Patents by Inventor Richard Newcomb
Richard Newcomb has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9812304Abstract: A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body. A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed.Type: GrantFiled: January 12, 2015Date of Patent: November 7, 2017Assignee: ANGSTROM SCIENCES, INC.Inventors: Mark A. Bernick, Richard Newcomb
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Patent number: 9476118Abstract: An adjustable shunt assembly for use with a sputtering magnetron having at least two magnets spaced from one another and disposed with respect to a sputtering target having a sputtering surface. The magnets define a longitudinal axis and the adjustable shunt assembly moves a shunt between the two magnets for altering the magnetic field therebetween. A transporter is used for moving the shunt so that such movement may be occurred without disassembling the components of the magnetron and such movement may also be done remotely. A method for moving such shunts is also disclosed.Type: GrantFiled: November 4, 2013Date of Patent: October 25, 2016Assignee: Angstrom Sciences, Inc.Inventor: Richard Newcomb
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Patent number: 9349576Abstract: A magnet arrangement which is usable as both a retrofit magnetic arrangement in a rotatable cylindrical magnetron sputtering electrode as well as a drive assembly in communication with the electrode for delivering high current into a target surface without adding highly incremental cost to the overall design of the electrode. The electrode includes a cathode body defining a magnet receiving chamber, a rotatable cylindrical target surrounding the cathode body, wherein the target is rotatable about the cathode body. The cathode body further defines a magnet arrangement received within the magnet receiving chamber, wherein the magnet arrangement comprised of a plurality of magnets wherein at least one of the magnets is a profiled magnet having a contoured top portion.Type: GrantFiled: March 14, 2007Date of Patent: May 24, 2016Assignee: Angstrom Sciences, Inc.Inventors: Mark A. Bernick, Richard Newcomb
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Publication number: 20150194294Abstract: A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body. A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed.Type: ApplicationFiled: January 12, 2015Publication date: July 9, 2015Inventors: Mark A. Bernick, Richard Newcomb
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Patent number: 8951394Abstract: A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed.Type: GrantFiled: September 21, 2010Date of Patent: February 10, 2015Assignee: Angstrom Sciences, Inc.Inventors: Mark A. Bernick, Richard Newcomb
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Patent number: 8845868Abstract: A seal and fixation assembly includes a cylindrical target having an inside surface with a shoulder that forms a stop within the target. A target retaining ring is disposed about the target. A seal plate is disposed within the target and engages the stop and the inside surface of the target. An end cap is disposed on the end of the target and includes a portion with a beveled surface within the target. A sealing element is disposed between the inside surface of the target, the seal plate, and the beveled surface of the end cap. A clamp is disposed over the end cap and the target retaining ring. Engagement of the end cap and the target retaining ring with the clamp causes the end cap to move within the target toward the stop to compress the sealing element between the target, the seal plate, and the beveled surface.Type: GrantFiled: December 2, 2011Date of Patent: September 30, 2014Assignee: Angstrom Sciences, Inc.Inventor: Richard Newcomb
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Publication number: 20140158523Abstract: An adjustable shunt assembly for use with a sputtering magnetron having at least two magnets spaced from one another and disposed with respect to a sputtering target having a sputtering surface. The magnets define a longitudinal axis and the adjustable shunt assembly moves a shunt between the two magnets for altering the magnetic field therebetween. A transporter is used for moving the shunt so that such movement may be occurred without disassembling the components of the magnetron and such movement may also be done remotely. A method for moving such shunts is also disclosed.Type: ApplicationFiled: November 4, 2013Publication date: June 12, 2014Applicant: Angstrom Sciences, Inc.Inventor: Richard Newcomb
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Patent number: 8349156Abstract: Disclosed invention uses a coaxial microwave antenna to enhance ionization in PVD or IPVD. The coaxial microwave antenna increases plasma density homogeneously adjacent to a sputtering cathode or target that is subjected to a power supply. The coaxial microwave source generates electromagnetic waves in a transverse electromagnetic (TEM) mode. The invention also uses a magnetron proximate the sputtering cathode or target to further enhance the sputtering. Furthermore, for high utilization of expensive target materials, a target can rotate to improve the utilization efficiency. The target comprises dielectric materials, metals, or semiconductors. The target also has a cross section being substantially symmetric about a central axis that the target rotates around. The target may have a substantially circular or annular a cross section.Type: GrantFiled: May 14, 2008Date of Patent: January 8, 2013Assignee: Applied Materials, Inc.Inventors: Michael W. Stowell, Richard Newcomb
