithography process systems for producing three-dimensional articles.
    Type: Application
    Filed: February 5, 2001
    Publication date: November 29, 2001
    Inventors: David L. Johnson, Richard Leyden, Ranjana C. Patel