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Publication number: 20120146504Abstract: A seal and fixation assembly includes a cylindrical target having an inside surface with a shoulder that forms a stop within the target. A target retaining ring is disposed about the target. A seal plate is disposed within the target and engages the stop and the inside surface of the target. An end cap is disposed on the end of the target and includes a portion with a beveled surface within the target. A sealing element is disposed between the inside surface of the target, the seal plate, and the beveled surface of the end cap. A clamp is disposed over the end cap and the target retaining ring. Engagement of the end cap and the target retaining ring with the clamp causes the end cap to move within the target toward the stop to compress the sealing element between the target, the seal plate, and the beveled surface.Type: ApplicationFiled: December 2, 2011Publication date: June 14, 2012Applicant: ANGSTROM SCIENCES, INC.Inventor: Richard Newcomb
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Publication number: 20110186427Abstract: A magnetron sputtering electrode for use in a rotatable cylindrical magnetron sputtering device, the electrode including a cathode body defining a magnet receiving chamber and a cylindrical target surrounding the cathode body. The target is rotatable about the cathode body A magnet arrangement is received within the magnet receiving chamber, the magnet arrangement including a plurality of magnets. A shunt is secured to the cathode body and proximate to a side of the magnet arrangement, the shunt extending in a plane substantially parallel to the side of the magnet arrangement. A method of fine-tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device is also disclosed.Type: ApplicationFiled: September 21, 2010Publication date: August 4, 2011Applicant: Angstrom Sciences, Inc.Inventors: Mark A. Bernick, Richard Newcomb
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Patent number: 7832348Abstract: Disclosed is a watercraft for use in combination with a PWC or suitable shallow draft propulsion system. The watercraft is designed to operate in emergency conditions where flood waters leave an uncharted bottom that may be as little as twelve inches deep or conceal a submerged object. The watercraft includes a ramp allowing for the ease of loading including wheelchair bound and bed-bound patients as well as supplies such as water, food, medical supplies, generators, and water filtration systems. The watercraft is based upon two pontoons having a storable floor and support structure, the support structure overlays a portion of each pontoon.Type: GrantFiled: October 24, 2008Date of Patent: November 16, 2010Inventor: Richard Newcomb
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Publication number: 20090314631Abstract: A magnet assembly for a magnetron sputtering device having circular, linear or other types of planar targets including two permanent magnets and an electromagnet, e.g., electromagnetic coil between the permanent magnets associated with a sputtering target of a target assembly. An electrical control circuit is arranged to selectively adjust at least the current level and the direction of current to the electromagnet to alter the magnetic fields of the magnet assembly thereby encompassing the entire portions of the sputtering target, including the extreme inner and outer portions of the sputtering target to optimize the target uniformity and the sputtered film uniformity on a substrate. Methods for operating the magnet assembly of the magnetron sputtering devices, for optimizing the target utilization and sputtered film uniformity on a substrate, and for operating the magnetron sputtering process in a reactive gas environment to form an insulating or dielectric thin film are also provided.Type: ApplicationFiled: June 18, 2009Publication date: December 24, 2009Applicant: ANGSTROM SCIENCES, INC.Inventors: Mark A. Bernick, Richard Newcomb
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Publication number: 20090283400Abstract: Disclosed invention uses a coaxial microwave antenna to enhance ionization in PVD or IPVD. The coaxial microwave antenna increases plasma density homogeneously adjacent to a sputtering cathode or target that is subjected to a power supply. The coaxial microwave source generates electromagnetic waves in a transverse electromagnetic (TEM) mode. The invention also uses a magnetron proximate the sputtering cathode or target to further enhance the sputtering. Furthermore, for high utilization of expensive target materials, a target can rotate to improve the utilization efficiency. The target comprises dielectric materials, metals, or semiconductors. The target also has a cross section being substantially symmetric about a central axis that the target rotates around. The target may have a substantially circular or annular a cross section.Type: ApplicationFiled: May 14, 2008Publication date: November 19, 2009Applicant: Applied Materials, Inc.Inventors: MICHAEL W. STOWELL, Richard Newcomb
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Publication number: 20090145345Abstract: Disclosed is a watercraft for use in combination with a PWC or suitable shallow draft propulsion system. The watercraft is designed to operate in emergency conditions where flood waters leave an uncharted bottom that may be as little as twelve inches deep or conceal a submerged object. The watercraft includes a ramp allowing for the ease of loading including wheelchair bound and bed-bound patients as well as supplies such as water, food, medical supplies, generators, and water filtration systems. The watercraft is based upon two pontoons having a storable floor and support structure, the support structure overlays a portion of each pontoon.Type: ApplicationFiled: October 24, 2008Publication date: June 11, 2009Inventor: Richard Newcomb
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Publication number: 20080012460Abstract: A magnet arrangement which is usable as both a retrofit magnetic arrangement in a rotatable cylindrical magnetron sputtering electrode as well as a drive assembly in communication with the electrode for delivering high current into a target surface without adding highly incremental cost to the overall design of the electrode. The electrode includes a cathode body defining a magnet receiving chamber, a rotatable cylindrical target surrounding the cathode body, wherein the target is rotatable about the cathode body. The cathode body further defines a magnet arrangement received within the magnet receiving chamber, wherein the magnet arrangement comprised of a plurality of magnets wherein at least one of the magnets is a profiled magnet having a contoured top portion.Type: ApplicationFiled: March 14, 2007Publication date: January 17, 2008Applicant: Angstrom Sciences, Inc.Inventors: Mark Bernick, Richard Newcomb
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Publication number: 20060096855Abstract: A quick attachment system for cathodes is described. One embodiment of the system comprises a laterally movable support shaft; a flange connected to the support shaft, the flange including a cavity locking element and a shoulder locking element; a bordering separator connectable to a target pipe, the bordering separator comprising ring extensions for engaging the cavity locking element of flange; and a straining ring configured to engage the bordering separator and the shoulder locking element of the flange to thereby secure the laterally movable shaft to the target pipe.Type: ApplicationFiled: November 5, 2004Publication date: May 11, 2006Inventors: Richard Newcomb, Scott Trube, Tom Riso, Ken Kawakami, Dietmar Marquardt, Andreas Sauer
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Publication number: 20060065524Abstract: A rotatable target for sputtering is described. This target can include a target backing tube having an exterior surface; a backing layer in contact with the exterior surface of the target backing tube, the backing layer being electrically conductive and thermally non-conductive; and a plurality of target cylinders located around the target backing tube and in contact with the backing layer.Type: ApplicationFiled: September 30, 2004Publication date: March 30, 2006Inventors: Richard Newcomb, Doug Robinson
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Publication number: 20050224343Abstract: A system and method for coating a substrate is described. One embodiment includes a high-power sputtering system with a power coupler configured to deliver power to a rotatable target. The power coupler is positioned in a vacuum chamber or between the bearings and the rotatable target outside the vacuum chamber to limit the current that flows through the bearing.Type: ApplicationFiled: April 8, 2004Publication date: October 13, 2005Inventors: Richard Newcomb, Michael Geisler
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Patent number: 5616225Abstract: In one group of embodiments, two or more small anodes are spaced apart from one another in a magnetron, with some aspect of their electrical power being individually controlled in a manner to control a density profile across a plasma. In another group of embodiments, the same effect is obtained by mechanically moving one or more small anodes or anode masks. When used in a magnetron having either a rotating cylindrical cathode or a stationary planar cathode and designed to sputter films of material onto a substrate, the uniformity of the rate of deposition across the substrate is improved. Also, adverse effects of sputtering dielectric materials are reduced.Type: GrantFiled: March 23, 1994Date of Patent: April 1, 1997Assignee: The BOC Group, Inc.Inventors: Peter A. Sieck, Richard Newcomb, Terry A. Trumbly, Stephen C. Schulz